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    Pigmented silicon nitride
    83.
    发明授权
    Pigmented silicon nitride 失效
    着色氮化硅

    公开(公告)号：US6004895A

    公开(公告)日：1999-12-21

    申请号：US38746

    申请日：1998-03-11

    申请人： Chienchung James Shih ,  Andre Ezis

    发明人： Chienchung James Shih ,  Andre Ezis

    IPC分类号： C04B35/593 ,  C04B35/587

    CPC分类号： C04B35/593

    摘要： A pigmented silicon nitride composition suitable for hot pressing into near shape articles of manufacture having a cosmetically uniform color. The composition comprises high purity, sub-micrometer, alpha silicon nitride powder mixed with a sintering aid and a pigmenting material. In a preferred embodiment the pigmenting material comprises molybdenum carbide, although carbides of other elements are applicable as well. The resulting hot pressed article is cosmetically superior to non-pigmented silicon nitride. Such articles are especially useful for processing semiconductor components where appearance in the form of color uniformity is a strict requirement for the manufacturer and the customer.

    摘要翻译： 一种颜料氮化硅组合物，适于热压成具有化妆品均匀颜色的近似形状的制品。 该组合物包含与烧结助剂和着色材料混合的高纯度，亚微米，α氮化硅粉末。 在优选实施方案中，着色材料包括碳化钼，尽管也可以使用其它元素的碳化物。 所得热压制品在美容上优于非着色氮化硅。 这种制品对于处理半导体部件尤为有用，其中以颜色均匀性的形式的外观对制造商和客户是严格要求的。

    Silicon nitride sintered material
    84.
    发明授权
    Silicon nitride sintered material 失效
    氮化硅烧结材料

    公开(公告)号：US5945363A

    公开(公告)日：1999-08-31

    申请号：US912516

    申请日：1997-08-18

    申请人： Yasufumi Aihara ,  Katsuhiro Inoue

    发明人： Yasufumi Aihara ,  Katsuhiro Inoue

    IPC分类号： C04B35/584 ,  C04B35/593 ,  C04B41/00 ,  C04B41/50 ,  C04B41/80 ,  C04B41/87 ,  C04B35/587

    CPC分类号： C04B41/009 ,  C04B35/5935 ,  C04B41/0072 ,  C04B41/5035 ,  C04B41/80 ,  C04B41/87

    摘要： A silicon nitride sintered material includes silicon nitride and rare earth element compounds. Y and Yb are contained as the rare earth elements in a total amount of 5-7 mole % in terms of oxides, Yb/Y is 4/6 to 9/1 in terms of molar ratio of oxides, and the crystal phases of grain boundary contain a H phase and a J phase with the proportion of the H phase being larger than that of the J phase. A process for producing a silicon nitride sintered material includes the steps of mixing a Si.sub.3 N.sub.4 powder with Y.sub.2 O.sub.3 and Yb.sub.2 O.sub.3 both as a sintering aid, the total amount of Y.sub.2 O.sub.3 and Yb.sub.2 O.sub.3 being 5-7 mole % and the molar ratio of Yb.sub.2 O.sub.3 /Y.sub.2 O.sub.3 being 4/6 to 9/1, molding the resulting mixture, sintering the molded material in a nitrogen atmosphere at 1,850-1,950.degree. C., and heat-treating the sintered material in air at 1,000-1,500.degree. C. for 0.5-10 hours. The silicon nitride sintered material has, in a small or large thickness, oxidation resistance and strength at low temperatures while retaining high strength at high temperatures.

    摘要翻译： 氮化硅烧结材料包括氮化硅和稀土元素化合物。 Y和Yb作为稀土元素以氧化物换算为5-7摩尔％，Yb / Y按氧化物的摩尔比计为4/6〜9/1，晶粒的晶相 边界含有H相和J相，H相的比例大于J相的比例。 制造氮化硅烧结体的方法包括以下步骤：将Si 3 N 4粉末与Y 2 O 3和Yb 2 O 3作为烧结助剂混合，Y2O3和Yb2O3的总量为5-7摩尔％，Yb2O3 / Y2O3的摩尔比为4 / 6〜9/1，将所得混合物成型，在氮气气氛中于1850〜950℃烧结成型材料，在空气中在1000〜1500℃下对烧结体进行0.5-10小时的热处理。 氮化硅烧结材料在低温下具有小的或较大的抗氧化性和强度，同时在高温下保持高强度。

    Silicon nitride sintered body
    85.
    发明授权
    Silicon nitride sintered body 失效
    氮化硅烧结体

    公开(公告)号：US5919719A

    公开(公告)日：1999-07-06

    申请号：US141451

    申请日：1998-08-27

    申请人： Masahiro Sato ,  Katsushi Sakaue ,  Takero Fukudome

    发明人： Masahiro Sato ,  Katsushi Sakaue ,  Takero Fukudome

    IPC分类号： C04B35/584 ,  C04B35/587

    CPC分类号： C04B35/584

    摘要： A silicon nitride sintered body containing a .beta.-silicon nitride crystal phase and further containing at least a rare earth element component and an aluminium component in a grain boundary phase, wherein the intensity ratio (X2/X1) of the Si peak X.sub.2 at 521 cm.sup.-1 to the Si.sub.3 N.sub.4 peak X.sub.1 at 206 cm.sup.-1, as detected by a Raman spectrochemical analysis method, is 0.2 to 3. A very minor amount of Si (elemental silicon), as detected by the Raman spectrochemical analysis method, is precipitated in the sintered body, and by this precipitation of Si, strength and toughness are markedly increased.

