公开(公告)号：US20120248329A1

公开(公告)日：2012-10-04

申请号：US13437329

申请日：2012-04-02

Applicant: WES FROM ,  BOYKO Metodiev TCHAVDAROV ,  MIKE MARCU ,  RICHARD GRATTON ,  DAVID OLSON ,  JIM FRASER ,  DUSKO A. KEZELE

Inventor： WES FROM ,  BOYKO Metodiev TCHAVDAROV ,  MIKE MARCU ,  RICHARD GRATTON ,  DAVID OLSON ,  JIM FRASER ,  DUSKO A. KEZELE

IPC: B01J19/08

CPC classification number: C02F1/325 ,  A61L2/10 ,  C02F1/006 ,  C02F1/32 ,  C02F2201/3225 ,  C02F2201/3227 ,  C02F2201/3228 ,  C02F2201/324 ,  C02F2201/328

Abstract: The present invention relates to a fluid treatment system comprising: an inlet; an outlet; and a fluid treatment zone disposed between the inlet and the outlet. The fluid treatment zone has disposed therein: (i) an elongate first radiation source assembly having a first longitudinal axis, and (ii) an elongate second radiation source assembly having a second longitudinal axis. The first longitudinal axis and the second longitudinal axis are non-parallel to each other and to a direction of fluid flow through the fluid treatment zone. The present fluid treatment system has a number of advantages including: it can treat large volumes of fluid (e.g., wastewater, drinking water or the like); it requires a relatively small “footprint”; it results in a relatively lower coefficient of drag resulting in an improved hydraulic pressure loss/gradient over the length of the fluid treatment system; and it results in relatively lower (or no) forced oscillation of the radiation sources thereby obviating or mitigating of breakage of the radiation source and/or protective sleeve (if present). Other advantages are discussed in the specification.

Abstract translation: 本发明涉及一种流体处理系统，包括：入口; 一个出口 以及设置在入口和出口之间的流体处理区。 流体处理区已设置在其中：（i）具有第一纵向轴线的细长的第一辐射源组件，和（ii）具有第二纵向轴线的细长的第二辐射源组件。 第一纵向轴线和第二纵向轴线彼此不平行，并且流体流过流体处理区域的方向。 本流体处理系统具有许多优点，包括：它可以处理大量流体（例如，废水，饮用水等）; 它需要相对较小的占地面积; 它导致相对较低的阻力系数导致在流体处理系统的长度上改善的液压损失/梯度; 并且其导致辐射源的相对较低（或不）强制振荡，从而消除或减轻辐射源和/或保护套筒（如果存在）的断裂。 其他优点在说明书中讨论。

公开(公告)号：US20120080054A1

公开(公告)日：2012-04-05

申请号：US13263675

申请日：2010-04-06

Applicant: George Traubenberg ,  Christian Moglan

Inventor： George Traubenberg ,  Christian Moglan

IPC: B08B1/00

CPC classification number: C02F1/325 ,  C02F2201/3225 ,  C02F2201/3227 ,  C02F2201/324

Abstract: There is described a fluid treatment system particularly suited for radiation treatment of a flow of fluid (preferably water). The system comprises a fluid treatment zone for receiving a flow of fluid in contact with a surface of the fluid treatment zone. At least one elongate radiation source assembly is disposed in the fluid treatment zone. The elongate radiation source assembly has a longitudinal axis disposed transverse to a direction of fluid flow through the fluid treatment zone. The system further comprises a cleaning apparatus having at least one cleaning element in contact with an exterior surface of the at least one elongate radiation source assembly. A first motive element is provided and is operable to cause relative movement between a distal end of the at least one elongate radiation source assembly and the surface of the fluid treatment zone to define a gap therebetween. A second motive element is provided and is coupled to the cleaning system. The second motive element operable to move the cleaning system between a cleaning apparatus retracted position and a cleaning apparatus extended position. Movement of the cleaning system from the cleaning apparatus retracted position to the extended position causes debris contacting the at least one elongate radiation source assembly to be pushed into the gap. A radiation source module more use in such a fluid treatment system is also described.

Abstract translation: 描述了特别适用于流体流动（优选水）的辐射处理的流体处理系统。 该系统包括用于接收与流体处理区的表面接触的流体流的流体处理区。 至少一个细长辐射源组件设置在流体处理区域中。 细长辐射源组件具有横向于流过流体处理区的流体流动方向的纵向轴线。 该系统还包括具有与至少一个细长辐射源组件的外表面接触的至少一个清洁元件的清洁设备。 第一动力元件被提供并且可操作以引起至少一个细长辐射源组件的远端和流体处理区域的表面之间的相对运动，以限定它们之间的间隙。 提供第二动力元件并且联接到清洁系统。 第二动力元件可操作以在清洁装置缩回位置和清洁装置延伸位置之间移动清洁系统。 清洁系统从清洁装置缩回位置移动到延伸位置使得与至少一个细长辐射源组件接触的碎屑被推入间隙中。 还描述了在这种流体处理系统中更多使用的辐射源模块。

