摘要:
Apparatus and methods of actuating MEMS display elements are disclosed. The disclosed embodiments can be incorporated into other drive schemes for MEMS display elements. In one embodiment, an apparatus for controlling a MEMS display element to display a frame of video data, said MEMS display element comprising a portion of an array of MEMS display elements, includes an array controller configured to assert a potential difference on said MEMS display element during a first portion of a frame display write process to place the MEMS display element in a first display state, and to assert a potential difference on said MEMS display element during a second portion of the frame display write process to place the MEMS display element in a second display state to display the frame of the video data, where the first display state is different from the second display state. In another embodiment, an array controller asserts a large potential difference across a MEMS display element to affect charge build up and an offset voltage level. In another embodiment, an array controller asserts a series of pulses to rapidly switch the MEMS display element between states to overcome adverse conditions that may affect the operation of the MEMS display element.
摘要:
Disclosed herein are iMoD displays optimized by utilizing different materials for one or more different color subpixels. Such optimized displays have improved color gamut over displays where all subpixels are constructed with the same material. Also disclosed are methods for manufacturing such displays and methods for optimizing iMoD displays.
摘要:
Process control monitors are disclosed that are produced using at least some of the same process steps used to manufacture a MEMS device. Analysis of the process control monitors can provide information regarding properties of the MEMS device and components or sub-components in the device. This information can be used to identify errors in processing or to optimize the MEMS device. In some embodiments, analysis of the process control monitors may utilize optical measurements.
摘要:
An optical isolation structure is incorporated into a display between the display elements and the transparent substrate for the display elements. The optical isolation structure reflects light rays within the substrate that impact the structure at high angles relative to normal to the structure, thereby permitting the substrate to be used as an integrated light guide for distributing light over the display from a light source on the edge of the substrate. The optical isolation structure may include a single layer having an index of refraction less than the substrate or a plurality of thin-film interference layers.
摘要:
Process control monitors are disclosed that are produced using at least some of the same process steps used to manufacture a MEMS device. Analysis of the process control monitors can provide information regarding properties of the MEMS device and components or sub-components in the device. This information can be used to identify errors in processing or to optimize the MEMS device. In some embodiments, analysis of the process control monitors may utilize optical measurements.
摘要:
Process control monitors are disclosed that are produced using at least some of the same process steps used to manufacture a MEMS device. Analysis of the process control monitors can provide information regarding properties of the MEMS device and components or sub-components in the device. This information can be used to identify errors in processing or to optimize the MEMS device. In some embodiments, analysis of the process control monitors may utilize optical measurements.
摘要:
A specular interferometric modulator array is configured to be at least partially selectably reflective. As such, the array forms a mirror surface having the capability of displaying information to the user while simultaneously being used as a specular mirror. The displayed information may be based on information from an external source, may be programmable, and may be based on user input.
摘要:
Process control monitors are disclosed that are produced using at least some of the same process steps used to manufacture a MEMS device. Analysis of the process control monitors can provide information regarding properties of the MEMS device and components or sub-components in the device. This information can be used to identify errors in processing or to optimize the MEMS device. In some embodiments, analysis of the process control monitors may utilize optical measurements.
摘要:
Abstract of the DisclosureMethods and apparatus are disclosed for directing light from a remote light source into interferometric modulator structures. Light redirectors, including reflective structures, scattering centers, and fluorescent or phosphorescent material, are used to redirect light from a light source into interferometric modulator structures.
摘要:
Process control monitors are disclosed that are produced using at least some of the same process steps used to manufacture a MEMS device. Analysis of the process control monitors can provide information regarding properties of the MEMS device and components or sub-components in the device. This information can be used to identify errors in processing or to optimize the MEMS device. In some embodiments, analysis of the process control monitors may utilize optical measurements.