摘要:
Novel methods for reliably and reproducibly forming magnetic tunnel junctions in integrated circuits are described. In accordance with aspects of the invention, sidewall spacer features are utilized during the processing of the film stack. Advantageously, these sidewall spacer features create a tapered masking feature which helps to avoid byproduct redeposition during the etching of the MTJ film stack, thereby improving process yield. Moreover, the sidewall spacer features may be used as encapsulating layers during subsequent processing steps and as vertical contacts to higher levels of metallization.
摘要:
A coupling element includes a first stage having a dielectric waveguide that is transitioned to a waveguide having a sequence of resonators with a fixed period. A second stage transitions the waveguide to a photonic crystal waveguide by gradually bringing closer at an angle the cladding bulk of the photonic crystal to the waveguide.
摘要:
A microcavity structure includes a first waveguide that includes a first photonic crystal microcavity. A second waveguide includes a second photonic crystal microcavity. A microcavity active region is created by overlapping the first and second microcavities.