公开(公告)号：US08119366B2

公开(公告)日：2012-02-21

申请号：US12245518

申请日：2008-10-03

Applicant: Spyros Stylianou

Inventor： Spyros Stylianou

IPC: C07H21/04 ,  C12N15/09 ,  C12N15/10 ,  C12N7/01 ,  C12N5/10 ,  C12P21/02 ,  C07K14/00

CPC classification number: C07K14/43581 ,  A61K38/00 ,  C07K14/4702 ,  C07K2319/10

Abstract: The present invention is based on the discovery that the Notch signaling pathway is associated with cancer. Accordingly, the invention provides methods and compositions for treating cancer. Also provided are methods of modulating the expression and/or activity of proteins in the Notch signaling pathway for use in diagnoses and treatment of cancer in a subject.

Abstract translation: 本发明基于Notch信号传导途径与癌症相关的发现。 因此，本发明提供了治疗癌症的方法和组合物。 还提供了调节Notch信号传导途径中的蛋白质的表达和/或活性用于受试者的癌症诊断和治疗的方法。

公开(公告)号：US07985956B2

公开(公告)日：2011-07-26

申请号：US12158835

申请日：2006-12-21

Applicant: Jim Fraser ,  Michael Sasges

Inventor： Jim Fraser ,  Michael Sasges

IPC: G01N23/12

CPC classification number: A61L2/10 ,  C02F1/325 ,  C02F2201/004 ,  C02F2303/14

Abstract: There is described a fluid treatment system which may which may be used with radiation sources that do not require a protective sleeve—e.g., excimer radiation sources. An advantage of the present fluid system treatment is that the radiation sources may be removed from the fluid treatment zone without necessarily having to shut down the fluid treatment system, remove the fluid, break the seals which retain fluid tightness, replace/service radiation source and than reverse the steps. Instead, the present fluid treatment system allows for service/replacement of the radiation sources in the fluid treatment zone during operation of the fluid treatment system.

Abstract translation: 描述了可以与不需要保护套筒（例如准分子辐射源）的辐射源一起使用的流体处理系统。 本发明的流体系统处理的优点是可以从流体处理区域去除辐射源，而不必关闭流体处理系统，去除流体，破坏保持流体密封性的密封件，更换/使用辐射源和 反转步骤。 相反，本流体处理系统允许在流体处理系统的操作期间对流体处理区域中的辐射源进行维修/更换。

公开(公告)号：US07960705B2

公开(公告)日：2011-06-14

申请号：US12158849

申请日：2006-12-21

Applicant: Jim Fraser ,  Michael Sasges

Inventor： Jim Fraser ,  Michael Sasges

IPC: G01N23/12

CPC classification number: H01J61/70 ,  A61L2/10 ,  C02F1/325 ,  C02F2201/3223 ,  H01J61/52 ,  H01J65/046

Abstract: There is described an excimer radiation lamp assembly. The lamp assembly comprises: an elongate member having an annular cross-section to define an elongate passageway aligned with a longitudinal axis of the lamp assembly; an electrode element in electrical connection with at least a portion of the elongate passageway; and a cooling element disposed in the elongate passageway, the cooling element being electrically isolated with respect to the electrode element.

Abstract translation: 描述了准分子辐射灯组件。 灯组件包括：细长构件，其具有环形横截面以限定与灯组件的纵向轴线对齐的细长通道; 与所述细长通道的至少一部分电连接的电极元件; 以及设置在所述细长通道中的冷却元件，所述冷却元件相对于所述电极元件电隔离。

公开(公告)号：US20110021441A1

公开(公告)日：2011-01-27

申请号：US12608718

申请日：2009-10-29

Applicant: Agamemnon Epenetos ,  Christina Kousparou

Inventor： Agamemnon Epenetos ,  Christina Kousparou

IPC: A61K38/16 ,  C07K19/00 ,  C07H21/04 ,  C12N15/63

CPC classification number: C07K14/4738 ,  A61K31/337 ,  A61K31/513 ,  A61K31/555 ,  A61K33/24 ,  A61K38/005 ,  A61K38/1709 ,  A61K38/1767 ,  A61K45/06 ,  A61K47/64 ,  C07K14/43581 ,  C07K2319/10 ,  A61K2300/00

Abstract: The P21 protein is used as a medicament in the treatment of cancer. A conjugate comprises a first region comprising the P21 protein, or a homologue or functional fragment thereof; and a second region comprising a translocation factor.

