METHOD FOR IMPROVING THE IMAGING PROPERTIES OF AT LEAST TWO OPTICAL ELEMENTS AND PHOTOLITHOGRAPHIC FABRICATION METHOD
    1.
    发明申请
    METHOD FOR IMPROVING THE IMAGING PROPERTIES OF AT LEAST TWO OPTICAL ELEMENTS AND PHOTOLITHOGRAPHIC FABRICATION METHOD 失效
    用于改善最小二重光学元件和光刻制造方法的成像特性的方法

    公开(公告)号:US20050013012A1

    公开(公告)日:2005-01-20

    申请号:US10709098

    申请日:2004-04-13

    摘要: A method for improving imaging properties of two or more optical elements comprises the step of determining for at least one of the two optical elements a polarisation-dependent perturbation. In a further step a polarisation-independent perturbation is determined for at least one of the two optical elements. Then a target position for the at least one movable optical element is calculated such that, in the target position, the total perturbation of the at least two optical elements which is made up of the polarisation-dependent perturbations and polarisation-independent perturbations of the two optical elements, is minimized. Finally the at least one movable optical element is moved the to the calculated target position.

    摘要翻译: 一种用于改善两个或多个光学元件的成像特性的方法包括确定两个光学元件中的至少一个偏振相关扰动的步骤。 在另一步骤中,确定两个光学元件中的至少一个的偏振无关扰动。 然后,计算出至少一个可移动光学元件的目标位置,使得在目标位置中,由偏振相关扰动和两极偏振无关的扰动构成的至少两个光学元件的总扰动 光学元件被最小化。 最后,将至少一个可移动光学元件移动到计算出的目标位置。

    Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method
    3.
    发明申请
    Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method 审中-公开
    用于改善至少两个光学元件的成像特性和光刻制造方法的方法

    公开(公告)号:US20060146427A1

    公开(公告)日:2006-07-06

    申请号:US11361345

    申请日:2006-02-24

    IPC分类号: G02B7/02

    摘要: A method for improving imaging properties of two or more optical elements comprises the step of determining for at least one of the two optical elements a polarisation-dependent perturbation. In a further step a polarisation-independent perturbation is determined for at least one of the two optical elements. Then a target position for the at least one movable optical element is calculated such that, in the target position, the total perturbation of the at least two optical elements which is made up of the polarisation-dependent perturbations and polarisation-independent perturbations of the two optical elements, is minimized. Finally the at least one movable optical element is moved the to the calculated target position.

    摘要翻译: 一种用于改善两个或多个光学元件的成像特性的方法包括确定两个光学元件中的至少一个偏振相关扰动的步骤。 在另一步骤中,确定两个光学元件中的至少一个的偏振无关扰动。 然后,计算出至少一个可移动光学元件的目标位置,使得在目标位置中,由偏振相关扰动和两极偏振无关的扰动构成的至少两个光学元件的总扰动 光学元件被最小化。 最后,将至少一个可移动光学元件移动到计算出的目标位置。

    Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method
    4.
    发明申请
    Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method 失效
    用于改善至少两个光学元件的成像特性和光刻制造方法的方法

    公开(公告)号:US20050254773A1

    公开(公告)日:2005-11-17

    申请号:US11185066

    申请日:2005-07-20

    摘要: A method for improving imaging properties of two or more optical elements comprises the step of determining for at least one of the two optical elements a polarisation-dependent perturbation. In a further step a polarisation-independent perturbation is determined for at least one of the two optical elements. Then a target position for the at least one movable optical element is calculated such that, in the target position, the total perturbation of the at least two optical elements which is made up of the polarisation-dependent perturbations and polarisation-independent perturbations of the two optical elements, is minimized. Finally the at least one movable optical element is moved the to the calculated target position.

    摘要翻译: 一种用于改善两个或多个光学元件的成像特性的方法包括确定两个光学元件中的至少一个偏振相关扰动的步骤。 在另一步骤中,确定两个光学元件中的至少一个的偏振无关扰动。 然后,计算出至少一个可移动光学元件的目标位置,使得在目标位置中,由偏振相关扰动和两极偏振独立扰动构成的至少两个光学元件的总扰动 光学元件被最小化。 最后,将至少一个可移动光学元件移动到计算出的目标位置。

    Optical imaging system, in particular catadioptric reduction objective
    5.
    发明申请
    Optical imaging system, in particular catadioptric reduction objective 审中-公开
    光学成像系统,特别是反射折射减影目标

    公开(公告)号:US20050254120A1

    公开(公告)日:2005-11-17

    申请号:US11066923

    申请日:2005-02-28

    摘要: An optical reproduction system, which can be configured for example as a catadioptric projection lens. This system includes an optical axis and a first deflection mirror, which is tilted in relation to the optical axis at a given tilt angle. One of the deflection mirrors has a ratio Rsp of the reflection coefficient Rs for s-polarised light to the reflection coefficient Rp for p-polarised light, in an incidence angle range that includes the tilt angle, of greater than one, whereas the corresponding ratio for the other deflection mirror is less than one. The deflection mirrors thus ensure that the polarization-dependant influence of the travel light remains minimal.

    摘要翻译: 可以配置为例如反射折射投影透镜的光学再现系统。 该系统包括光轴和第一偏转镜,其以给定的倾斜角相对于光轴倾斜。 偏转镜中的一个具有对于s偏振光的反射系数R S s的反射系数R p S的比值R s SP与对于p的反射系数R p p 在包括倾斜角的入射角范围内的棱镜光大于1,而另一偏转镜的对应比率小于1。 因此,偏转镜确保行进光的偏振相关影响保持最小。