High erosion/wear resistant multi-layered coating system
    1.
    发明授权
    High erosion/wear resistant multi-layered coating system 失效
    高侵蚀/耐磨多层涂层系统

    公开(公告)号:US4927713A

    公开(公告)日:1990-05-22

    申请号:US389206

    申请日:1989-08-02

    摘要: An improved highly erosive and abrasive wear resistant multi-layered coating system on a substrate which provides protection against impact of large particles is disclosed comprising a plurality of composite layers. In each of the composite layers, the first layer closest to the substrate comprises tungsten of sufficient thickness to confer substantial erosion and abrasion wear resistance characteristics to the coating system and a second layer deposited on the first layer comprises a mixture of tungsten and tungsten carbide and the tungsten carbide comprises W.sub.2 C, W.sub.3 C, or a mixture of both. Because the resulting coating system has enhanced high cycle fatigue strength over the substrate, the coating system is especially useful on such structures as turbine blades and similar articles of manufacture where such high stress cycles occur during normal operation. Also dislcosed is the method for preparing such improved composite coating systems.

    摘要翻译: 公开了一种改进的高侵蚀性和磨蚀性耐磨多层涂层系统,其在基板上提供防止大颗粒冲击的保护,其包括多个复合层。 在每个复合层中,最靠近基底的第一层包括足够厚度的钨,以赋予涂层体系显着的侵蚀和磨损耐磨特性,而沉积在第一层上的第二层包括钨和碳化钨的混合物,以及 碳化钨包括W2C,W3C或两者的混合物。 由于所得到的涂层体系在衬底上具有增强的高循环疲劳强度,所以涂覆系统在诸如涡轮机叶片和类似的制品之类的结构中是特别有用的,其中在正常操作期间发生如此高的应力循环。 制备这种改进的复合涂层体系的方法也是一个缺点。

    Diamond membranes for X-ray lithography
    3.
    发明授权
    Diamond membranes for X-ray lithography 失效
    用于X射线光刻的金刚石膜

    公开(公告)号:US5146481A

    公开(公告)日:1992-09-08

    申请号:US720605

    申请日:1991-06-25

    IPC分类号: C23C16/27 G03F1/22 G21K1/10

    CPC分类号: G21K1/10 C23C16/271 G03F1/22

    摘要: A substantially compressive stress-free, pin-holes free, and defects free continuous polycrystalline diamond membrane for an x-ray lithography mask is produced by placing a prepared substrate into a hot filament chemical vapor deposition reaction chamber, pre-heating the substrate to 400.degree. C.-650.degree. C. in the presence of an inert gas, heating the substrate to 650.degree. C.-700.degree. C. in the presence of hydrogen and carbon compounds, and chemically vapor depositing a polycrystalline diamond membrane onto the substrate.

    摘要翻译: 通过将制备的衬底放置在热丝化学气相沉积反应室中,将衬底预加热至400℃,制备用于X射线光刻掩模的基本上无压应力,无针孔和无缺陷的连续多晶金刚石膜 在惰性气体存在下,在氢气和碳化合物的存在下将衬底加热至650℃-700℃,并将多晶金刚石膜化学气相沉积到衬底上。

    User interface for controlling a whirlpool tub
    4.
    发明授权
    User interface for controlling a whirlpool tub 有权
    用于控制漩涡浴缸的用户界面

    公开(公告)号:US06879863B2

    公开(公告)日:2005-04-12

    申请号:US10410024

    申请日:2003-04-09

    IPC分类号: G05B19/10 G05B15/00

    摘要: An apparatus is provided to control a plumbing fixture, such as a whirlpool, that has electrically operated components. The apparatus has a dial that is moveable by the user into a plurality of positions to select a function of the plumbing fixture to be controlled. A unique sensor arrangement detects motion and the direction of the motion and provides a signal to a controller that changes the valve of a pointer that designates which function is presently selected. The user then presses a keypad to indicate whether the selected function is to be activated or deactivated and to control the intensity of the selected function. The signals from the keypad also are applied to the controller.

    摘要翻译: 提供了一种用于控制具有电动部件的诸如漩涡的卫生器具的装置。 该装置具有可由使用者移动到多个位置的拨盘,以选择要控制的卫生器具的功能。 唯一的传感器装置检测运动和运动的方向,并向控制器提供信号,该控制器改变指示当前选择的功能的指示器的阀。 用户然后按下键盘以指示所选择的功能是被激活还是被去激活并且控制所选功能的强度。 来自键盘的信号也被应用于控制器。

    Low temperature chemical vapor deposition method for forming tungsten
and tungsten carbide
    5.
    发明授权
    Low temperature chemical vapor deposition method for forming tungsten and tungsten carbide 失效
    用于形成钨和碳化钨的低温化学气相沉积方法

