Combining X-ray and VUV Analysis of Thin Film Layers
    1.
    发明申请
    Combining X-ray and VUV Analysis of Thin Film Layers 有权
    结合薄膜层的X射线和VUV分析

    公开(公告)号:US20120275568A1

    公开(公告)日:2012-11-01

    申请号:US13419497

    申请日:2012-03-14

    IPC分类号: G01N23/201

    摘要: Apparatus for inspection of a sample includes an X-ray source, which is configured to irradiate a location on the sample with a beam of X-rays. An X-ray detector is configured to receive the X-rays that are scattered from the sample and to output a first signal indicative of the received X-rays. A VUV source is configured to irradiate the location on the sample with a beam of VUV radiation. A VUV detector is configured to receive the VUV radiation that is reflected from the sample and to output a second signal indicative of the received VUV radiation. A processor is configured to process the first and second signals in order to measure a property of the sample.

    摘要翻译: 用于检查样品的装置包括X射线源,其被配置为用X射线照射样品上的位置。 X射线检测器被配置为接收从样本散射的X射线并输出指示所接收的X射线的第一信号。 VUV源配置为用VUV辐射束照射样品上的位置。 VUV检测器被配置为接收从样本反射的VUV辐射并输出指示所接收的VUV辐射的第二信号。 处理器被配置为处理第一和第二信号以便测量样品的性质。

    Combining X-ray and VUV analysis of thin film layers
    2.
    发明授权
    Combining X-ray and VUV analysis of thin film layers 有权
    结合薄膜层的X射线和VUV分析

    公开(公告)号:US08565379B2

    公开(公告)日:2013-10-22

    申请号:US13419497

    申请日:2012-03-14

    IPC分类号: G01N23/201

    摘要: Apparatus for inspection of a sample includes an X-ray source, which is configured to irradiate a location on the sample with a beam of X-rays. An X-ray detector is configured to receive the X-rays that are scattered from the sample and to output a first signal indicative of the received X-rays. A VUV source is configured to irradiate the location on the sample with a beam of VUV radiation. A VUV detector is configured to receive the VUV radiation that is reflected from the sample and to output a second signal indicative of the received VUV radiation. A processor is configured to process the first and second signals in order to measure a property of the sample.

    摘要翻译: 用于检查样品的装置包括X射线源,其被配置为用X射线照射样品上的位置。 X射线检测器被配置为接收从样本散射的X射线并输出指示所接收的X射线的第一信号。 VUV源配置为用VUV辐射束照射样品上的位置。 VUV检测器被配置为接收从样本反射的VUV辐射并输出指示所接收的VUV辐射的第二信号。 处理器被配置为处理第一和第二信号以便测量样品的性质。