Method and Structure for Implementing a Reprogrammable ROM
    75.
    发明申请
    Method and Structure for Implementing a Reprogrammable ROM 审中-公开
    实现可重编程ROM的方法和结构

    公开(公告)号:US20080232152A1

    公开(公告)日:2008-09-25

    申请号:US11872802

    申请日:2007-10-16

    IPC分类号: G11C17/00

    CPC分类号: G11C17/18 G11C17/16

    摘要: A method and structure for implementing a reprogrammable read only memory (ROM), and a design structure on which the subject circuit resides are provided. A pair of fuse elements having different lengths are selectively arranged to define an initial bit state. A group of a plurality of the pairs of fuse elements defines a predetermined data pattern of ones and zeros, providing initial states stored in the reprogrammable ROM. The reprogrammable ROM is reprogrammed when needed by selectively blowing a selected fuse or selected fuses to change the data pattern stored in the ROM.

    摘要翻译: 一种用于实现可再编程只读存储器(ROM)的方法和结构,以及设置有该对象电路所在的设计结构。 选择性地布置具有不同长度的一对熔丝元件以限定初始位状态。 一组多对熔丝元件定义了一个和零的预定数据模式,提供存储在可再编程ROM中的初始状态。 当需要时,通过选择性地吹送所选择的保险丝或选定的保险丝来改变存储在ROM中的数据模式,重编程ROM被重新编程。

    Method of making electrically programmable fuse for silicon-on-insulator (SOI) technology
    77.
    发明授权
    Method of making electrically programmable fuse for silicon-on-insulator (SOI) technology 有权
    制造用于绝缘体上硅(SOI)技术的电可编程熔丝的方法

    公开(公告)号:US07354805B2

    公开(公告)日:2008-04-08

    申请号:US11739979

    申请日:2007-04-25

    IPC分类号: H01L21/82

    摘要: A fuse structure and method of forming the same is described, wherein the body of the fuse is formed from a crystalline semiconductor body on an insulator, preferably of a silicon-on-insulator wafer, surrounded by a fill-in dielectric. The fill-in dielectric is preferably a material that minimizes stresses on the crystalline body, such as an oxide. The body may be doped, and may also include a silicide layer on the upper surface. This fuse structure may be successfully programmed over a wide range of programming voltages and time.

    摘要翻译: 描述了一种熔丝结构及其形成方法,其中熔丝的主体由绝缘体上的结晶半导体本体形成,绝缘体优选由绝缘体上硅晶片,被填充电介质环绕。 填充电介质优选是使结晶体(例如氧化物)上的应力最小化的材料。 主体可以被掺杂,并且还可以在上表面上包括硅化物层。 这种熔丝结构可以在广泛的编程电压和时间范围内成功编程。

    ELECTRICAL FUSES COMPRISING THIN FILM TRANSISTORS (TFTS), AND METHODS FOR PROGRAMMING SAME
    80.
    发明申请
    ELECTRICAL FUSES COMPRISING THIN FILM TRANSISTORS (TFTS), AND METHODS FOR PROGRAMMING SAME 有权
    包含薄膜晶体管(TFTS)的电熔丝及其编程方法

    公开(公告)号:US20070158781A1

    公开(公告)日:2007-07-12

    申请号:US11306597

    申请日:2006-01-04

    IPC分类号: H01L29/00

    摘要: The present invention relates to electrical fuses that each comprises at least one thin film transistor. In one embodiment, the electrical fuse of the present invention comprises a hydrogenated thin film transistor with an adjacent heating element. Programming of such an electrical fuse can be effectuated by heating the hydrogenated thin film transistor so as to cause at least partial dehydrogenation. Consequentially, the thin film transistor exhibits detectible physical property change(s), which defines a programmed state. In an alternative embodiment of the present invention, the electrical fuse comprises a thin film transistor that is either hydrogenated or not hydrogenated. Programming of such an alternative electrical fuse can be effectuated by applying a sufficient high back gate voltage to the thin film transistor to cause state changes in the channel-gate interface. In this manner, the thin film transistor also exhibits detectible property change(s) to define a programmed state.

    摘要翻译: 本发明涉及电熔丝,每个电熔丝包括至少一个薄膜晶体管。 在一个实施例中,本发明的电熔丝包括具有相邻加热元件的氢化薄膜晶体管。 可以通过加热氢化薄膜晶体管来实现这种电熔丝的编程,从而至少部分脱氢。 因此,薄膜晶体管表现出可检测的物理特性变化,其定义了编程状态。 在本发明的替代实施例中,电熔丝包括被氢化或未氢化的薄膜晶体管。 可以通过向薄膜晶体管施加足够的高背栅电压来引起通道栅极界面的状态变化来实现这种替代电熔丝的编程。 以这种方式,薄膜晶体管还具有可检测的特性变化以限定编程状态。