    摘要翻译： 一种含有β-硅氮化物晶相并且在晶界相中至少含有稀土元素成分和铝成分的氮化硅烧结体，其中，所述Si峰X2在521cm处的强度比（X2 / X1） -1，通过拉曼光谱化学分析法检测到206cm -1处的Si 3 N 4峰X1为0.2〜3。通过拉曼光谱化学分析法检测到的非常少量的Si（元素硅）沉淀在 烧结体和Si的沉淀，强度和韧性明显增加。

    Process for production of a silicon nitride ceramic
    86.
    发明授权
    Process for production of a silicon nitride ceramic 失效
    氮化硅陶瓷的制造方法

    公开(公告)号：US5804521A

    公开(公告)日：1998-09-08

    申请号：US905025

    申请日：1997-08-01

    申请人： Akira Takahashi ,  Masaaki Masuda ,  Keiichiro Watanabe

    发明人： Akira Takahashi ,  Masaaki Masuda ,  Keiichiro Watanabe

    IPC分类号： C04B35/626 ,  C04B35/593 ,  C04B35/587

    CPC分类号： C04B35/5935

    摘要： A silicon nitride ceramic of the present invention possesses excellent strength of the surface, including a silicon nitride and a rare earth oxide compound and being characterized in that the ratio of the transverse rupture strength, at a room temperature, of the fired surface used as a tensile surface to the transverse rupture strength, at a room temperature, of the worked surface used as a tensile surface subjected to the working so as to have the surface roughness of R.sub.MAX 0.8 .mu.m or less is 0.7 or more, and the strength ratio is satisfied even when any portion besides the fired surface is utilized as the tensile surface to be worked to have the surface roughness of R.sub.MAX 0.8 .mu.m or less. The present invention also provides a process for producing a silicon nitride ceramic including the steps of: (1) mixing .alpha.-Si.sub.3 N.sub.4 powder and .beta.-Si.sub.3 N.sub.4 powder to obtain a raw material powder so as to satisfy the formula indicated by 0.05.ltoreq..beta./.alpha.+.beta..ltoreq.0.50, in which a refers to the weight of .alpha.-Si.sub.3 N.sub.4 powder and .beta. refers to the weight of .beta.-Si.sub.3 N.sub.4 powder; (2) mixing at least one sintering aid to the raw material powder; (3) forming the powder mixture to give a compact; and (4) firing the compact at a temperature ranging from 1800.degree. to 2000.degree. C. under a nitrogen atmosphere having an atmospheric pressure of at least 1 atm.

    摘要翻译： 本发明的氮化硅陶瓷具有优异的表面强度，包括氮化硅和稀土氧化物，其特征在于，在室温下，作为烧结表面的烧结表面的横向断裂强度的比例 作为经受加工的拉伸面的加工面的拉伸面与横向断裂强度在室温下的表面粗糙度为0.8μm以下，强度比为 即使将烧成的表面以外的任何部分用作待加工的拉伸面，其表面粗糙度为0.8μm以下。 本发明还提供一种制造氮化硅陶瓷的方法，包括以下步骤：（1）将α-Si 3 N 4粉末和β-Si 3 N 4粉末混合以获得原料粉末，以满足0.05≤β /α+β<0.50，其中a表示α-Si 3 N 4粉末的重量，β表示β-Si 3 N 4粉末的重量; （2）将至少一种烧结助剂与原料粉末混合; （3）形成粉末混合物以产生致密的; 和（4）在大气压至少为1个大气压的氮气气氛下，在1800〜2000℃的温度下烧成。

    Cutting tool composed of silicon nitride
    87.
    发明授权
    Cutting tool composed of silicon nitride 失效
    切割工具由氮化硅组成

    公开(公告)号：US5668069A

    公开(公告)日：1997-09-16

    申请号：US655388

    申请日：1996-05-30

    申请人： Masahiro Sato ,  Yukiyasu Aoyama ,  Nobuoki Takagi ,  Shoji Kohsaka

    发明人： Masahiro Sato ,  Yukiyasu Aoyama ,  Nobuoki Takagi ,  Shoji Kohsaka

    IPC分类号： B23B27/14 ,  C04B35/584 ,  C04B35/593 ,  C04B35/587

    CPC分类号： C04B35/5935 ,  Y10T407/27

    摘要： A cutting tool composed of silicon nitride comprising chiefly a .beta.-silicon nitride crystal phase and containing a grain boundary phase of rare earth elements, silicon, aluminum, oxygen and nitrogen, wherein the cutting surface is constituted by at least a fired surface or a surface formed by removing and polishing the fired surface by an amount of not larger than 10 .mu.m, and has in the mirror surface thereof a micro-Vicker's hardness which is higher than that of the interior thereof and is not smaller than 16 GPa. The cutting tool has a cutting surface that can be easily worked enabling the cost of working to be decreased, and has a highly hard layer that is suited for cutting cast iron and the like materials featuring increased durability and extended cutting life.

