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    Internal optical isolation structure for integrated front or back lighting
    1.
    发明授权
    Internal optical isolation structure for integrated front or back lighting 有权
    用于集成前后照明的内部光隔离结构

    公开(公告)号：US07855827B2

    公开(公告)日：2010-12-21

    申请号：US11544978

    申请日：2006-10-06

    申请人： Gang Xu ,  Alan Lewis ,  Brian Gally ,  Mark Mienko

    发明人： Gang Xu ,  Alan Lewis ,  Brian Gally ,  Mark Mienko

    IPC分类号： G02B26/00 ,  G02F1/29

    CPC分类号： G02B6/0011 ,  G02B6/0038 ,  G02B6/0055 ,  G02B26/001 ,  G09G3/3466

    摘要： An optical isolation structure is incorporated into a display between the display elements and the transparent substrate for the display elements. The optical isolation structure reflects light rays within the substrate that impact the structure at high angles relative to normal to the structure, thereby permitting the substrate to be used as an integrated light guide for distributing light over the display from a light source on the edge of the substrate. The optical isolation structure may include a single layer having an index of refraction less than the substrate or a plurality of thin-film interference layers.

    摘要翻译： 在显示元件和用于显示元件的透明基板之间的显示器中并入光学隔离结构。 光学隔离结构反射基板内的光线相对于结构垂直地以高角度冲击结构，从而允许基板用作集成光导，用于将光从光源的边缘分布在显示器上 底物。 光隔离结构可以包括具有小于衬底或多个薄膜干涉层的折射率的单层。

    Internal optical isolation structure for integrated front or back lighting
    2.
    发明申请
    Internal optical isolation structure for integrated front or back lighting 有权
    用于集成前后照明的内部光隔离结构

    公开(公告)号：US20080084602A1

    公开(公告)日：2008-04-10

    申请号：US11544978

    申请日：2006-10-06

    申请人： Gang Xu ,  Alan Lewis ,  Brian Gally ,  Mark Mienko

    发明人： Gang Xu ,  Alan Lewis ,  Brian Gally ,  Mark Mienko

    IPC分类号： G02B26/00

    CPC分类号： G02B6/0011 ,  G02B6/0038 ,  G02B6/0055 ,  G02B26/001 ,  G09G3/3466

    摘要： An optical isolation structure is incorporated into a display between the display elements and the transparent substrate for the display elements. The optical isolation structure reflects light rays within the substrate that impact the structure at high angles relative to normal to the structure, thereby permitting the substrate to be used as an integrated light guide for distributing light over the display from a light source on the edge of the substrate. The optical isolation structure may include a single layer having an index of refraction less than the substrate or a plurality of thin-film interference layers.

    摘要翻译： 在显示元件和用于显示元件的透明基板之间的显示器中并入光学隔离结构。 光学隔离结构反射基板内的光线相对于结构垂直地以高角度冲击结构，从而允许基板用作集成光导，用于将光从光源的边缘分布在显示器上 底物。 光隔离结构可以包括具有小于衬底或多个薄膜干涉层的折射率的单层。

    Internal optical isolation structure for integrated front or back lighting
    3.
    发明授权
    Internal optical isolation structure for integrated front or back lighting 有权

    公开(公告)号：US07684107B2

    公开(公告)日：2010-03-23

    申请号：US11544978

    申请日：2006-10-06

    申请人： Gang Xu ,  Alan Lewis ,  Brian Gally ,  Mark Mienko

    发明人： Gang Xu ,  Alan Lewis ,  Brian Gally ,  Mark Mienko

    IPC分类号： G02B26/00 ,  G02F1/29

    摘要： An optical isolation structure is incorporated into a display between the display elements and the transparent substrate for the display elements. The optical isolation structure reflects light rays within the substrate that impact the structure at high angles relative to normal to the structure, thereby permitting the substrate to be used as an integrated light guide for distributing light over the display from a light source on the edge of the substrate. The optical isolation structure may include a single layer having an index of refraction less than the substrate or a plurality of thin-film interference layers.

    Method and system for color optimization in a display
    4.
    发明授权
    Method and system for color optimization in a display 有权
    显示器颜色优化的方法和系统

    公开(公告)号：US07855824B2

    公开(公告)日：2010-12-21

    申请号：US11036966

    申请日：2005-01-14

    申请人： Brian Gally

    发明人： Brian Gally

    IPC分类号： G02B26/00 ,  G09G5/10

    CPC分类号： G02B26/001 ,  Y10T29/49117

    摘要： Disclosed herein are iMoD displays optimized by utilizing different materials for one or more different color subpixels. Such optimized displays have improved color gamut over displays where all subpixels are constructed with the same material. Also disclosed are methods for manufacturing such displays and methods for optimizing iMoD displays.