Abstract translation: P21蛋白用作治疗癌症的药物。 缀合物包含包含P21蛋白的第一区或其同源物或功能片段; 和包含易位因子的第二区域。

公开(公告)号：US07842932B2

公开(公告)日：2010-11-30

申请号：US12131485

申请日：2008-06-02

Applicant: Douglas G. Knight ,  Jim Fraser ,  Michael Sasges

Inventor： Douglas G. Knight ,  Jim Fraser ,  Michael Sasges

IPC: A61L2/10 ,  C02F1/32

CPC classification number: A61L2/10 ,  A23C3/076 ,  H01L33/405 ,  H01L2224/14

Abstract: There is disclosed an ultraviolet radiation device. The device comprises a base portion, a plurality of semiconductor structures connected to the base portion and an ultraviolet radiation transparent element connected to the plurality of semiconductor structures. Preferably: (i) the at least one light emitting diode is in direct contact with the ultraviolet radiation transparent element, or (ii) there is a spacing between the at least one light emitting diode and the ultraviolet radiation transparent element, the spacing being substantially completely free of air. There is also disclosed a fluid treatment system incorporating the ultraviolet radiation device.

Abstract translation: 公开了一种紫外线照射装置。 该装置包括基部，连接到基部的多个半导体结构以及连接到多个半导体结构的紫外线透射元件。 优选地：（i）至少一个发光二极管与紫外线辐射透明元件直接接触，或者（ii）至少一个发光二极管和紫外线辐射透明元件之间存在间隔，该间隔基本上 完全没有空气。 还公开了结合有紫外线辐射装置的流体处理系统。

公开(公告)号：US20100187437A1

公开(公告)日：2010-07-29

申请号：US12752965

申请日：2010-04-01

Applicant: PETER UEBERALL

Inventor： PETER UEBERALL

IPC: G21K5/00

CPC classification number: A61L2/10 ,  B01J19/123 ,  B01J2219/0869 ,  B01J2219/0877 ,  C02F1/325 ,  C02F2201/3227 ,  C02F2301/02

Abstract: The object of the invention is a double-walled chamber for the UV disinfection of liquids, preferably drinking water and/or waste water. It realizes a rectangular and/or square cross-sectional shape of the UV radiation chamber even at higher pressures, whereby the radiation chamber can moreover be provided with a thin-walled configuration and allows an optimal and close arrangement of UV radiators as compared with a round chamber. By applying the inventive idea, the known dead zones at the entrance are completely eliminated and an entrance turbulence is produced which runs simultaneously with the piston flow in the chamber.

Abstract translation: 本发明的目的是用于对液体（优选饮用水和/或废水）进行紫外线消毒的双壁室。 即使在更高的压力下也能实现UV辐射室的矩形和/或正方形截面形状，由此辐射室还可以具有薄壁结构，并允许UV辐射器的最佳和紧密配置与 圆室。 通过应用本发明的想法，入口处的已知死区被完全消除，并且产生与腔室中的活塞流同时运行的入口湍流。

公开(公告)号：US20090267004A1

公开(公告)日：2009-10-29

申请号：US12158817

申请日：2006-12-21

Applicant: Jim Fraser ,  Michael Sasges

Inventor： Jim Fraser ,  Michael Sasges

IPC: H05G2/00

CPC classification number: A61L2/10 ,  C02F1/325 ,  C02F2201/3225 ,  C02F2201/324 ,  H01J61/30 ,  H01J65/00

Abstract: There is described an excimer radiation lamp assembly. The lamp assembly comprise a radiation emitting region and at least one substantially radiation opaque region. The radiation emitting region comprises a pair of dielectric elements disposed in a substantially coaxial arrangement.

Abstract translation: 描述了准分子辐射灯组件。 灯组件包括辐射发射区域和至少一个基本上辐射不透明区域。 辐射发射区域包括以基本上同轴的布置设置的一对电介质元件。

公开(公告)号：US20090026385A1

公开(公告)日：2009-01-29

申请号：US12131485

申请日：2008-06-02

Applicant: Douglas G. Knight ,  Jim Fraser ,  Michael Sasges

Inventor： Douglas G. Knight ,  Jim Fraser ,  Michael Sasges

IPC: G01N23/12 ,  H01L33/00

CPC classification number: A61L2/10 ,  A23C3/076 ,  H01L33/405 ,  H01L2224/14

Abstract: There is disclosed an ultraviolet radiation device. The device comprises a base portion, a plurality of semiconductor structures connected to the base portion and an ultraviolet radiation transparent element connected to the plurality of semiconductor structures. Preferably: (i) the at least one light emitting diode is in direct contact with the ultraviolet radiation transparent element, or (ii) there is a spacing between the at least one light emitting diode and the ultraviolet radiation transparent element, the spacing being substantially completely free of air. There is also disclosed a fluid treatment system incorporating the ultraviolet radiation device.

Abstract translation: 公开了一种紫外线照射装置。 该装置包括基部，连接到基部的多个半导体结构以及连接到多个半导体结构的紫外线透射元件。 优选地：（i）至少一个发光二极管与紫外线辐射透明元件直接接触，或者（ii）至少一个发光二极管和紫外线辐射透明元件之间存在间隔，该间隔基本上 完全没有空气。 还公开了结合有紫外线辐射装置的流体处理系统。