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公开(公告)号:US20120275568A1
公开(公告)日:2012-11-01
申请号:US13419497
申请日:2012-03-14
IPC分类号: G01N23/201
CPC分类号: G01N23/201 , G01N21/211 , G01N21/274 , G01N21/33 , G01N21/8422 , G01N21/94 , G01N21/9501 , G01N2021/8438 , G01N2223/1006 , G01N2223/61
摘要: Apparatus for inspection of a sample includes an X-ray source, which is configured to irradiate a location on the sample with a beam of X-rays. An X-ray detector is configured to receive the X-rays that are scattered from the sample and to output a first signal indicative of the received X-rays. A VUV source is configured to irradiate the location on the sample with a beam of VUV radiation. A VUV detector is configured to receive the VUV radiation that is reflected from the sample and to output a second signal indicative of the received VUV radiation. A processor is configured to process the first and second signals in order to measure a property of the sample.
摘要翻译: 用于检查样品的装置包括X射线源,其被配置为用X射线照射样品上的位置。 X射线检测器被配置为接收从样本散射的X射线并输出指示所接收的X射线的第一信号。 VUV源配置为用VUV辐射束照射样品上的位置。 VUV检测器被配置为接收从样本反射的VUV辐射并输出指示所接收的VUV辐射的第二信号。 处理器被配置为处理第一和第二信号以便测量样品的性质。
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公开(公告)号:US08565379B2
公开(公告)日:2013-10-22
申请号:US13419497
申请日:2012-03-14
IPC分类号: G01N23/201
CPC分类号: G01N23/201 , G01N21/211 , G01N21/274 , G01N21/33 , G01N21/8422 , G01N21/94 , G01N21/9501 , G01N2021/8438 , G01N2223/1006 , G01N2223/61
摘要: Apparatus for inspection of a sample includes an X-ray source, which is configured to irradiate a location on the sample with a beam of X-rays. An X-ray detector is configured to receive the X-rays that are scattered from the sample and to output a first signal indicative of the received X-rays. A VUV source is configured to irradiate the location on the sample with a beam of VUV radiation. A VUV detector is configured to receive the VUV radiation that is reflected from the sample and to output a second signal indicative of the received VUV radiation. A processor is configured to process the first and second signals in order to measure a property of the sample.
摘要翻译: 用于检查样品的装置包括X射线源,其被配置为用X射线照射样品上的位置。 X射线检测器被配置为接收从样本散射的X射线并输出指示所接收的X射线的第一信号。 VUV源配置为用VUV辐射束照射样品上的位置。 VUV检测器被配置为接收从样本反射的VUV辐射并输出指示所接收的VUV辐射的第二信号。 处理器被配置为处理第一和第二信号以便测量样品的性质。
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