公开(公告)号：US20150056558A1

公开(公告)日：2015-02-26

申请号：US14532134

申请日：2014-11-04

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Emad Aqad ,  Cheng-Bai Xu ,  Mingqi Li ,  Shintaro Yamada ,  William Williams, III

IPC: G03F7/038 ,  G03F7/004 ,  G03F7/30

CPC classification number: G03F7/30 ,  C07C309/65 ,  C07C311/09 ,  C07C2603/74 ,  C07D313/08 ,  C07D313/10 ,  C07D327/04 ,  C07D493/18 ,  C07D497/18 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0397 ,  G03F7/2041

Abstract: A photoacid generator compound has the formula (I): [A—(CHR1)p]k-(L)—(CH2)m—(C(R2)2)nSO3−Z+  (I) wherein A is a substituted or unsubstituted, monocyclic, polycyclic, or fused polycyclic C5 or greater cycloaliphatic group optionally comprising O, S, N, F, or a combination comprising at least one of the foregoing, R1 is H, a single bond, or a substituted or unsubstituted C1-30 alkyl group, wherein when R1 is a single bond, R1 is covalently bonded to a carbon atom of A, each R2 is independently H, F, or C1-4 fluoroalkyl, wherein at least one R2 is not hydrogen, L is a linking group comprising a sulfonate group, a sulfonamide group, or a C1-30 sulfonate or sulfonamide-containing group, Z is an organic or inorganic cation, p is an integer of 0 to 10, k is 1 or 2, m is an integer of 0 or greater, and n is an integer of 1 or greater. A precursor compound to the photoacid generator, a photoresist composition including the photoacid generator, and a substrate coated with the photoresist composition, are also disclosed.

Abstract translation: 光生酸化合物具有式（I）：其中A是取代或未取代的（A）（A）所示的[A-（CHR1）p] k-（L） - （CH2）m-（C（R2）2）nSO3-Z + ，任选包含O，S，N，F或包含至少一个前述的组合的单环，多环或稠合多环C 5或更多脂环族基团，其中R 1为H，单键或取代或未取代的C1-30 烷基，其中当R 1为单键时，R 1与A的碳原子共价键合，每个R 2独立地为H，F或C 1-4氟代烷基，其中至少一个R 2不是氢，L是连接基团 包括磺酸酯基，磺酰胺基或含C 1〜30磺酸酯或磺酰胺的基团，Z为有机或无机阳离子，p为0〜10的整数，k为1或2，m为0的整数 以上，n为1以上的整数。 还公开了光致酸产生剂的前体化合物，包含光致酸产生剂的光致抗蚀剂组合物和涂有光致抗蚀剂组合物的基材。

公开(公告)号：US20140295347A1

公开(公告)日：2014-10-02

申请号：US13854078

申请日：2013-03-30

Applicant: Rohm and Haas Electronic Materials, LLC

Inventor： Emad Aqad ,  Irvinder Kaur ,  Cong Liu ,  Cheng-Bai Xu

IPC: G03F7/004 ,  C07D317/34 ,  G03F7/20 ,  C07D319/06

CPC classification number: G03F7/0045 ,  C07C309/12 ,  C07C2603/74 ,  C07D317/34 ,  C07D317/72 ,  C07D319/06 ,  C07D319/08 ,  G03F7/039 ,  G03F7/0392

Abstract: Acid generator compounds are provided that comprise an oxo-1,3-dioxolane moiety and/or an oxo-1,3-dioxane moiety. The acid generators are particularly useful as a photoresist composition component.

Abstract translation: 提供酸产生剂化合物，其包含氧代-1,3-二氧戊环部分和/或氧代-1,3-二恶烷部分。 酸发生剂特别可用作光致抗蚀剂组合物组分。