Ink jet recording apparatus having residual quantity detection unit and
residual quantity detection method thereof
    71.
    发明授权
    Ink jet recording apparatus having residual quantity detection unit and residual quantity detection method thereof 失效
    具有残留量检测单元和剩余量检测方法的喷墨记录装置

    公开(公告)号:US5975665A

    公开(公告)日:1999-11-02

    申请号:US542783

    申请日:1995-10-13

    IPC分类号: B41J2/175 B41J2/195

    摘要: According to the present invention, there is provided an ink jet recording apparatus for recording an image on a recording medium by discharging ink to the surface of the recording medium, wherein ink is reserved in an ink tank including a negative pressure generating member, such as an absorber and a foaming member, and a function of accurately detecting the residual quantity such that depletion to a predetermined level can be detected is realized. Light emitted by a photointerrupter is allowed to pass through a portion of a wall surface of the ink tank made of transparent plastic or the like which is transmissible with respect to detection light emitted by the photointerrupter to detect change in the light reflectance in the boundary portion between the wall surface and the ink absorber. In accordance with reflectance obtained in a case where no ink exists in the detected portion and that obtained in a case where ink exists, the residual quantity of ink can be detected.

    摘要翻译: 根据本发明,提供一种喷墨记录装置,用于通过将油墨喷射到记录介质的表面上将图像记录在记录介质上,其中油墨保留在包括负压产生部件的墨罐中,例如 吸收器和发泡构件,并且实现了能够精确地检测残留量从而能够检测到耗尽到预定水平的功能。 允许由光电断路器发射的光通过由透光塑料等制成的墨槽的壁面的一部分,该透明塑料等相对于由光断续器发射的检测光可透射,以检测边界部分中的光反射率的变化 在壁表面和吸墨体之间。 根据在检测部分中不存在油墨而获得的反射率和在存在油墨的情况下获得的反射率,可以检测油墨的剩余量。

    Projection exposure apparatus and method, a semiconductor device
manufacturing system and method, and a semiconductor device
manufactured by illuminating an original having a circuit pattern when
the original and a wafer are in a focused state
    72.
    发明授权
    Projection exposure apparatus and method, a semiconductor device manufacturing system and method, and a semiconductor device manufactured by illuminating an original having a circuit pattern when the original and a wafer are in a focused state 失效
    投影曝光装置和方法,半导体器件制造系统和方法以及当原稿和晶片处于聚焦状态时照射具有电路图案的原稿制造的半导体器件

    公开(公告)号:US5286963A

    公开(公告)日:1994-02-15

    申请号:US925878

    申请日:1992-08-07

    申请人: Makoto Torigoe

    发明人: Makoto Torigoe

    CPC分类号: G03F7/701 G03F9/7026

    摘要: A projection exposure method and apparatus, in which high precision focus detection is assured even when the manner of illumination is changed. The projection exposure apparatus includes an illumination optical system for defining an illumination light source for illuminating an original having a pattern, the illumination optical system including a device for changing the shape of the illumination light source. The apparatus further includes a projection optical system for projecting an image of the pattern, illuminated by the illumination light source, to a surface to be exposed, a focus detecting system for detecting the state of focus of the original and the surface to be exposed, and an adjusting device for adjusting the focus detecting system in accordance with the change of the shape of the illumination light source by the changing device.

    摘要翻译: 即使改变照明方式,也能够确保高精度的焦点检测的投影曝光方法和装置。 投影曝光装置包括照明光学系统,用于限定用于照射具有图案的原稿的照明光源,该照明光学系统包括用于改变照明光源的形状的装置。 该装置还包括:投影光学系统,用于将由照明光源照射的图案的图像投射到待曝光的表面;焦点检测系统,用于检测原稿的焦点状态和待曝光的表面; 以及调整装置,用于根据改变装置对照明光源的形状的变化来调整焦点检测系统。

    Alignment and exposure apparatus
    73.
    发明授权
    Alignment and exposure apparatus 失效
    对准和曝光设备

    公开(公告)号:US5231471A

    公开(公告)日:1993-07-27

    申请号:US795258

    申请日:1991-11-19

    申请人: Makoto Torigoe

    发明人: Makoto Torigoe

    IPC分类号: G03F7/20 H01L21/68

    CPC分类号: G03F7/70691 H01L21/681

    摘要: An alignment mark detecting device usable with an exposure apparatus for transferring a pattern of an original onto a workpiece having a radiation-sensitive layer, includes a holder for holding the workpiece, a radiation energy source for irradiating the workpiece held by the holder with radiation energy to remove a portion of the radiation-sensitive layer adjacent to an alignment mark formed on the workpiece, and a holder for detecting the alignment mark of the workpiece held by the holder.

