利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

50 条记录 (耗时 0.027 秒)

    Combining X-ray and VUV Analysis of Thin Film Layers
    1.
    发明申请
    Combining X-ray and VUV Analysis of Thin Film Layers 有权
    结合薄膜层的X射线和VUV分析

    公开(公告)号：US20120275568A1

    公开(公告)日：2012-11-01

    申请号：US13419497

    申请日：2012-03-14

    申请人： Isaac Mazor ,  Matthew Wormington ,  Ayelet Dag ,  Bagrat Khachatryan

    发明人： Isaac Mazor ,  Matthew Wormington ,  Ayelet Dag ,  Bagrat Khachatryan

    IPC分类号： G01N23/201

    CPC分类号： G01N23/201 ,  G01N21/211 ,  G01N21/274 ,  G01N21/33 ,  G01N21/8422 ,  G01N21/94 ,  G01N21/9501 ,  G01N2021/8438 ,  G01N2223/1006 ,  G01N2223/61

    摘要： Apparatus for inspection of a sample includes an X-ray source, which is configured to irradiate a location on the sample with a beam of X-rays. An X-ray detector is configured to receive the X-rays that are scattered from the sample and to output a first signal indicative of the received X-rays. A VUV source is configured to irradiate the location on the sample with a beam of VUV radiation. A VUV detector is configured to receive the VUV radiation that is reflected from the sample and to output a second signal indicative of the received VUV radiation. A processor is configured to process the first and second signals in order to measure a property of the sample.

    摘要翻译： 用于检查样品的装置包括X射线源，其被配置为用X射线照射样品上的位置。 X射线检测器被配置为接收从样本散射的X射线并输出指示所接收的X射线的第一信号。 VUV源配置为用VUV辐射束照射样品上的位置。 VUV检测器被配置为接收从样本反射的VUV辐射并输出指示所接收的VUV辐射的第二信号。 处理器被配置为处理第一和第二信号以便测量样品的性质。

    Combining X-ray and VUV analysis of thin film layers
    2.
    发明授权
    Combining X-ray and VUV analysis of thin film layers 有权
    结合薄膜层的X射线和VUV分析

    公开(公告)号：US08565379B2

    公开(公告)日：2013-10-22

    申请号：US13419497

    申请日：2012-03-14

    申请人： Isaac Mazor ,  Matthew Wormington ,  Ayelet Dag ,  Bagrat Khachatryan

    发明人： Isaac Mazor ,  Matthew Wormington ,  Ayelet Dag ,  Bagrat Khachatryan

    IPC分类号： G01N23/201

    CPC分类号： G01N23/201 ,  G01N21/211 ,  G01N21/274 ,  G01N21/33 ,  G01N21/8422 ,  G01N21/94 ,  G01N21/9501 ,  G01N2021/8438 ,  G01N2223/1006 ,  G01N2223/61

    摘要： Apparatus for inspection of a sample includes an X-ray source, which is configured to irradiate a location on the sample with a beam of X-rays. An X-ray detector is configured to receive the X-rays that are scattered from the sample and to output a first signal indicative of the received X-rays. A VUV source is configured to irradiate the location on the sample with a beam of VUV radiation. A VUV detector is configured to receive the VUV radiation that is reflected from the sample and to output a second signal indicative of the received VUV radiation. A processor is configured to process the first and second signals in order to measure a property of the sample.

    摘要翻译： 用于检查样品的装置包括X射线源，其被配置为用X射线照射样品上的位置。 X射线检测器被配置为接收从样本散射的X射线并输出指示所接收的X射线的第一信号。 VUV源配置为用VUV辐射束照射样品上的位置。 VUV检测器被配置为接收从样本反射的VUV辐射并输出指示所接收的VUV辐射的第二信号。 处理器被配置为处理第一和第二信号以便测量样品的性质。

    Multifunction X-ray analysis system
    7.
    发明授权
    Multifunction X-ray analysis system 有权
    多功能X射线分析系统

    公开(公告)号：US07551719B2

    公开(公告)日：2009-06-23

    申请号：US11200857

    申请日：2005-08-10

    申请人： Boris Yokhin ,  Alexander Krokhmal ,  Tzachi Rafaeli ,  Isaac Mazor ,  Amos Gvirtzman

    发明人： Boris Yokhin ,  Alexander Krokhmal ,  Tzachi Rafaeli ,  Isaac Mazor ,  Amos Gvirtzman

    IPC分类号： G01B15/02 ,  G01N23/20 ,  G01N23/201

    CPC分类号： G01N23/20008

    摘要： Apparatus for analysis of a sample includes a radiation source, which is adapted to direct a first, converging beam of X-rays toward a surface of the sample and to direct a second, collimated beam of the X-rays toward the surface of the sample. A motion assembly moves the radiation source between a first source position, in which the X-rays are directed toward the surface of the sample at a grazing angle, and a second source position, in which the X-rays are directed toward the surface in a vicinity of a Bragg angle of the sample. A detector assembly senses the X-rays scattered from the sample as a function of angle while the radiation source is in either of the first and second source configurations and in either of the first and second source positions. A signal processor receives and processes output signals from the detector assembly so as to determine a characteristic of the sample.

