公开(公告)号：US06755932B2

公开(公告)日：2004-06-29

申请号：US09788463

申请日：2001-02-21

申请人： Toshio Masuda ,  Tatehito Usui ,  Mitsuru Suehiro ,  Hiroshi Kanekiyo ,  Hideyuki Yamamoto ,  Kazue Takahashi ,  Hiromichi Enami

发明人： Toshio Masuda ,  Tatehito Usui ,  Mitsuru Suehiro ,  Hiroshi Kanekiyo ,  Hideyuki Yamamoto ,  Kazue Takahashi ,  Hiromichi Enami

IPC分类号： H05H100

CPC分类号： H01L21/67069 ,  G01N21/68 ,  H01J37/32082 ,  H01J37/32935 ,  H01J37/32972

摘要： The object of the present invention is to provide a plasma processing apparatus wherein plasma is generated in process chamber to treat a sample. Said plasma processing apparatus is further characterized in that multiple closely packed through-holes are formed on the plate installed on the UHF antenna arranged opposite to the sample, an optical transmitter is installed almost in contact with the back of the through-holes, and an optical transmission means is arranged on the other end of said optical transmitter, thereby measuring optical information coming from the sample and plasma through optical transmitter and optical transmission means by means of a measuring instrument. No abnormal discharge or particle contamination occur to through-holes even in long-term discharge process, and no deterioration occurs to the optical performance at the end face of the optical transmitter. Said plasma processing apparatus ensures stable and high precision measurement of the state of the surface of sample and plasma for a long time.

摘要翻译： 本发明的目的是提供一种等离子体处理装置，其中在处理室中产生等离子体以处理样品。 所述等离子体处理装置的特征还在于，在安装在与样品相对布置的UHF天线上的板上形成多个紧密堆积的通孔，光发射器几乎与通孔背面几乎接触，并且 光传输装置设置在所述光发射机的另一端，借助于测量仪器通过光发射机和光传输装置测量来自样本和等离子体的光信息。 即使在长期放电过程中也不会对通孔发生异常放电或颗粒污染，并且在光发射机的端面处的光学性能不会劣化。 所述等离子体处理装置长时间保证对样品和等离子体表面的状态的稳定和高精度的测量。

公开(公告)号：US06653594B2

公开(公告)日：2003-11-25

申请号：US09793991

申请日：2001-02-28

申请人： Terumi Nakamura ,  Kazuo Hiraoka ,  Chiaki Shiga ,  Hideyuki Yamamoto ,  Koji Nakamura

发明人： Terumi Nakamura ,  Kazuo Hiraoka ,  Chiaki Shiga ,  Hideyuki Yamamoto ,  Koji Nakamura

IPC分类号： B23K9173

CPC分类号： B23K9/295

摘要： A gas having an arc current-voltage property that is different from a shielding gas is intermittently added to the shielding gas, an arc current is intermittently changed in proportion to an intermittent chemical composition change of the shielding gas at an arc generation region, and an arc generation point situated at a tip of a welding wire is displaced upwardly or downwardly along a groove of a base metal.

摘要翻译： 与保护气体不同的具有电弧电流特性的气体被间歇地添加到保护气体中，电弧电流与电弧产生区域的保护气体的间歇化学组成变化成比例地间歇地变化， 位于焊丝前端的电弧产生点沿着母材的沟槽向上或向下移位。

公开(公告)号：US06558100B1

公开(公告)日：2003-05-06

申请号：US09697324

申请日：2000-10-27

申请人： Hironobu Kawahara ,  Mitsuru Suehiro ,  Kazue Takahashi ,  Hideyuki Yamamoto ,  Katsuya Watanabe

发明人： Hironobu Kawahara ,  Mitsuru Suehiro ,  Kazue Takahashi ,  Hideyuki Yamamoto ,  Katsuya Watanabe

IPC分类号： H01L213065

CPC分类号： H01L21/6719 ,  H01L21/67161 ,  H01L21/67196 ,  H01L21/67201 ,  H01L21/67207 ,  Y10S414/135 ,  Y10S414/139

摘要： The vacuum processing apparatus has an atmospheric loader having a plurality of cassette tables and a transport unit for carrying wafers, a vacuum loader equipped with vacuum wafer-processing chambers and a vacuum transport chamber communicating with the processing chambers via gate valves, and a locking unit provided with a loading lock chamber and unloading lock chambers that have gate valves for connecting the atmospheric transport unit and vacuum transport chamber; wherein two etching chambers, formed by UHF-ECR reactors, are arranged symmetrically with respect to an axial line passing through the middle of the vacuum transport chamber and locking unit, only at the opposite side of the locking unit across the vacuum transport chamber, and at an acute angle with respect to the vacuum transport chamber, and UHF-ECR antennas, almost parallel to the foregoing axial line, are opened at the opposite side to that of the vacuum transport chamber.