    摘要翻译: 一种可用于将原稿图案转印到具有辐射敏感层的工件上的对准标记检测装置,包括用于保持工件的保持器,用于利用辐射能量照射由保持器保持的工件的辐射能源 去除与形成在工件上的对准标记相邻的辐射敏感层的一部分,以及用于检测由保持器保持的工件的对准标记的保持器。

    Exposure apparatus
    74.
    发明授权
    Exposure apparatus 失效
    曝光装置

    公开(公告)号:US4875076A

    公开(公告)日:1989-10-17

    申请号:US206490

    申请日:1988-06-14

    IPC分类号: G03F9/00

    CPC分类号: G03F9/70

    摘要: Step-and-repeat exposure apparatus for printing, by way of a projection optical system, images of a pattern formed on a reticle upon different portions of a semiconductor wafer, placed on a movable stage, is disclosed. On the portion of the movable stage other than the portion upon which the semiconductor wafer is placed, an erasably writable recording medium such as, for example, a magneto-optic recording material or a photochromic material is provided. An image of a mark of a reticle is formed on the recording medium by use of the projection optical system, the thus formed image being photoelectrically detected. From the result of the detection, alignment information concerning, for example, a magnification error, a focus error, a positional error between the reticle and the wafer, for example is obtained.

    Exposure apparatus
    75.
    发明授权
    Exposure apparatus 失效
    曝光装置

    公开(公告)号:US4711568A

    公开(公告)日:1987-12-08

    申请号:US836630

    申请日:1986-03-05

    CPC分类号: G03F7/70558

    摘要: An exposure apparatus and method for irradiating a mask having a circuit pattern with light emitted from an intermittently emitting type light source so that the mask pattern is photolithographically transferred onto a semiconductor wafer, wherein the output of the intermittent-emission type light source is detected prior to the photolithographic transfer of the mask pattern onto the wafer and, in accordance with the result of such detection, the amount of exposure of the wafer to the light beam from the mask is controlled.

    摘要翻译: 一种曝光装置和方法,用于将具有电路图案的掩模与从间歇发射型光源发射的光照射,使得掩模图案被光刻转印到半导体晶片上,其中先前检测到间歇发射型光源的输出 将掩模图案的光刻传输到晶片上,并且根据这种检测的结果,控制晶片对来自掩模的光束的曝光量。

    Illumination apparatus
    76.
    发明授权
    Illumination apparatus 失效
    照明装置

    公开(公告)号:US4682885A

    公开(公告)日:1987-07-28

    申请号:US913619

    申请日:1986-09-30

    申请人: Makoto Torigoe

    发明人: Makoto Torigoe

    摘要: An illumination apparatus for illuminating, with a light beam of arcuate cross-section, a mask having an integrated-circuit pattern to transfer the integrated-circuit pattern onto a semiconductor wafer includes an illumination optical system having a light source, a plurality of cylindircal lenses and a collimator lens to illuminate, in the Kohler illumination manner, a rectangular region on a predetermined plane, a restricting member disposed in the predetermined plane to restrict the light beam incident on the predetermined plane so that a light beam of arcuate cross-section emerges from the predetermined plane, and an optical member for forming an image of the restricting member on the mask. With this arrangement, the pattern of the mask is transferred onto the wafer without any distortion.

    摘要翻译: 一种用于以弓形横截面的光束照射具有集成电路图案的掩模以将集成电路图案转印到半导体晶片上的照明装置包括具有光源的多个照明光学系统,多个圆筒形透镜 以及准直透镜,以科勒照明方式照亮预定平面上的矩形区域,设置在预定平面中的限制构件,以限制入射在预定平面上的光束,使得弓形横截面的光束出现 以及用于在所述掩模上形成所述限制构件的图像的光学构件。 利用这种布置,掩模的图案被转印到晶片上而没有任何变形。

    Image processor and image processing method
    78.
    发明授权
    Image processor and image processing method 有权
    图像处理器和图像处理方法

    公开(公告)号:US08743420B2

    公开(公告)日:2014-06-03

    申请号:US13110503

    申请日:2011-05-18

    IPC分类号: H04N1/405

    CPC分类号: H04N1/6041

    摘要: The present invention is intended to provide an image processor that can reduce color unevenness occurring in a composite color image formed by overlapping different types of inks due to a variation in printing characteristic among a plurality of nozzles while suppressing a reduction in processing speed in generation of printing data. The image processor converts a color signal indicating the image represented by a plurality of elements to a color signal corresponding to the plurality of inks with use of a conversion table determined on the basis of ejection characteristics of nozzle groups corresponding to the plurality of inks so as to suppress color unevenness occurring in a composite color image due to a variation in ejection characteristic among the plurality of nozzles.