    公开(公告)号:US5006371A

    公开(公告)日:1991-04-09

    申请号:US490184

    申请日:1990-03-08

    IPC分类号: C23C16/14 C23C16/30 C23C28/00

    CPC分类号: C23C28/00 C23C16/14 C23C16/30

    摘要: An improved highly erosive and abrasive wear resistant multi-layered coating system on a substrate which provides protection against impact of large particles is disclosed comprising a plurality of composite layers. In each of the composite layers, the first layer closest to the substrate comprises tungsten of sufficient thickness to confer substantial erosion and abrasion wear resistance characteristics to the coating system and a second layer deposited on the first layer comprises a mixture of tungsten and tungsten carbide and the tungsten carbide comprises W.sub.2 C, W.sub.3 C, or a mixture of both. Because the resulting coating system has enhanced high cycle fatigue strength over the substrate, the coating system is especially useful on such structures as turbine blades and similar articles of manufacture where such chemical vapor depositing the first and second layers at a temperature in the range of about 300.degree. to about 550.degree. C. and then repeating the chemical vapor deposition steps to achieve the multi-layered coating system such that the overall thickness of the system is at least about 20 .mu.m.

    摘要翻译: 公开了一种改进的高侵蚀性和磨蚀性耐磨多层涂层系统,其在基板上提供防止大颗粒冲击的保护,其包括多个复合层。 在每个复合层中,最靠近基底的第一层包括足够厚度的钨,以赋予涂层体系显着的侵蚀和磨损耐磨特性,而沉积在第一层上的第二层包括钨和碳化钨的混合物,以及 碳化钨包括W2C,W3C或两者的混合物。 由于所得到的涂层体系在衬底上具有增强的高循环疲劳强度,因此涂层系统特别适用于诸如涡轮机叶片和类似制品的结构,其中这种化学气相沉积第一和第二层的温度范围为约 然后重复化学气相沉积步骤以实现多层涂层体系,使得系统的总体厚度至少为20微米。

    Hard outer coatings deposited on titanium or titanium alloys
    7.
    发明授权
    Hard outer coatings deposited on titanium or titanium alloys 失效
    沉积在钛或钛合金上的硬外涂层

    公开(公告)号:US5009966A

    公开(公告)日:1991-04-23

    申请号:US409541

    申请日:1989-09-19

    IPC分类号: C23C16/02 C23C28/00

    摘要: The invention discloses a coated substrate product comprised of a titanium of titanium alloy substrate, at least one thin interlayer composed of a non-reactive noble metal and a hard outer coating selected from the group comprised of a ceramic, a hard metal, a hard metal compound and a diamond-like carbon, wherein at least the non-reactive noble metal interlayer which is immediately adjacent to the titanium or titanium alloy substrate is deposited onto the substrate by means of an electroless plating procedure, and the hard outer coating is deposited onto the non-reactive interlayer(s) by means of known chemical and physical vapor deposition techniques. The invention also discloses a method for making these coated substrate products.

    摘要翻译: 本发明公开了一种由钛合金基板钛,至少一层由非反应性贵金属构成的薄层和选自陶瓷,硬质金属,硬质金属 化合物和类金刚石碳,其中至少与钛或钛合金基底紧邻的非反应性贵金属中间层通过化学镀方法沉积到基底上,并将硬外涂层沉积到 非反应性中间层通过已知的化学和物理气相沉积技术。 本发明还公开了一种制备这些涂覆的基底产品的方法。

    Method for depositing highly erosive and abrasive wear resistant
composite coating system on a substrate
    10.
    发明授权
    Method for depositing highly erosive and abrasive wear resistant composite coating system on a substrate 失效
    在基材上沉积高侵蚀性和磨蚀性耐磨复合涂层体系的方法

    公开(公告)号:US5024901A

    公开(公告)日:1991-06-18

    申请号:US346774

    申请日:1989-05-03

    IPC分类号: C23C16/14 C23C16/30 C23C28/00

    摘要: The method for producing the disclosed material comprises chemical vapor depositing on the substrate a substantially columnar, intermediate layer of tungsten and chemical vapor depositing on the intermediate layer a non-columnar, substantially lamellar outer layer of a mixture of tungsten and tungsten carbide. The tungsten carbide comprises W.sub.2 C, W.sub.3 C, or a mixture of both wherein the ratio of the thickness of the tungsten intermediate layer to the thickness of the outer layer is at least: (a) 0.35 in the case of tungsten plus W.sub.2 C in the outer layer, (b) 0.6 in the case of a mixture of tungsten and W.sub.3 C in the outer layer and (c) 0.35 in the case of mixtures of tungsten and W.sub.2 C and W.sub.3 C in the outer layer. The chemical vapor deposition steps are carried out at pressures within the range of 1 Torr to 1,000 Torr and temperatures within the range of about 300.degree. to about 650.degree. C.

    摘要翻译: 用于生产所公开的材料的方法包括在基底上化学气相沉积基本上柱状的钨中间层和在中间层上沉积钨和碳化钨混合物的非圆柱形,基本上层状的外层的化学气相。 碳化钨包括W2C,W3C或两者的混合物,其中钨中间层的厚度与外层的厚度的比至少为:(a)在外加层中钨加W2C的情况下为0.35 ,(b)在外层为钨和W3C的混合物的情况下为0.6,(c)在外层为钨和W2C和W3C的混合物的情况下为0.35。 化学气相沉积步骤在1乇至1000乇范围内的压力和约300至约650℃范围内的温度下进行。