公开(公告)号：US1990174A

公开(公告)日：1935-02-05

申请号：US38142329

申请日：1929-07-27

Applicant: GEN ELECTRIC VAPOR LAMP CO

Inventor： FOULKE TED E

IPC: H01J61/28

CPC classification number: H01J61/28

公开(公告)号：US1971939A

公开(公告)日：1934-08-28

申请号：US41966330

申请日：1930-01-09

Applicant: GEN ELECTRIC

Inventor： MARCELLO PIRANI

IPC: F16D65/22 ,  H01J61/28

CPC classification number: H01J61/28

公开(公告)号：US1905759A

公开(公告)日：1933-04-25

申请号：US54216631

申请日：1931-06-04

Applicant: GEN ELECTRIC

Inventor： FRANZ SKAUPY ,  HANS EWEST ,  HANS PULFRICH

IPC: H01J61/28

CPC classification number: H01J61/28

公开(公告)号：US1728234A

公开(公告)日：1929-09-17

申请号：US18471127

申请日：1927-04-18

Applicant: EDMUND R WEEK JR ,  EDMUND R WEEK SR

Inventor： FANGER HERMAN J

IPC: H01J61/28

CPC classification number: H01J61/28

公开(公告)号：US20230053035A1

公开(公告)日：2023-02-16

申请号：US17880455

申请日：2022-08-03

Applicant: KLA Corporation

Inventor： Ilya Bezel ,  Leonid Borisovich Zvedenuk ,  Andrey Evgenievich Stepanov ,  Amir Torkaman

IPC: H01J65/04 ,  H01J61/02 ,  H01J61/28 ,  H01J61/52

Abstract: A plasma lamp for use in a laser-sustained plasma (LSP) light source is disclosed. The plasma lamp includes a gas containment structure for containing a gas, a gas seal positioned at a base of the gas containment structure, a gas inlet, and a gas outlet. The plasma lamp includes a gas swirler including a set of nozzles configured to generate a vortex gas flow and a swirler shaft including an inlet channel for delivering the gas from the gas inlet to the nozzles and an outlet channel for delivering the gas from the gas containment structure to the gas outlet. The plasma lamp includes a distributor including one or more plenums to distribute the gas from the gas inlet into the swirler. The plasma lamp may also include a deflector fluidically coupled to the swirler shaft and extending above the set of nozzles and configured to direct gas flow around the swirler.

公开(公告)号：US11450521B2

公开(公告)日：2022-09-20

申请号：US17157782

申请日：2021-01-25

Applicant: KLA Corporation

Inventor： Anatoly Shchemelinin

IPC: H01J61/02 ,  H01J61/16 ,  H01J61/52 ,  H01J61/28

Abstract: A broadband radiation source is disclosed. The source may include a gas containment vessel configured to maintain a plasma and emit broadband radiation. The source may also include a recirculation gas loop fluidically coupled to the gas containment vessel. The recirculation gas loop may be configured to transport gas from one or more gas boosters configured to pressurize the low-pressure gas into a high-pressure gas and transport the high-pressure gas to the recirculation loop via an outlet. The system includes a pressurized gas reservoir fluidically coupled to the outlet of the one or more gas boosters and is configured to receive and store high pressure gas from the one or more gas boosters. The source includes a pressurized gas reservoir located between the one or more gas boosters and the gas containment vessel and is configured to receive and store high pressure gas from the one or more gas boosters.

公开(公告)号：US20210327701A1

公开(公告)日：2021-10-21

申请号：US17225595

申请日：2021-04-08

Applicant: Ushio Denki Kabushiki Kaisha

Inventor： Noritaka ASHIZAWA

IPC: H01J61/06 ,  H01J61/02 ,  H01J61/28 ,  G03F7/20

Abstract: An extreme ultraviolet light source apparatus includes a disc-shaped cathode rotating about an axis, a disc-shaped anode rotating about an axis, an energy beam irradiation device irradiating a plasma raw material on the cathode with an energy beam to vaporize the plasma raw material, a power supply for causing a discharge between the cathode and the anode for generating a plasma in the gap between the cathode and the anode to emit extreme ultraviolet light, and an irradiation position adjusting mechanism for adjusting a position at which the cathode is irradiated with the energy beam. The cathode, the anode, and the irradiation position adjusting mechanism are accommodated in a housing. A photography device is disposed outside the housing and is configured to photograph a visible-light image of a vicinity of the cathode and the anode, the vicinity including visible light emitted from the plasma.

