公开(公告)号：US06757629B2

公开(公告)日：2004-06-29

申请号：US09906676

申请日：2001-07-18

申请人： Atsushi Takizawa ,  Kotaro Shirabe

发明人： Atsushi Takizawa ,  Kotaro Shirabe

IPC分类号： G06F1900

CPC分类号： H01J37/304 ,  H01J2237/3175

摘要： A calibration plate includes a first pattern in which bars and spaces are repeated, and a second pattern in which bars having an identical width to the spaces of the first pattern and spaces having an identical width to the bars of the first pattern are repeated, wherein the first pattern and the second pattern adjoin each other, and the bars and spaces of the first pattern and the bars and spaces of the second pattern are staggered.

摘要翻译： 校准板包括其中重复条形和间隔的第一图案和第二图案，其中重复与第一图案的空间具有相同宽度的条和与第一图案的条具有相同宽度的空间的第二图案，其中 第一图案和第二图案彼此邻接，并且第一图案的条形和间隔以及第二图案的条形和间隔交错。

公开(公告)号：US6097102A

公开(公告)日：2000-08-01

申请号：US315842

申请日：1999-05-21

申请人： Atsushi Takizawa

发明人： Atsushi Takizawa

IPC分类号： G03F1/42 ,  G03F7/20 ,  H01L21/027 ,  H01L21/66 ,  H01L23/544

CPC分类号： G03F7/70625 ,  H01L23/544 ,  H01L2223/54406 ,  H01L2223/5442 ,  H01L2223/54453 ,  H01L2924/0002

摘要： A reticle has a transfer region and a peripheral region defined in the plane of the reticle, the transfer region being formed with a pattern to be transferred and the peripheral region being disposed surrounding the periphery of the transfer region. Reference marks for defining one virtual reference line is formed in the plane of the reticle. A transfer pattern is formed in the transfer region and includes a long linear line segment oblique to the reference line. A pair of direction designating marks is disposed in the peripheral region along a virtual straight line parallel or perpendicular to the linear line segment of the transfer pattern.

摘要翻译： 标线片具有限定在标线板的平面中的转印区域和周边区域，转印区域形成有待转印的图案，周边区域设置在转印区域的周围。 用于定义一个虚拟参考线的参考标记形成在光罩的平面中。 在转印区域中形成转印图案，并且包括与参考线倾斜的长线性线段。 沿着与传送图案的线性线段平行或垂直的虚拟直线在周边区域中设置一对方向指定标记。

公开(公告)号：US5929529A

公开(公告)日：1999-07-27

申请号：US874713

申请日：1997-06-13

申请人： Atsushi Takizawa

发明人： Atsushi Takizawa

IPC分类号： G03F1/42 ,  G03F7/20 ,  H01L21/027 ,  H01L21/66 ,  H01L23/544

CPC分类号： G03F7/70625 ,  H01L23/544 ,  H01L2223/54406 ,  H01L2223/5442 ,  H01L2223/54453 ,  H01L2924/0002

摘要： A reticle has a transfer region and a peripheral region defined in the plane of the reticle, the transfer region being formed with a pattern to be transferred and the peripheral region being disposed surrounding the periphery of the transfer region. Reference marks for defining one virtual reference line is formed in the plane of the reticle. A transfer pattern is formed in the transfer region and includes a long linear line segment oblique to the reference line. A pair of direction designating marks is disposed in the peripheral region along a virtual straight line parallel or perpendicular to the linear line segment of the transfer pattern.

摘要翻译： 标线片具有限定在标线板的平面中的转印区域和周边区域，转印区域形成有待转印的图案，周边区域设置在转印区域的周围。 用于定义一个虚拟参考线的参考标记形成在光罩的平面中。 在转印区域中形成转印图案，并且包括与参考线倾斜的长线性线段。 沿着与传送图案的线性线段平行或垂直的虚拟直线在周边区域中设置一对方向指定标记。

公开(公告)号：US6124598A

公开(公告)日：2000-09-26

申请号：US132820

申请日：1998-08-12

申请人： Atsushi Takizawa

发明人： Atsushi Takizawa

IPC分类号： G03F7/20 ,  H01J37/304 ,  H01J37/317 ,  H01L21/027 ,  H01J37/30

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F7/7045 ,  H01J37/3045 ,  H01J37/3174

摘要： The pattern exposure method formes a pattern by a combination of a reduction projection exposure system 10 and an electron beam exposure system 20. An optical strain in a region of a prescribed size exposed by the reduction projection exposure system 10 is measured by a coordinates detection system 30. A first pattern of a shot size is exposed by the reduction projection exposure system 10, and a second pattern to be superimposed on the first pattern is formed by the electron beam exposure system 20, correcting based on a correction value which is based on the optical strain in the region of the prescribed size measured by the coordinates detection system 30.

摘要翻译： 图案曝光方法通过还原投影曝光系统10和电子束曝光系统20的组合形成图案。由缩小投影曝光系统10曝光的规定尺寸的区域中的光学应变由坐标检测系统 通过还原投影曝光系统10曝光拍摄尺寸的第一图案，并且由电子束曝光系统20形成叠加在第一图案上的第二图案，基于基于 由坐标检测系统30测量的规定尺寸的区域中的光学应变。

公开(公告)号：US5894458A

公开(公告)日：1999-04-13

申请号：US713193

申请日：1996-09-12

申请人： Atsushi Takizawa ,  Tadashi Tomita ,  Shigeo Nakayama

发明人： Atsushi Takizawa ,  Tadashi Tomita ,  Shigeo Nakayama

IPC分类号： G11B5/48 ,  G11B11/105 ,  G11B11/00

CPC分类号： G11B5/486 ,  G11B11/1055 ,  G11B11/10552 ,  G11B11/1058 ,  G11B5/4846

摘要： An apparatus is disclosed which mechanically supports and electrically connects a magnetic field modulation head for opto-magnetic recording to a supporting/connecting device. The magnetic field modulation head is in slidable contact with a surface of an opto-magnetic disc and is placed face-to-face with a laser pick-up device. The apparatus has a connecting spring member made of a conductive material. The connecting spring member has one end which joins a coil of the magnetic field modulation head with a coil of the magnetic field modulation head, and an opposite end which is fixed on a supporting member. The spring member has a pair of conductive pieces spaced apart from each other. The conductive pieces are made of a material which renders the coil conductive with the supporting member, the one end and the magnetic field modulation head being embedded in a composite resin material. To partially mechanically engage the conductive pieces together, an insulating engaging member may be used. Alternatively, the spring member may have a pair of conductive pieces spaced apart from each other and placed on a single insulating plate made of a flexible composite resin.

摘要翻译： 公开了将用于光磁记录的磁场调制头机械地支撑并电连接到支撑/连接装置的装置。 磁场调制头可与光磁盘的表面滑动接触并且与激光拾取装置面对面放置。 该装置具有由导电材料制成的连接弹簧构件。 连接弹簧构件具有将磁场调制头的线圈与磁场调制头的线圈连接的一端和固定在支撑构件上的相对端。 弹簧构件具有彼此间隔开的一对导电片。 导电片由使线圈与支撑构件导电的材料制成，一端和磁场调制头嵌入复合树脂材料中。 为了将导电片部分机械地接合在一起，可以使用绝缘接合构件。 或者，弹簧构件可以具有彼此间隔开的一对导电片，并且放置在由柔性复合树脂制成的单个绝缘板上。