    摘要翻译: 本发明旨在提供一种图像处理器,其可以减少由于多个喷嘴中的打印特性的变化而由不同类型的墨重叠而形成的复合彩色图像中产生的颜色不均匀性,同时抑制了生成中的处理速度的降低 打印数据。 图像处理器使用基于与多个墨水对应的喷嘴组的喷射特性确定的转换表将表示由多个元素表示的图像的颜色信号转换为与多个墨相对应的颜色信号,以便 以抑制由于多个喷嘴中的喷射特性的变化而在复合彩色图像中产生的颜色不均匀。

    LED emission wavelength estimation method, image reading apparatus, and multifunction printer apparatus
    79.
    发明授权
    LED emission wavelength estimation method, image reading apparatus, and multifunction printer apparatus 有权
    LED发射波长估计方法,图像读取装置和多功能打印机装置

    公开(公告)号:US08659791B2

    公开(公告)日:2014-02-25

    申请号:US12835702

    申请日:2010-07-13

    申请人: Makoto Torigoe

    发明人: Makoto Torigoe

    IPC分类号: H04N1/60 G06T5/00 H04N1/46

    CPC分类号: H04N1/60 H04N1/48

    摘要: In a prior art, since the wavelengths of R, G, and B LEDs serving as the light sources of a CIS scanner vary, read colors vary between individual scanners. Since the behavior of metamerism also changes due to the same reason, measures against the metamerism are hard to take. To solve this problem, a color patch is irradiated with light from an LED, and its spectral reflectivity is measured using a spectroreflectometer, thereby estimating the emission wavelength of the light source LED. A signal change characteristic representing the relationship to the output signals of three LEDs obtained from the spectral reflectivity of the patch is stored in a memory. In actual image reading, color correction is performed based on the signal change characteristic stored in the memory.

    摘要翻译: 在现有技术中,由于用作CIS扫描器的光源的R,G和B LED的波长变化,所以读取的颜色在各个扫描仪之间变化。 由于同色异教的行为也因同样的原因而变化,反对同色异谱的措施很难采取。 为了解决这个问题,使用来自LED的光照射色标,并且使用分光反射计测量其光谱反射率,从而估计光源LED的发射波长。 表示与从补丁的光谱反射率获得的三个LED的输出信号的关系的信号变化特性被存储在存储器中。 在实际图像读取中,基于存储在存储器中的信号变化特性进行颜色校正。

    INK-JET PRINTING APPARATUS AND INK STAIN DETECTION METHOD IN THE SAME
    80.
    发明申请
    INK-JET PRINTING APPARATUS AND INK STAIN DETECTION METHOD IN THE SAME 有权
    INK-JET印刷设备和墨水检测方法

    公开(公告)号:US20130010025A1

    公开(公告)日:2013-01-10

    申请号:US13524214

    申请日:2012-06-15

    IPC分类号: B41J29/38

    CPC分类号: B41J11/0095 B41J29/17

    摘要: An apparatus includes a printing unit configured to eject ink from a print head onto a sheet conveyed in a direction to perform printing on the sheet; a conveying unit configured to be provided on a downstream side of the print head in the direction, and configured to include a rotating member in contact with the sheet; and a reading unit configured to read a surface of the sheet on a downstream side of the rotating member in the direction, in which information on ink adhesion to the rotating member is obtained based on a result read by the reading unit.

    摘要翻译: 一种设备包括:打印单元,其被配置为将墨从打印头喷射到在纸张上执行打印方向传送的纸张上; 输送单元,其构造成沿所述方向设置在所述打印头的下游侧,并且构造成包括与所述片材接触的旋转构件; 以及读取单元,被配置为基于由读取单元读取的结果,沿着旋转构件的油墨粘附的信息的方向读取旋转构件的下游侧的薄片的表面。