公开(公告)号：US08110815B2

公开(公告)日：2012-02-07

申请号：US12299702

申请日：2007-06-11

申请人： Frank Sinclair ,  Douglas R. Adams ,  Brent M. Copertino

发明人： Frank Sinclair ,  Douglas R. Adams ,  Brent M. Copertino

IPC分类号： H01J37/08

CPC分类号： C23C14/48 ,  C23C14/228 ,  H01J37/02 ,  H01J37/32412 ,  H01J2237/006 ,  H01J2237/022 ,  H01J2237/08 ,  H01J2237/31701

摘要： Providing vapor to a vapor-receiving device housed in a high vacuum chamber. An ion beam implanter, as an example, has a removable high voltage ion source within a high vacuum chamber and a vapor delivery system that delivers vapor to the ion source and does not interfere with removal of the ion source for maintenance. For delivering vapor to a vapor-receiving device, such as the high voltage ion source under vacuum, a flow interface device is in the form of a thermally conductive valve block. A delivery extension of the interface device automatically connects and disconnects within the high vacuum chamber with the removable vapor receiving device by respective installation and removal motions. In an ion implanter, the flow interface device or valve block and source of reactive cleaning gas are mounted in a non-interfering way on the electrically insulating bushing that insulates the ion source from the vacuum housing and the ion source may be removed without disturbing the flow interface device. Multiple vaporizers for solid material, provisions for reactive gas cleaning, and provisions for controlling flow are provided in the flow interface device.

摘要翻译： 向容纳在高真空室中的蒸汽接收装置提供蒸汽。 作为示例，离子束注入机在高真空室内具有可移除的高电压离子源，以及将蒸气输送到离子源并且不干扰离子源的去除以进行维护的蒸气输送系统。 为了将蒸汽输送到蒸汽接收装置，例如在真空下的高压离子源，流动接口装置是导热阀块的形式。 接口设备的传送延伸部通过相应的安装和移除动作，利用可移除的蒸气接收装置自动地在高真空室内连接和断开。 在离子注入机中，流动界面装置或阀块和反应性清洁气体源以非干扰的方式安装在电绝缘衬套上，该电绝缘衬套使离子源与真空壳体绝缘，并且离子源可被去除而不会干扰 流接口设备。 在流体接口装置中提供了用于固体材料的多个蒸发器，用于反应性气体清洁的设备和用于控制流量的设备。

公开(公告)号：US20090179157A1

公开(公告)日：2009-07-16

申请号：US12299702

申请日：2007-06-11

申请人： Frank R. Sinclair ,  Douglas R. Adams ,  Brent M. Copertino

发明人： Frank R. Sinclair ,  Douglas R. Adams ,  Brent M. Copertino

IPC分类号： H01J27/00 ,  A61N5/00

CPC分类号： C23C14/48 ,  C23C14/228 ,  H01J37/02 ,  H01J37/32412 ,  H01J2237/006 ,  H01J2237/022 ,  H01J2237/08 ,  H01J2237/31701

摘要： Providing vapor to a vapor-receiving device housed in a high vacuum chamber. An ion beam implanter, as an example, has a removable high voltage ion source within a high vacuum chamber and a vapor delivery system that delivers vapor to the ion source and does not interfere with removal of the ion source for maintenance. For delivering vapor to a vapor-receiving device, such as the high voltage ion source under vacuum, a flow interface device is in the form of a thermally conductive valve block. A delivery extension of the interface device automatically connects and disconnects within the high vacuum chamber with the removable vapor receiving device by respective installation and removal motions. In an ion implanter, the flow interface device or valve block and source of reactive cleaning gas are mounted in a non-interfering way on the electrically insulating bushing that insulates the ion source from the vacuum housing and the ion source may be removed without disturbing the flow interface device. Multiple vaporizers for solid material, provisions for reactive gas cleaning, and provisions for controlling flow are provided in the flow interface device.

摘要翻译： 向容纳在高真空室中的蒸汽接收装置提供蒸汽。 作为示例，离子束注入机在高真空室内具有可移除的高电压离子源，以及将蒸气输送到离子源并且不干扰离子源的去除以进行维护的蒸气输送系统。 为了将蒸汽输送到蒸汽接收装置，例如在真空下的高压离子源，流动接口装置是导热阀块的形式。 接口设备的传送延伸部通过相应的安装和移除动作，利用可移除的蒸气接收装置自动地在高真空室内连接和断开。 在离子注入机中，流动界面装置或阀块和反应性清洁气体源以非干涉的方式安装在电绝缘衬套上，该电绝缘套管使离子源与真空壳体绝缘，并且离子源可被去除而不会干扰 流接口设备。 在流体接口装置中提供了用于固体材料的多个蒸发器，用于反应性气体清洁的设备和用于控制流量的设备。