公开(公告)号：US06501534B1

公开(公告)日：2002-12-31

申请号：US09845375

申请日：2001-04-30

申请人： Bhanwar Singh ,  Ramkumar Subramanian ,  Bharath Rangarajan ,  Carmen Lapid Morales

发明人： Bhanwar Singh ,  Ramkumar Subramanian ,  Bharath Rangarajan ,  Carmen Lapid Morales

IPC分类号： G03B2752

CPC分类号： G03F7/70516 ,  G03F7/70558 ,  G03F7/70625 ,  G03F7/70641

摘要： The present invention is directed to a system and a method for calibrating a lithography stepper system. The system includes a lithography stepper system, measurement system such as a scatterometry system, and a processor for correlating an ideal “golden standard” characterization signature to a test structure characterization data set, based on a plurality of focus and exposure conditions.

摘要翻译： 本发明涉及用于校准光刻步进系统的系统和方法。 该系统包括光刻步进系统，诸如散射测量系统的测量系统和用于基于多个焦点和曝光条件将理想“黄金标准”表征特征与测试结构表征数据集相关联的处理器。