Method of detecting the thickness of thin film disks or wafers
    1.
    发明授权
    Method of detecting the thickness of thin film disks or wafers 有权
    检测薄膜盘或晶片厚度的方法

    公开(公告)号:US06882437B2

    公开(公告)日:2005-04-19

    申请号:US10208379

    申请日:2002-07-29

    IPC分类号: G01B11/06 G01B11/28

    CPC分类号: G01B11/0641

    摘要: The thickness of a wafer, substrate, or magnetic disk is measured by a shadow technique. A light source is positioned to pass a portion of light beam intensity on both sides of the wafer, substrate, or magnetic disk. A detector measures the light beam intensity after the light beam passes the wafer, substrate, or magnetic disk.

    摘要翻译: 通过阴影技术测量晶片,衬底或磁盘的厚度。 光源被定位成在晶片,衬底或磁盘的两侧上通过光束强度的一部分。 检测器测量光束通过晶片,衬底或磁盘后的光束强度。

    ANGLE INDEPENDENT OPTICAL SURFACE INSPECTOR

    公开(公告)号:US20220187218A1

    公开(公告)日:2022-06-16

    申请号:US17685679

    申请日:2022-03-03

    摘要: An angle independent optical surface inspector capable of generating a light beam, directing the light beam to a sample, and de-scanning a reflected light beam that is reflected from the sample, thereby generating a first de-scanned light beam. The de-scanning is performed at approximately one focal length of a de-scanning lens from an irradiation location where the light beam irradiates the sample. The optical inspector also capable of focusing the first de-scanned light beam, thereby generating a focused light beam, and measuring the location of the focused light beam. The measuring of the location is performed at approximately one focal length of a focusing lens from the focusing lens. The incident angle of the light beam is within ten degrees of Brewster's angle. The focusing is performed by an achromatic lens.