摘要:
A photovoltaic device including a rear electrode which may also function as a rear reflector. In certain example embodiments of this invention, the rear electrode includes a metallic based reflective film that is oxidation graded, so as to be more oxided closer to a rear substrate (e.g., glass substrate) supporting the electrode than at a location further from the rear substrate. In other words, the rear electrode is oxidation graded so as to be less oxided closer to a semiconductor absorber of the photovoltaic device than at a location further from the semiconductor absorber in certain example embodiments. In certain example embodiments, the interior surface of the rear substrate may optionally be textured so that the rear electrode deposited thereon is also textured so as to provide desirable electrical and reflective characteristics. In certain example embodiments, the rear electrode may be of or include Mo and/or MoOx, and may be sputter-deposited using a combination of MoOx and Mo sputtering targets.
摘要:
This invention relates to a photovoltaic device including a front contact and/or a method of making the same. In certain example embodiments, the transparent conductive oxide (TCO) front contact is of indium zinc oxide (IZO). In other example embodiments, the IZO may have other element(s) such as silver (Ag) added thereto so that the front contact may be of or include zinc aluminum silver oxide (ZnAlAgO) for example. Moreover, in certain example embodiments the front contact (e.g., IZO or ZnAlAgO) may be sputter-deposited in an oxygen deficient form (substoichiometric); so that subsequent heat treatment or baking used in the photovoltaic device manufacturing (e.g., for subsequent layer formation) results in an optimal stoichiometry which may or may not be substoichiometric in the final product.
摘要:
A method of making a coated article including a transparent conductive oxide (TCO) film supported by a glass substrate is provided. Initially, an amorphous metal oxide film is sputter-deposited onto a glass substrate, either directly or indirectly. The glass substrate with the amorphous film and a semiconductor film thereon is then thermally treated at high temperature(s). The thermal treating causes the amorphous film to be transformed into a crystalline transparent conductive oxide (TCO) film. The heat used in the thermal treating causes the amorphous film to turn into a crystalline film, causes the visible transmission of the film to increase, and/or causes the film to become electrically conductive.
摘要:
The present invention introduces a novel design for active matrix displays, utilizing both organic light-emitting diode (OLED) and thin-film electroluminescent technologies. In a first aspect there is provided a top-emitting OLED, including an optical interference contrast-enhancing stack that is placed on the top of the driving thin-film transistor, and which extendes to the entire pixel area to cover the reflecting parts of the pixel. In a second aspect, there is provided a bottom-emitting OIED wherein an optical interference contrast-enhancing stack is placed right under the driving thin-film transistor and, separately between the organic stack and the top electrode, typically a cathode. The optical interference contrast-enhancing stack suppresses light reflection from the thin-film transistor and the upper electrode. In the top emitting design, the optical interference contrast-enhancing stack is placed on the top of the thin-film transistor source and drain electrodes as well as on the top of the opaque bottom electrode. A method of achieving substantial uniformity across a display having multiple areas of optical interference members is also provided.