    摘要翻译： 一种由主要包含β-硅氮化物晶相并且含有稀土元素，硅，铝，氧和氮的晶界相的氮化硅组成的切削工具，其中切割表面至少由烧结表面或表面 通过将烧制表面除去和抛光不大于10μm而形成，并且其镜面具有高于其内部的微维氏硬度，并且不小于16GPa。 该切削工具具有能够容易地加工的切削面，能够降低加工成本，并且具有适用于切割铸铁的高硬度层，其具有增加的耐久性和延长的切削寿命的类似材料。

    High temperature resistant silicon nitride ceramic
    88.
    发明授权
    High temperature resistant silicon nitride ceramic 失效
    耐高温氮化硅陶瓷

    公开(公告)号：US5556815A

    公开(公告)日：1996-09-17

    申请号：US534059

    申请日：1995-09-26

    申请人： Cornelia Boberski ,  Hartmut Kruner ,  Gunter Riedel ,  Rainer Hamminger

    发明人： Cornelia Boberski ,  Hartmut Kruner ,  Gunter Riedel ,  Rainer Hamminger

    IPC分类号： C04B35/584 ,  C04B35/58 ,  C04B35/593 ,  C04B35/587

    CPC分类号： C04B35/5935

    摘要： A shaped part of sintered silicon nitride has high mechanical strength and comprises at least 87% by weight of silicon nitride and up to 13% by weight of an additive combination of Al.sub.2 O.sub.3 and Y.sub.2 O.sub.3. The Y.sub.2 O.sub.3 /Al.sub.2 O.sub.3 weight ratio is in the range of from 1.1 to 3.4. It can additionally contain HfO.sub.2 and/or ZrO.sub.2 in amounts of up to 1.0% by weight.The shaped part has a density of 98% of the theoretical maximum density, a mechanical strength of .gtoreq.850 MPa at room temperature and a mechanical strength of .gtoreq.800 MPa at a temperature of 800.degree. C. Its fracture toughness K.sub.IC is in the range .gtoreq.8 MPa.multidot..sqroot.m.

    摘要翻译： 烧结氮化硅的成形部分具有高机械强度，并且包含至少87重量％的氮化硅和至多13重量％的Al 2 O 3和Y 2 O 3的添加剂组合。 Y 2 O 3 / Al 2 O 3重量比在1.1〜3.4的范围内。 其还可含有至多1.0重量％的量的HfO 2和/或ZrO 2。 成形部件的理论最大密度为98％，室温下的机械强度> 850MPa，机械强度为800℃时的机械强度> 800MPa。其断裂韧性KIC为 在范围> / = 8 MPax 2ROOT + E，rad m + EE。

    Silicon nitride sintered body
    89.
    发明授权
    Silicon nitride sintered body 失效
    氮化硅烧结体

    公开(公告)号：US5502011A

    公开(公告)日：1996-03-26

    申请号：US303591

    申请日：1994-09-09

    申请人： Takehisa Yamamoto ,  Takao Nishioka ,  Kenji Matsunuma ,  Akira Yamakawa

    发明人： Takehisa Yamamoto ,  Takao Nishioka ,  Kenji Matsunuma ,  Akira Yamakawa

    IPC分类号： C04B35/597 ,  C04B35/587 ,  C04B35/599

    CPC分类号： C04B35/597

    摘要： A silicon nitride sintered body characterized by comprising crystal grains having a linear density of 60 to 120 per 50 .mu.m length as measured in an arbitrary two-dimensional section of the sintered body. The silicon nitride sintered body has a shock compressive elasticity limit (Hugoniot-elastic limit) of 15 GPa or more and is substantially composed of crystal phases of .alpha.-silicon nitride and .beta.'-sialon. The percentages of the .alpha.-silicon nitride and .beta.'-sialon are not more than 30% and not less than 70%, respectively. The silicon nitride sintered body is particularly excellent in mechanical strengths at room temperature as well as in productivity and cost efficiency and is useful for applications as the material of parts where a particularly high impact strength is required, such as a valve train mechanism for automobile parts.

    摘要翻译： 一种氮化硅烧结体，其特征在于包括在烧结体的任意二维截面中测得的每50μm长度的线密度为60至120的晶粒。 氮化硅烧结体具有15GPa或更高的冲击压缩弹性极限（Hugoniot弹性极限），并且基本上由α-氮化硅和β'塞隆的结晶相组成。 α硅氮化物和β' - 赛隆的百分比分别不超过30％且不小于70％。 氮化硅烧结体在室温下的机械强度以及生产​​率和成本效率方面特别优异，作为需要特别高的冲击强度的部件的材料，例如汽车部件的气门机构 。