摘要:
The present invention relates to communications technologies and discloses a method, a system, and a label switching router for setting up a Label Switching Path (LSP). The method includes: an ingress edge node sends a label request packet to a downstream node, where the label request packet carries an Equal Cost Multi-Path (ECMP) property flag of a Forwarding Equivalence Class (FEC); the downstream node that receives the label request packet sends the label request packet to a next-hop node according to the property flag; and the node that receives the label request packet performs label mapping according to a path of the label request packet, binds a label to the FEC, and sets up an LSP. An ECMP property flag indicating setting up an ECMP route is permitted is introduced in the process of setting up an LSP. Therefore, setup of an ECMP route is prevented for the FEC that imposes special requirements, and management and maintenance of the network are facilitated.
摘要:
A multi-layered bottom electrode for an MTJ device on a silicon nitride substrate is described. It comprises a bilayer of alpha tantalum on ruthenium which in turn lies on a nickel chrome layer over a second tantalum layer.
摘要:
Formation of a bottom electrode for an MTJ device on a silicon nitride substrate is facilitated by including a protective coating that is partly consumed during etching of the alpha tantalum portion of said bottom electrode. Adhesion to SiN is enhanced by using a TaN/NiCr bilayer as “glue”.
摘要:
A method and system for improving a quality of communication based on a label distribution protocol is provided. The method includes the following: When a local label switching router (LSR) finds out a change of a route at an upstream node in a multicast label switching path (LSP), it calculates and sets up a new optimized multicast LSP according to the label distribution protocol (LDP), and delays to send a withdraw request to the upstream node in the former multicast LSP. An interruption of the data stream in the multicast LSP reconstruction procedures can be avoided or reduced, so that the loss of data packets caused by the multicast LSP adjustment is reduced, and the quality of communication of the multicast is improved.
摘要:
Embodiments of the invention provide a method for forming tantalum nitride materials on a substrate by employing an atomic layer deposition (ALD) process. The method includes heating a tantalum precursor within an ampoule to a predetermined temperature to form a tantalum precursor gas and sequentially exposing a substrate to the tantalum precursor gas and a nitrogen precursor to form a tantalum nitride material. Thereafter, a nucleation layer and a bulk layer may be deposited on the substrate. In one example, a radical nitrogen compound may be formed from the nitrogen precursor during a plasma-enhanced ALD process. A nitrogen precursor may include nitrogen or ammonia. In another example, a metal-organic tantalum precursor may be used during the deposition process.
摘要:
A multicast method and a multicast apparatus are disclosed. The multicast method includes: retaining the multicast forwarding subtree and forbidding to forward multicast data through the multicast forwarding subtree when the created multicast forwarding subtree does not need to forward any data; and forwarding the multicast data through the multicast forwarding subtree when the created multicast forwarding subtree needs to forward data.
摘要:
Embodiments of the invention provide a method for forming tantalum nitride materials on a substrate by employing an atomic layer deposition (ALD) process. The method includes heating a tantalum precursor within an ampoule to a predetermined temperature to form a tantalum precursor gas and sequentially exposing a substrate to the tantalum precursor gas and a nitrogen precursor to form a tantalum nitride material. Thereafter, a nucleation layer and a bulk layer may be deposited on the substrate. In one example, a radical nitrogen compound may be formed from the nitrogen precursor during a plasma-enhanced ALD process. A nitrogen precursor may include nitrogen or ammonia. In another example, a metal-organic tantalum precursor may be used during the deposition process.
摘要:
A method for generating a sales volume forecast includes receiving user input specifying a hypothetical asking price and a future date and accessing, for each of multiple past time periods, historical data reflecting a sales volume for an item over the past time period and a corresponding price difference between an asking price and a coinciding market price for the item, the price difference also being associated with the past time period. The method also includes determining a historical correlation for the item between sales volume and price difference between asking price and coinciding market price, accessing market data reflecting a future market price for the item associated with the specified future date, determining a price difference between the specified hypothetical asking price and the future market price for the item, applying the determined historical correlation to the determined price difference to generate a sales volume forecast, and providing the generated sales volume forecast for access by a user.
摘要:
A waveguide liner for an analyzer magnet chamber having three interlocking pieces of graphite, the liner pieces having sufficient size to allow them to stand freely without being secured, said liner pieces providing case of interchange and replacement in a Kestrel analyzer magnet chamber.
摘要:
Disclosed is a method and apparatus that features deposition of tantalum films employing sequential deposition techniques, such as Atomic Layer Deposition (ALD). The method includes serially exposing a substrate to a flow of a nitrogen-containing gas, such as ammonia NH3, and a tantalum containing gas. The tantalum-containing gas is formed from a precursor, (tBuN)Ta(NEt2)3 (TBTDET), which is adsorbed onto the substrate. Prior to adsorption of TBTDET onto the substrate layer, the TBTDET precursor is heated within a predefined temperature range.
摘要翻译:公开了一种方法和装置,其特征是使用诸如原子层沉积(ALD)的顺序沉积技术沉积钽膜。 该方法包括将基底连续暴露于含氮气体(例如氨NH 3)和含钽气体的流动。 含钽气体由吸附在上面的前驱物(TBTET)Ta(NET 2 N 3)3(TBTDET)形成, 底物。 在将TBTDET吸附到基底层上之前,将TBTDET前体在预定的温度范围内加热。