公开(公告)号：USD394404S

公开(公告)日：1998-05-19

申请号：US73111

申请日：1997-06-30

申请人： Shingo Ishizaka ,  Hideyuki Yamamoto

设计人： Shingo Ishizaka ,  Hideyuki Yamamoto

公开(公告)号：USD387678S

公开(公告)日：1997-12-16

申请号：US61149

申请日：1996-10-16

申请人： Hideyuki Yamamoto

设计人： Hideyuki Yamamoto

公开(公告)号：US5404819A

公开(公告)日：1995-04-11

申请号：US283168

申请日：1994-08-03

申请人： Toru Hishinuma ,  Hideyuki Yamamoto

发明人： Toru Hishinuma ,  Hideyuki Yamamoto

IPC分类号： B41F35/06 ,  B41L41/06

CPC分类号： B41F35/06 ,  B41P2235/246

摘要： A blanket cylinder cleaning apparatus includes a pressure pad for pressing a cleaning fabric against a rotating blanket cylinder in a printing press to wipe away unwanted matter such as residual ink on the peripheral surface of the blanket cylinder. The pressure pad is hollow and filled with gelatinous viscoelastic material to stably bring the cleaning fabric into adequate contact with the blanket cylinder to efficiently clean the blanket cylinder. The viscoelastic material is solated with heat and readily injected into the inside space of the pressure pad.

摘要翻译： 橡皮布滚筒清洁装置包括用于将清洁织物压靠在印刷机中的旋转橡皮布滚筒上的压垫，以擦除不需要的物质，例如橡皮布滚筒的外周表面上的残留墨。 压力垫是中空的并且填充有凝胶状粘弹性材料，以稳定地使清洁织物与橡皮滚筒充分接触以有效地清洁橡皮布滚筒。 粘弹性材料被热固化并容易地注入到压力垫的内部空间中。

公开(公告)号：USD339302S

公开(公告)日：1993-09-14

申请号：US812228

申请日：1991-12-23

申请人： Hideyuki Yamamoto

设计人： Hideyuki Yamamoto

公开(公告)号：USD325535S

公开(公告)日：1992-04-21

申请号：US403724

申请日：1989-09-06

申请人： Hideyuki Yamamoto

设计人： Hideyuki Yamamoto

公开(公告)号：US07526948B2

公开(公告)日：2009-05-05

申请号：US11214963

申请日：2005-08-31

申请人： Hideyuki Yamamoto ,  Hiromichi Enami ,  Muneo Furuse

发明人： Hideyuki Yamamoto ,  Hiromichi Enami ,  Muneo Furuse

IPC分类号： G01N1/08 ,  G01M19/00 ,  H01L21/66

CPC分类号： G01N1/24 ,  G01N2015/1062 ,  H01L21/02057

摘要： A detection technique for detecting foreign material on the surface of a plasma processing apparatus, capable of accurately sucking/extracting and measuring foreign material contained in the measurement object surface is provided. The detection device comprises a gauge head or probe having a gas blow out opening for intermittently blowing a gas of a predetermined pressure to a measurement object surface and a gas suction opening for sucking foreign material discharged by the gas blown out from the gas blow out opening a particle counter having a suction pump for continuously sucking in a predetermined amount of gas from the gas suction opening for counting the number of foreign material particles contained in the gas sucked by the suction pump and a pressure adjustment unit for intermittently supplying gas of a predetermined pressure to the gas blowing out opening.

摘要翻译： 提供一种用于检测等离子体处理装置表面上异物的检测技术，其能够精确地吸取/提取和测量包含在测量对象表面中的异物。 检测装置包括具有用于间歇地向测量对象表面吹送预定压力的气体的气体吹出口的测量头或探针，以及用于吸入从气体吹出口吹出的气体排出的异物的吸气口 具有吸入泵的颗粒计数器，用于连续吸入来自吸入口的预定量的气体，用于计数由吸入泵抽吸的气体中包含的异物颗粒的数量;以及压力调节单元，用于间歇地供给预定的 对气体吹出口的压力。

公开(公告)号：US20070032088A1

公开(公告)日：2007-02-08

申请号：US11214963

申请日：2005-08-31

申请人： Hideyuki Yamamoto ,  Hiromichi Enami ,  Muneo Furuse

发明人： Hideyuki Yamamoto ,  Hiromichi Enami ,  Muneo Furuse

IPC分类号： H01L21/302 ,  H01L21/461

CPC分类号： G01N1/24 ,  G01N2015/1062 ,  H01L21/02057

摘要： A detection technique for detecting foreign material on the surface of a plasma processing apparatus, capable of accurately sucking/extracting and measuring foreign material contained in the measurement object surface is provided. The detection device comprises a gauge head or probe having a gas blow out opening for intermittently blowing a gas of a predetermined pressure to a measurement object surface and a gas suction opening for sucking foreign material discharged by the gas blown out from the gas blow out opening a particle counter having a suction pump for continuously sucking in a predetermined amount of gas from the gas suction opening for counting the number of foreign material particles contained in the gas sucked by the suction pump and a pressure adjustment unit for intermittently supplying gas of a predetermined pressure to the gas blowing out opening.

摘要翻译： 提供一种用于检测等离子体处理装置表面上异物的检测技术，其能够精确地吸取/提取和测量包含在测量对象表面中的异物。 检测装置包括具有用于间歇地向测量对象表面吹送预定压力的气体的气体吹出口的测量头或探针，以及用于吸入从气体吹出口吹出的气体排出的异物的吸气口 具有吸入泵的颗粒计数器，用于连续吸入来自吸入口的预定量的气体，用于计数由吸入泵抽吸的气体中包含的异物颗粒的数量;以及压力调节单元，用于间歇地供给预定的 对气体吹出口的压力。