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公开(公告)号:US06882437B2
公开(公告)日:2005-04-19
申请号:US10208379
申请日:2002-07-29
CPC分类号: G01B11/0641
摘要: The thickness of a wafer, substrate, or magnetic disk is measured by a shadow technique. A light source is positioned to pass a portion of light beam intensity on both sides of the wafer, substrate, or magnetic disk. A detector measures the light beam intensity after the light beam passes the wafer, substrate, or magnetic disk.
摘要翻译: 通过阴影技术测量晶片,衬底或磁盘的厚度。 光源被定位成在晶片,衬底或磁盘的两侧上通过光束强度的一部分。 检测器测量光束通过晶片,衬底或磁盘后的光束强度。
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公开(公告)号:US20220187218A1
公开(公告)日:2022-06-16
申请号:US17685679
申请日:2022-03-03
IPC分类号: G01N21/958 , G01N21/84 , G01N21/88 , G02B26/10
摘要: An angle independent optical surface inspector capable of generating a light beam, directing the light beam to a sample, and de-scanning a reflected light beam that is reflected from the sample, thereby generating a first de-scanned light beam. The de-scanning is performed at approximately one focal length of a de-scanning lens from an irradiation location where the light beam irradiates the sample. The optical inspector also capable of focusing the first de-scanned light beam, thereby generating a focused light beam, and measuring the location of the focused light beam. The measuring of the location is performed at approximately one focal length of a focusing lens from the focusing lens. The incident angle of the light beam is within ten degrees of Brewster's angle. The focusing is performed by an achromatic lens.
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