    摘要翻译： 本文公开了通过利用用于一个或多个不同颜色子像素的不同材料来优化的iMoD显示器。 这种优化的显示器在显示器上具有改善的色域，其中所有子像素由相同的材料构成。 还公开了用于制造这种显示器的方法和用于优化iMoD显示器的方法。

    Optical interference display panel and manufacturing method thereof
    5.
    发明授权
    Optical interference display panel and manufacturing method thereof 有权
    光干涉显示面板及其制造方法

    公开(公告)号：US07532385B2

    公开(公告)日：2009-05-12

    申请号：US10807128

    申请日：2004-03-24

    申请人： Wen-Jian Lin ,  Brian Arbuckle ,  Brian Gally ,  Philip Floyd ,  Lauren Palmateer

    发明人： Wen-Jian Lin ,  Brian Arbuckle ,  Brian Gally ,  Philip Floyd ,  Lauren Palmateer

    IPC分类号： G02B26/00 ,  H01L21/00

    CPC分类号： G02B26/001 ,  B81B7/0012 ,  B81B2201/045

    摘要： A first electrode and a sacrificial layer are sequentially formed on a substrate, and then first openings for forming supports inside are formed in the first electrode and the sacrificial layer. The supports are formed in the first openings, and then a second electrode is formed on the sacrificial layer and the supports, thus forming a micro electro mechanical system structure. Afterward, an adhesive is used to adhere and fix a protection structure to the substrate for forming a chamber to enclose the micro electro mechanical system structure, and at least one second opening is preserved on sidewalls of the chamber. A release etch process is subsequently employed to remove the sacrificial layer through the second opening in order to form cavities in an optical interference reflection structure. Finally, the second opening is closed to seal the optical interference reflection structure between the substrate and the protection structure.

    摘要翻译： 第一电极和牺牲层依次形成在基板上，然后在第一电极和牺牲层中形成用于形成支撑件的第一开口。 支撑件形成在第一开口中，然后在牺牲层和支撑件上形成第二电极，从而形成微机电系统结构。 之后，使用粘合剂将保护结构粘附并固定到基底上以形成腔室以包围微机电系统结构，并且至少一个第二开口保留在腔室的侧壁上。 随后采用释放蚀刻工艺以通过第二开口去除牺牲层，以便在光学干涉反射结构中形成空腔。 最后，关闭第二个开口以密封衬底和保护结构之间的光学干涉反射结构。

    Systems and methods for measuring color and contrast in specular reflective devices
    6.
    发明授权
    Systems and methods for measuring color and contrast in specular reflective devices 失效
    用于测量镜面反射装置中的颜色和对比度的系统和方法

    公开(公告)号：US07417735B2

    公开(公告)日：2008-08-26

    申请号：US11198603

    申请日：2005-08-05

    申请人： William Cummings ,  Brian Gally

    发明人： William Cummings ,  Brian Gally

    IPC分类号： G01N21/27 ,  G01J3/50 ,  G01J1/16 ,  G02B26/02 ,  G02F1/21

    CPC分类号： H04N9/3194 ,  G02B26/001 ,  H04N17/02

    摘要： Disclosed herein are systems and methods for measuring color and contrast in specular reflective devices such as interferometric modulators. To make color and contrast determinations, light reflected from a specular reflective device may be measured in-line with illumination of the device. The measurements may include measuring the spectra of light reflected from the device being tested as well as from specular bright and dark standards. The spectra may be used to determine a reflectance spectrum and color parameters for the specular reflective device.

    摘要翻译： 本文公开了用于测量镜面反射装置（例如干涉式调制器）中的颜色和对比度的系统和方法。 为了进行颜色和对比度测定，可以与装置的照明一起测量从镜面反射装置反射的光。 测量可以包括测量从被测设备反射的光的光谱以及镜面明暗标准。 光谱可用于确定镜面反射装置的反射光谱和颜色参数。

    SYSTEM AND METHOD OF TESTING HUMIDITY IN A SEALED MEMS DEVICE
    7.
    发明申请
    SYSTEM AND METHOD OF TESTING HUMIDITY IN A SEALED MEMS DEVICE 失效
    密封MEMS器件测试湿度的系统和方法

    公开(公告)号：US20080115596A1

    公开(公告)日：2008-05-22

    申请号：US12021218

    申请日：2008-01-28

    申请人： Brian Gally ,  Lauren Palmateer ,  Manish Kothari ,  Williams Cummings

    发明人： Brian Gally ,  Lauren Palmateer ,  Manish Kothari ,  Williams Cummings

    IPC分类号： G01G9/00

    CPC分类号： B81C99/0045 ,  G01M3/002 ,  G01M3/02 ,  G01M3/186 ,  G01M3/229 ,  G02B26/001 ,  Y10T29/49002

    摘要： One embodiment provides a method of testing humidity. The method includes measuring i) a first weight of a first device which encloses a plurality of interferometric modulators and ii) a second weight of a second device which encloses a plurality of interferometric modulators, wherein the first and second devices contain a different amount of water vapor. The method further includes comparing the weights of the first and second devices and determining a relative humidity value or a degree of the relative humidity inside one of the two devices based at least in part upon the weight comparison. In one embodiment, the relative humidity value or degree is determined considering at least one of the following parameters: i) temperature-humidity combination inside at least one of the devices, ii) the thickness and width of a seal of the at least one device, iii) adhesive permeability of a component of the at least one device, iv) a desiccant capacity inside the at least one device and v) a device size.

