公开(公告)号：US20030226834A1

公开(公告)日：2003-12-11

申请号：US10456741

申请日：2003-06-09

申请人： FUJI PHOTO FILM CO., LTD. & FUJI PHOTO OPTICAL CO., LTD.

发明人： Hiromi Ishikawa ,  Akinori Harada ,  Kazuhiko Nagano ,  Yoji Okazaki ,  Takeshi Fujii ,  Hideo Yamanaka ,  Hiromitsu Yamakawa

IPC分类号： B23K026/00 ,  H01L021/00 ,  H01L021/84

CPC分类号： B23K26/0608 ,  B23K26/0604 ,  C23C14/28 ,  C23C16/483

摘要： A laser annealer has a laser light source with at least one GaN-type semiconductor laser and is configured so as to form emission points that emit laser beams having a wavelength of 350 to 450 nm, and a scanning device for scanning an annealing surface with the laser beams. The laser annealer may have a spatial light modulator for modulating the laser beams, and in which pixel portions whose light modulating states change in accordance with control signals are arranged on a substrate. The invention is applied to a laser thin-film forming apparatus. The apparatus has a laser source that has at least one semiconductor laser and is configured so as to form emission points, and an optical system for focusing laser beams into a single beam in the width direction of a substrate.

摘要翻译： 激光退火炉具有具有至少一个GaN型半导体激光器的激光光源，并且被配置为形成发射波长为350至450nm的激光束的发射点，以及用于扫描退火表面的扫描装置 激光束。 激光退火炉可以具有用于调制激光束的空间光调制器，并且其中光调制状态根据控制信号改变的像素部分被布置在基板上。 本发明应用于激光薄膜形成装置。 该装置具有至少一个半导体激光器并且被配置为形成发射点的激光源，以及用于将激光束在基板的宽度方向上聚焦成单个光束的光学系统。

公开(公告)号：US20050179772A1

公开(公告)日：2005-08-18

申请号：US11104427

申请日：2005-04-13

申请人： Hiromi Ishikawa ,  Kazuhiko Nagano ,  Yoji Okazaki ,  Takeshi Fujii ,  Hiromitsu Yamakawa

发明人： Hiromi Ishikawa ,  Kazuhiko Nagano ,  Yoji Okazaki ,  Takeshi Fujii ,  Hiromitsu Yamakawa

IPC分类号： B23K26/06 ,  B29C67/00 ,  B41J2/447 ,  B41J2/465 ,  B41J2/47 ,  D06L3/04 ,  D06M10/00 ,  G02B26/08 ,  G03F7/20 ,  H04N1/12 ,  H04N1/191

CPC分类号： B41J2/451 ,  B23K26/0604 ,  B23K26/066 ,  B29C64/135 ,  B29C64/153 ,  B33Y30/00 ,  B41J2/45 ,  B41J2/465 ,  B41J2/47 ,  D06L4/50 ,  D06M10/005 ,  G02B26/0841 ,  G03F7/7005 ,  G03F7/70291 ,  H04N1/12 ,  H04N1/191 ,  H04N1/1916

摘要： In an exposure apparatus of the invention, for a spatial light modulator, each of a plurality of pixel portions fewer than the total number of the pixel portions is controlled with a control signal generated according to exposure information. Namely, a part of the pixel portions is controlled without controlling a whole of the pixel portions on the substrate. Thus, the number of pixels in the pixel portions is decreased, and transfer time of the control signal becomes short. This enables modulation speed of the laser beam to be increased and the high-speed exposure to be performed. An incorporated laser light source, in which the laser beams are incorporated and struck on the optical fiber, is preferable to the laser device. By adopting the incorporated laser light source, high brightness and high output can be obtained, and it is preferable to the exposure of the spatial light modulator. Since the fiber array is obtained with few optical fibers, it is low cost. Since the number of optical fibers is few, the light-emitting region is further decreased when the optical fibers are arrayed.

摘要翻译： 在本发明的曝光装置中，对于空间光调制器，利用根据曝光信息生成的控制信号来控制少于像素部分总数的多个像素部分中的每一个。 即，在不控制基板上的整个像素部分的情况下，控制像素部分的一部分。 因此，像素部分中的像素数量减少，并且控制信号的传送时间变短。 这使得能够增加激光束的调制速度并执行高速曝光。 其中激光束并入并撞击在光纤上的并入的激光光源优于激光装置。 通过采用所结合的激光光源，可以获得高亮度和高输出，并且优选空间光调制器的曝光。 由于光纤阵列获得的光纤很少，所以成本低。 由于光纤的数量少，所以在配置光纤时，发光区域进一步降低。