Method and Apparatus for Plating Metal and Metal Oxide Layer Cores

    公开(公告)号:US20230082177A1

    公开(公告)日:2023-03-16

    申请号:US17900803

    申请日:2022-08-31

    申请人: Atlas Magnetics

    摘要: An apparatus and method for plating magnetic cores by periodically transferring a plate directly back and forth between a metal plating environment and an insulation deposit environment. This direct metal to insulation to metal plating is enabled by a nano-scale insulation layer that provides an imperfect coverage of the metal layer while still keeping sufficient insulation to prevent eddy current formation—even during high-frequency current applications. Therefore, this invention enables the practical creation of magnetic cores having layers with widths even under one nanometer and can generate cores having a layer scale that can be varied to suit a variety of uses in the microelectronic industry.