公开(公告)号：US20210242009A1

公开(公告)日：2021-08-05

申请号：US17157782

申请日：2021-01-25

Applicant: KLA Corporation

Inventor： Anatoly Shchemelinin

IPC: H01J61/02 ,  H01J61/28 ,  H01J61/52 ,  H01J61/16

Abstract: A broadband radiation source is disclosed. The source may include a gas containment vessel configured to maintain a plasma and emit broadband radiation. The source may also include a recirculation gas loop fluidically coupled to the gas containment vessel. The recirculation gas loop may be configured to transport gas from one or more gas boosters configured to pressurize the low-pressure gas into a high-pressure gas and transport the high-pressure gas to the recirculation loop via an outlet. The system includes a pressurized gas reservoir fluidically coupled to the outlet of the one or more gas boosters and is configured to receive and store high pressure gas from the one or more gas boosters. The source includes a pressurized gas reservoir located between the one or more gas boosters and the gas containment vessel and is configured to receive and store high pressure gas from the one or more gas boosters.

公开(公告)号：US20180128428A1

公开(公告)日：2018-05-10

申请号：US15553403

申请日：2016-02-16

Applicant: PHILIPS LIGHTING HOLDING B.V.

Inventor： Dirk VELDMAN ,  Rifat Ata Mustafa HIKMET ,  Ties VAN BOMMEL ,  Wijnand Evert Jacobus VAN KOOTEN

IPC: F21K9/232 ,  C23C16/455 ,  F21V25/00 ,  F21V29/65 ,  F21V29/85 ,  H01J61/26 ,  H01J61/28 ,  F21V31/00

CPC classification number: F21K9/232 ,  C23C16/455 ,  F21K9/27 ,  F21K9/90 ,  F21V25/00 ,  F21V29/506 ,  F21V29/65 ,  F21V29/85 ,  F21V31/005 ,  F21Y2107/00 ,  F21Y2113/17 ,  F21Y2115/10 ,  H01J61/26 ,  H01J61/28

Abstract: A lighting device (100, 300, 400) is disclosed. The lighting device comprises a light source (110, 310, 410), an at least partially light transmitting envelope (120, 320, 420) and a dispenser (140, 340, 440). The envelope is arranged to define a sealed space (130, 330, 430) in which at least a portion of the light source is arranged. Further, the dispenser comprises a chemically reactive substance and is adapted to gradually release at least some of the chemically reactive substance to the sealed space so as to reduce contaminants and by-products that may be present in the sealed space.

公开(公告)号：US09305764B2

公开(公告)日：2016-04-05

申请号：US14613988

申请日：2015-02-04

Applicant: Young-kyu Park ,  Wook-rae Kim ,  Kwang-soo Kim ,  Tae-joong Kim ,  Byeong-hwan Jeon

Inventor： Young-kyu Park ,  Wook-rae Kim ,  Kwang-soo Kim ,  Tae-joong Kim ,  Byeong-hwan Jeon

IPC: H01J61/28 ,  H01J65/04 ,  G02B27/14

CPC classification number: G02B27/141 ,  G02B17/0856 ,  G02B19/0028 ,  G02B19/0047 ,  G02B19/0095 ,  H01J65/04

Abstract: A plasma light source includes a chamber having an ionizable medium therein, an ignition source configured to provide first electromagnetic radiation to the chamber, a sustaining source configured to separately provide second electromagnetic radiation to the chamber, a first curved mirror positioned adjacent the chamber, and a second curved mirror positioned opposite the first mirror and arranged to direct the first electromagnetic radiation toward the chamber. The second electromagnetic radiation may be different than the first electromagnetic radiation. Related devices and methods of operation are also discussed.

Abstract translation: 等离子体光源包括其中具有可电离介质的腔室，被配置为向腔室提供第一电磁辐射的点火源，被配置为向腔室单独提供第二电磁辐射的维持源，邻近腔室定位的第一弯曲镜，以及 第二弯曲镜，其与第一反射镜相对设置，并布置成将第一电磁辐射引向腔室。 第二电磁辐射可以不同于第一电磁辐射。 还讨论了相关设备和操作方法。