    摘要翻译： 用于分析样品的装置包括辐射源，其适于将X射线的第一收敛束指向样品的表面，并将X射线的第二准直光束引向样品的表面 。 运动组件使辐射源在X射线以掠射角指向样品表面的第一源位置和第二源位置之间移动，在该第二源位置，X射线朝向表面 样品的布拉格角附近。 检测器组件在辐射源处于第一和第二源配置中的任一个中以及在第一和第二源位置中的任一个中时，感测从样品散射的X射线作为角度的函数。 信号处理器接收并处理来自检测器组件的输出信号，以便确定样品的特性。

    Automated selection of X-ray reflectometry measurement locations
    8.
    发明申请
    Automated selection of X-ray reflectometry measurement locations 审中-公开
    自动选择X射线反射测量位置

    公开(公告)号：US20070274447A1

    公开(公告)日：2007-11-29

    申请号：US11798617

    申请日：2007-05-15

    申请人： Isaac Mazor ,  Alex Dikopoltsev ,  Boris Yokhin ,  Tzachi Rafaeli ,  Alex Tokar ,  David Berman ,  Moshe Beylin

    发明人： Isaac Mazor ,  Alex Dikopoltsev ,  Boris Yokhin ,  Tzachi Rafaeli ,  Alex Tokar ,  David Berman ,  Moshe Beylin

    IPC分类号： G01N23/20

    CPC分类号： G01N23/201 ,  G01N2223/052

    摘要： A computer-implemented method for inspection of a sample includes defining a plurality of locations on a surface of the sample, irradiating the surface at each of the locations with a beam of X-rays, and measuring an angular distribution of the X-rays that are emitted from the surface responsively to the beam, so as to produce a respective plurality of X-ray spectra. The X-ray spectra are analyzed to produce respective figures-of-merit indicative of a measurement quality of the X-ray spectra at the respective locations. One or more locations are selected out of the plurality of locations responsively to the figures-of-merit, and a property of the sample is estimated using the X-ray spectra measured at the selected locations.

    摘要翻译： 用于检查样品的计算机实现的方法包括在样品的表面上限定多个位置，用X射线照射每个位置处的表面，并测量X射线的角度分布， 响应于光束从表面发射，以产生相应的多个X射线光谱。 分析X射线光谱以产生各自的相应的品质指数，表示在各个位置处的X射线光谱的测量质量。 响应于品质因数从多个位置中选择一个或多个位置，并且使用在所选择的位置处测量的X射线光谱来估计样品的性质。

    Enhancement of X-ray reflectometry by measurement of diffuse reflections
    9.
    发明授权
    Enhancement of X-ray reflectometry by measurement of diffuse reflections 有权
    通过测量漫反射增强X射线反射率

    公开(公告)号：US07068753B2

    公开(公告)日：2006-06-27

    申请号：US10902177

    申请日：2004-07-30

    申请人： David Berman ,  Isaac Mazor ,  Boris Yokhin ,  Amos Gvirtzman

    发明人： David Berman ,  Isaac Mazor ,  Boris Yokhin ,  Amos Gvirtzman

    IPC分类号： G01N23/20

    CPC分类号： G01N23/203 ,  G01B15/02

    摘要： A method for inspection of a sample having a surface layer. The method includes acquiring a first reflectance spectrum of the sample while irradiating the sample with a collimated beam of X-rays, and processing the first reflectance spectrum to measure a diffuse reflection property of the sample. A second reflectance spectrum of the sample is acquired while irradiating the sample with a converging beam of the X-rays. The second reflectance spectrum is analyzed using the diffuse reflection property so as to determine a characteristic of the surface layer of the sample.

    摘要翻译： 一种用于检查具有表面层的样品的方法。 该方法包括在准直的X射线束照射样品时获取样品的第一反射光谱，并且处理第一反射光谱以测量样品的漫反射特性。 在用X射线的会聚束照射样品的同时获取样品的第二反射光谱。 使用漫反射特性分析第二反射光谱，以确定样品的表面层的特性。

    Multifunction X-ray analysis system
    10.
    发明申请
    Multifunction X-ray analysis system 有权
    多功能X射线分析系统

    公开(公告)号：US20060062351A1

    公开(公告)日：2006-03-23

    申请号：US11200857

    申请日：2005-08-10

    申请人： Boris Yokhin ,  Alexander Krokhmal ,  Tzachi Rafaeli ,  Isaac Mazor ,  Amos Gvirtzman

    发明人： Boris Yokhin ,  Alexander Krokhmal ,  Tzachi Rafaeli ,  Isaac Mazor ,  Amos Gvirtzman

    IPC分类号： G01N23/201

    CPC分类号： G01N23/20008

    摘要： Apparatus for analysis of a sample includes a radiation source, which is adapted to direct a first, converging beam of X-rays toward a surface of the sample and to direct a second, collimated beam of the X-rays toward the surface of the sample. a motion assembly moves the radiation source between a first source position, in which the X-rays are directed toward the surface of the sample at a grazing angle, and a second source position, in which the X-rays are directed toward the surface in a vicinity of a Bragg angle of the sample. A detector assembly senses the X-rays scattered from the sample as a function of angle while the radiation source is in either of the first and second source configurations and in either of the first and second source positions. A signal processor receives and processes output signals from the detector assembly so as to determine a characteristic of the sample.

    摘要翻译： 用于分析样品的装置包括辐射源，其适于将X射线的第一收敛束指向样品的表面，并将X射线的第二准直光束引向样品的表面 。 运动组件将辐射源移动在X射线以掠射角指向样品表面的第一源位置和X射线朝向表面的第二源位置 样品的布拉格角附近。 检测器组件在辐射源处于第一和第二源配置中的任一个中以及在第一和第二源位置中的任一个中时，感测从样品散射的X射线作为角度的函数。 信号处理器接收并处理来自检测器组件的输出信号，以便确定样品的特性。