    摘要翻译： 一个实施例提供了测试湿度的方法。 该方法包括测量i）包围多个干涉式调制器的第一装置的第一权重和ii）封闭多个干涉式调制器的第二装置的第二权重，其中第一和第二装置含有不同量的水 汽。 该方法还包括比较第一和第二装置的重量，并且至少部分地基于重量比较来确定两个装置之一内的相对湿度值或相对湿度的程度。 在一个实施例中，考虑以下参数中的至少一个来确定相对湿度值或度数：i）至少一个装置内的温度 - 湿度组合，ii）至少一个装置的密封件的厚度和宽度 ，iii）所述至少一个装置的部件的粘合剂渗透性，iv）所述至少一个装置内的干燥剂容量，以及v）装置尺寸。

    Process control monitors for interferometric modulators
    8.
    发明授权
    Process control monitors for interferometric modulators 失效
    过程控制监视器用于干涉式调制器

    公开(公告)号：US07369252B2

    公开(公告)日：2008-05-06

    申请号：US11281758

    申请日：2005-11-17

    申请人： William Cummings ,  Brian Gally

    发明人： William Cummings ,  Brian Gally

    IPC分类号： G01B9/02 ,  G01B11/02 ,  G02B26/00

    CPC分类号： B81C99/004 ,  B81B2201/042 ,  G01N21/55 ,  G01N21/9501 ,  G02B26/001

    摘要： Process control monitors are disclosed that are produced using at least some of the same process steps used to manufacture a MEMS device. Analysis of the process control monitors can provide information regarding properties of the MEMS device and components or sub-components in the device. This information can be used to identify errors in processing or to optimize the MEMS device. In some embodiments, analysis of the process control monitors may utilize optical measurements.

    摘要翻译： 公开了使用用于制造MEMS器件的至少一些相同工艺步骤制造的过程控制监视器。 过程控制监视器的分析可以提供关于MEMS器件和器件中的部件或子部件的属性的信息。 该信息可用于识别处理中的错误或优化MEMS器件。 在一些实施例中，过程控制监视器的分析可以利用光学测量。

    PROCESS FOR MODIFYING OFFSET VOLTAGE CHARACTERISTICS OF AN INTERFEROMETRIC MODULATOR
    9.
    发明申请
    PROCESS FOR MODIFYING OFFSET VOLTAGE CHARACTERISTICS OF AN INTERFEROMETRIC MODULATOR 失效
    用于修改干涉仪调制器偏移电压特性的方法

    公开(公告)号：US20080093688A1

    公开(公告)日：2008-04-24

    申请号：US11961744

    申请日：2007-12-20

    申请人： William Cummings ,  Brian Gally

    发明人： William Cummings ,  Brian Gally

    IPC分类号： H01L29/84 ,  H01L21/00

    CPC分类号： G09G3/3466 ,  G02B26/001 ,  G09G2320/0204

    摘要： An interferometric modulator manufactured according to a particular set of processing parameters may have a non-zero offset voltage. A process has been developed for modifying the processing parameters to shift the non-zero offset voltage closer to zero. For example, the process may involve identifying a set of processing parameters for manufacturing an interferometric modulator that results in a non-zero offset voltage for the interferometric modulator. The set of processing parameters may then be modified to shift the non-zero offset voltage closer to zero. For example, modifying the set of processing parameters may involve modifying one or more deposition parameters used to make the interferometric modulator, applying a current (e.g., a counteracting current) to the interferometric modulator, and/or annealing the interferometric modulator. Interferometric modulators made according to the set of modified processing parameters may have improved performance and/or simpler drive schemes.

    摘要翻译： 根据特定一组处理参数制造的干涉式调制器可以具有非零偏移电压。 已经开发了一种用于修改处理参数以将非零偏移电压更接近零的过程。 例如，该过程可以涉及识别用于制造干涉式调制器的一组处理参数，其导致用于干涉式调制器的非零偏移电压。 然后可以修改该组处理参数以使非零偏移电压更接近零。 例如，修改处理参数集合可以包括修改用于制造干涉式调制器的一个或多个沉积参数，向干涉式调制器施加电流（例如，抵消电流）和/或退火干涉式调制器。 根据经修改的处理参数的集合制造的干涉式调制器可以具有改进的性能和/或更简单的驱动方案。