AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITHOGRAPHY
    74.
    发明申请
    AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITHOGRAPHY 审中-公开
    基于芳族乙烯基的反向色调和闪光曝光

    公开(公告)号:US20070298176A1

    公开(公告)日:2007-12-27

    申请号:US11426363

    申请日:2006-06-26

    IPC分类号: B05D3/12 C08F2/46

    摘要: A molding composition and a method of forming an pattern. The method includes forming on a substrate a molding layer of a molding composition of aromatic divinyl ethers; pressing the template into the molding layer, the template having a relief pattern, the molding layer filling voids in the relief pattern, the template not contacting the substrate; exposing the molding layer to actinic radiation, the actinic radiation converting the molding layer to a cured molding layer having thick and thin regions corresponding to the relief pattern; removing the template; filling the thin regions of the relief pattern with a backfill material; removing regions of the molding layer not protected by the backfill material to expose regions of the substrate; forming trenches in the exposed regions of the substrate; and removing any remaining molding layer and backfill material. A transfer layer may be used between the molding layer and the substrate.

    摘要翻译: 成型组合物和形成图案的方法。 该方法包括在基材上形成芳族二乙烯基醚的模塑组合物的模塑层; 将模板压入成型层,模板具有浮雕图案,成型层在浮雕图案中填充空隙,模板不接触基板; 将成型层暴露于光化辐射,光化辐射将成型层转化成具有对应于浮雕图案的厚而薄的区域的固化模塑层; 删除模板; 用填充材料填充浮雕图案的薄区域; 除去未被回填材料保护的成型层的区域以暴露基底的区域; 在衬底的暴露区域中形成沟槽; 并移除任何剩余的成型层和回填材料。 可以在模塑层和基材之间使用转移层。