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    HIGH-POWER COMPACT VUV LASER-SUSTAINED PLASMA LIGHT SOURCE
    1.
    发明公开
    HIGH-POWER COMPACT VUV LASER-SUSTAINED PLASMA LIGHT SOURCE 审中-公开

    公开(公告)号：US20240274430A1

    公开(公告)日：2024-08-15

    申请号：US18438025

    申请日：2024-02-09

    Applicant: KLA Corporation

    Inventor： Ilya Bezel

    IPC: H01J65/04 ,  H01J61/02 ,  H01J61/16 ,  H01J61/26 ,  H01J61/40

    CPC classification number: H01J65/04 ,  H01J61/025 ,  H01J61/16 ,  H01J61/26 ,  H01J61/40

    Abstract: A compact LSP broadband light includes a gas containment structure containing a mixture of a first noble gas and a second noble gas, a filter tube positioned within the gas containment structure, an input window, and a pump source. The laser pump source directs an optical pump through the input window to sustain a plasma within the filter tube. The first noble gas absorbs broadband light within a first and a second wavelength band. The filter tube absorbs broadband light having a wavelength below a selected threshold. The absorption of broadband light by the first noble gas and the filter tube provide long-pass filtering to protect one or more downstream optical elements. The gas containment structure includes an output optical window for transmission of filtered broadband light. The gas containment structure includes a gas inlet and outlet for generating a reverse vortex flow pattern within the filter tube.

    Continuous-Wave Laser-Sustained Plasma Illumination Source
    3.
    发明申请
    Continuous-Wave Laser-Sustained Plasma Illumination Source 审中-公开

    公开(公告)号：US20190115203A1

    公开(公告)日：2019-04-18

    申请号：US16231048

    申请日：2018-12-21

    Applicant: KLA-Tencor Corporation

    Inventor： Ilya Bezel ,  Anatoly Shchemelinin ,  Eugene Shifrin ,  Matthew Panzer

    IPC: H01J65/04

    CPC classification number: H01J65/04 ,  H05G2/008

    Abstract: An optical system for generating broadband light via light-sustained plasma formation includes a chamber, an illumination source, a set of focusing optics, and a set of collection optics. The chamber is configured to contain a buffer material in a first phase and a plasma-forming material in a second phase. The illumination source generates continuous-wave pump illumination. The set of focusing optics focuses the continuous-wave pump illumination through the buffer material to an interface between the buffer material and the plasma-forming material in order to generate a plasma by excitation of at least the plasma-forming material. The set of collection optics receives broadband radiation emanated from the plasma.

    LIGHT SOURCE DEVICE
    7.
    发明申请
    LIGHT SOURCE DEVICE 有权

    公开(公告)号：US20170250066A1

    公开(公告)日：2017-08-31

    申请号：US15478306

    申请日：2017-04-04

    Applicant: HAMAMATSU PHOTONICS K.K.

    Inventor： Akinori ASAI ,  Kenshi FUKUMITSU

    IPC: H01J65/04 ,  H01J61/073 ,  G03F7/20

    CPC classification number: H01J65/04 ,  G03F7/70025 ,  H01J61/025 ,  H01J61/0737 ,  H01J61/26 ,  H01J65/042

    Abstract: In a light source device, a control unit causes an energy density of a laser light in a lighting start region RS when a laser support light is maintained to be lower than an energy density of the laser light in the lighting start region RS when the laser support light is put on. For this reason, when the laser support light is maintained, a laser light L is radiated to the lighting start region RS at an energy density of a degree where sputtering does not occur. Therefore, in the light source device, because sputtering in a light emission sealing body can be suppressed, a sufficiently long life can be realized.

    Open plasma lamp for forming a light-sustained plasma
    8.
    发明授权
    Open plasma lamp for forming a light-sustained plasma 有权

    公开(公告)号：US09721761B2

    公开(公告)日：2017-08-01

    申请号：US15043804

    申请日：2016-02-15

    Applicant: KLA-Tencor Corporation

    Inventor： Lauren Wilson ,  Anant Chimmalgi ,  Ilya Bezel ,  Anatoly Shchemelinin ,  Matthew Derstine ,  Gildardo Delgado

    IPC: H01J37/00 ,  H01J37/32 ,  H01J65/04

    CPC classification number: H01J37/32339 ,  H01J37/32449 ,  H01J65/04

    Abstract: An open plasma lamp includes a cavity section. A gas input and gas output of the cavity section are arranged to flow gas through the cavity section. The plasma lamp also includes a gas supply assembly fluidically coupled to the gas input of the cavity section and configured to supply gas to an internal volume of the cavity section. The plasma lamp also includes a nozzle assembly fluidically coupled to the gas output of the cavity section. The nozzle assembly and cavity section are arranged such that a volume of the gas receives pumping illumination from a pump source, where a sustained plasma emits broadband radiation. The nozzle assembly is configured to establish a convective gas flow from within the cavity section to a region external to the cavity section such that a portion of the sustained plasma is removed from the cavity section by the gas flow.

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