公开(公告)号：US6051148A

公开(公告)日：2000-04-18

申请号：US35442

申请日：1998-03-05

Applicant: Philip G. Perry ,  William G. Herbert ,  Alexandra I. Vidal ,  Gene W. O'Dell ,  Cornelius Boerman ,  James E. McNamara

Inventor： Philip G. Perry ,  William G. Herbert ,  Alexandra I. Vidal ,  Gene W. O'Dell ,  Cornelius Boerman ,  James E. McNamara

IPC: C23F1/36 ,  G03G5/10 ,  G03G5/14

CPC classification number: C23F1/36 ,  G03G5/102 ,  G03G5/104 ,  G03G5/144

Abstract: A photoreceptor fabrication method involving a photoreceptor substrate having a metal surface, comprising etching the metal surface of the photoreceptor substrate with an etching solution and forming a metal oxide layer on the metal surface with the etching solution, wherein the etching of the metal surface and the forming of the metal oxide layer are conducted in the absence of an electric current.

Abstract translation: 包括具有金属表面的感光体基片的感光体制造方法，包括用蚀刻溶液蚀刻感光体基底的金属表面并在蚀刻溶液上在金属表面上形成金属氧化物层，其中金属表面和 在没有电流的情况下进行金属氧化物层的形成。

公开(公告)号：US6048657A

公开(公告)日：2000-04-11

申请号：US238286

申请日：1999-01-28

Applicant: William G. Herbert ,  Philip G. Perry ,  Alexandra I. Vidal

Inventor： William G. Herbert ,  Philip G. Perry ,  Alexandra I. Vidal

IPC: G03G5/047 ,  G03G5/10

CPC classification number: G03G5/102 ,  G03G5/047

Abstract: There is disclosed a process for forming a photosensitive imaging member including positioning a substrate and an electrode in an electrolytic solution to form a galvanic cell and electrochemically graining the substrate surface in the absence of an external power source to provide a substrate surface roughness sufficient to substantially suppress the formation of a pattern of light and dark interference fringes upon exposure of the photosensitive imaging member to a light source.

Abstract translation: 公开了一种用于形成感光成像构件的方法，包括将基底和电极定位在电解溶液中以形成原电池，并且在不存在外部电源的情况下对基底表面进行电化学研磨以提供足以基本上 抑制在将光敏成像构件暴露于光源时形成光和黑色干涉条纹的图案。

公开(公告)号：US5997722A

公开(公告)日：1999-12-07

申请号：US103690

申请日：1998-06-24

Applicant: Alexandra I. Vidal ,  William G. Herbert ,  Roberto W. Vidal ,  Gary J. Maier ,  Jodie L. Morris ,  James E. McNamara ,  Gene W. O'Dell

Inventor： Alexandra I. Vidal ,  William G. Herbert ,  Roberto W. Vidal ,  Gary J. Maier ,  Jodie L. Morris ,  James E. McNamara ,  Gene W. O'Dell

IPC: C25F3/04 ,  G03G5/10 ,  C25F1/00

CPC classification number: C25F3/04 ,  G03G5/10 ,  G03G5/102

Abstract: A method for producing a photoreceptor having a substrate subjected to a surface finishing treatment to result in a finished substrate surface, wherein the method includes:(a) analyzing the finished substrate surface by performing a first surface energy reading, a first ellipsometry reading, a first x-ray diffraction reading, and a first profilometry reading;(b) removing electrochemically via an alternating voltage or alternating current a portion of the finished substrate surface, thereby resulting in a cleaned substrate surface;(c) analyzing the cleaned substrate surface by performing a second surface energy reading, a second ellipsometry reading, a second x-ray diffraction reading, and a second profilometry reading, wherein the removing step (b) is accomplished to the extent that the second surface energy reading and the second ellipsometry reading are measurably changed from the first surface energy reading and the first ellipsometry reading, but the second x-ray diffraction reading and the second profilometry reading are measurably unchanged from the first x-ray diffraction reading and the first profilometry reading; and(d) depositing a layer of the photoreceptor on the cleaned substrate surface.

Abstract translation: 一种制造感光体的方法，所述感光体具有进行了表面精加工处理以得到成品基材表面的基材，其中所述方法包括：（a）通过执行第一表面能读数，第一椭偏仪读数， 第一次x射线衍射读数和第一轮廓测量读数; （b）通过交流电压或交流电一部分完成的衬底表面电化学去除，由此导致清洁的衬底表面; （c）通过执行第二表面能读数，第二椭偏仪读数，第二x射线衍射读数和第二轮廓测量读数来分析所清洁的衬底表面，其中所述去除步骤（b）完成到第二 表面能读数和第二椭偏仪读数从第一表面能读数和第一椭偏仪读数可测量地改变，但第二x射线衍射读数和第二轮廓测量读数与第一x射线衍射读数和第 轮廓测量读数; 和（d）将感光体层沉积在清洁的基底表面上。