Interconnection structure and method for designing the same
    2.
    发明授权
    Interconnection structure and method for designing the same 有权
    互连结构及其设计方法

    公开(公告)号:US06710449B2

    公开(公告)日:2004-03-23

    申请号:US10101267

    申请日:2002-03-20

    IPC分类号: H01L2348

    摘要: A wiring pattern has been enlarged by mutually different values, thereby forming two enlarged wiring patterns are formed. Then, regions where the two enlarged wiring patterns overlap each other are removed, thereby forming a dummy pattern. Alternatively, a simple-figure pattern made of simple figures is formed and a dummy pattern is formed using the simple-figure pattern. A gap that is not wider than a predetermined value is located in a final wiring pattern made of the wiring pattern and the dummy pattern is defined as an air gap region. Thus, an interconnection structure incorporating air gaps between wiring patterns is formed.

    摘要翻译: 通过相互不同的值扩大布线图案,从而形成两个放大的布线图案。 然后,去除两个放大布线图案彼此重叠的区域,从而形成虚拟图案。 或者,形成由简单图形构成的简图,并使用简单图案形成虚拟图案。 不大于预定值的间隙位于由布线图案制成的最终布线图形中,并且虚设图案被定义为气隙区域。 因此,形成了在布线图案之间并入气隙的互连结构。