公开(公告)号：US08930001B2

公开(公告)日：2015-01-06

申请号：US13235800

申请日：2011-09-19

Applicant: Shengjing Mu ,  Stephen Wei Hong Weng ,  Joseph Ching Hua Lee

Inventor： Shengjing Mu ,  Stephen Wei Hong Weng ,  Joseph Ching Hua Lee

IPC: G05B13/02 ,  G05B13/04

CPC classification number: G05B13/041

Abstract: A method of model identification for a process with unknown initial conditions in an industrial plant, the method comprising collecting a set of manipulated variables and corresponding set of process variables from the process; obtaining a plurality of manipulated variables from the collected set of manipulated variables; for each of the plurality of manipulated variables, obtaining optimal model parameters of a model transfer function and computing a model fitting index for optimized simulated process variables generated by the model transfer function using the optimal model parameters; identifying a best model fitting index among the model fitting indices computed; selecting a manipulated variable associated with the best model fitting index as an initial steady state condition for the model transfer function; and selecting the optimal model parameters corresponding with the best model fitting index as the best model parameters of the model transfer function to tune the controller.

Abstract translation: 一种用于在工厂中具有未知初始条件的过程的模型识别的方法，所述方法包括从所述过程中收集一组操纵变量和对应的过程变量集合; 从所收集的一组操纵变量获得多个操纵变量; 对于所述多个操作变量中的每一个，获得模型传递函数的最优模型参数，并且使用所述最优模型参数来计算由所述模型传递函数生成的优化的模拟过程变量的模型拟合指数; 确定计算的模型拟合指数中的最佳模型拟合指数; 选择与最佳模型拟合指数相关联的操纵变量作为模型传递函数的初始稳态条件; 并选择与最佳模型拟合指数对应的最优模型参数作为模型传递函数的最佳模型参数来调节控制器。

公开(公告)号：US06679964B2

公开(公告)日：2004-01-20

申请号：US09981774

申请日：2001-10-16

Applicant: Chih-Kung Lee ,  Long-Sun Huang ,  Wen-Jong Chen ,  Ching-Heng Tang ,  Ching-Hua Lee

Inventor： Chih-Kung Lee ,  Long-Sun Huang ,  Wen-Jong Chen ,  Ching-Heng Tang ,  Ching-Hua Lee

IPC: H01L2146

CPC classification number: H01L27/14685 ,  H01L27/14618 ,  H01L27/14621 ,  H01L27/14627 ,  H01L2224/48091 ,  Y10T156/1093 ,  H01L2924/00014

Abstract: The present invention is a wafer level integrating method for bonding an un-sliced wafer including image sensors and a wafer-sized substrate including optical components thereon. A zeroth order light reflective substrate is provided between the un-sliced wafer and the wafer-sized substrate. The image sensors are either CMOS or CCD image sensors. The wafer-sized substrate is a transparent plate and the optical components thereon include a blazed grating, a two-dimensional microlens array or other optical-functional elements. The wafer-sized substrate is bonded onto the zeroth order light reflective substrate by an appropriate optical adhesive to form a composite substrate. Bonding pads and bumps are provided at corresponding positions on the bonding surface of the un-sliced wafer and the composite substrate respectively so that the composite substrate and the un-sliced wafer can be bonded together through a reflow process. Alternatively, the composite substrate and the un-sliced wafer can be bonded together by cold compression or thermal compression. The resultant wafer is then sliced into separated image sensors for further packaging, such as CLCC, PLCC, QFP, QFN or QFJ. Alternatively, the resultant wafer can be packaged through a wafer-level chip scale packaging process.

Abstract translation: 本发明是一种用于将包括图像传感器的未切片晶片和其上包括光学部件的晶片尺寸基板接合的晶片级积分方法。 在未切片的晶片和晶片尺寸的基板之间设置零级光反射基板。 图像传感器是CMOS或CCD图像传感器。 晶片尺寸的基板是透明板，并且其上的光学部件包括闪耀的光栅，二维微透镜阵列或其它光学功能元件。 晶片尺寸的基板通过合适的光学粘合剂粘合到第零级光反射基板上以形成复合基板。 在非切片晶片和复合基板的接合面上的对应位置分别设置有接合焊盘和凸块，使得复合基板和未切片的晶片可以通过回流工艺结合在一起。 或者，可以通过冷压缩或热压缩将复合衬底和未切片晶片结合在一起。 然后将得到的晶片切成分离的图像传感器以进一步包装，例如CLCC，PLCC，QFP，QFN或QFJ。 或者，所得到的晶片可以通过晶片级芯片级封装工艺进行封装。

公开(公告)号：US20130085717A1

公开(公告)日：2013-04-04

申请号：US13250172

申请日：2011-09-30

Applicant: Sankar Selvaraj ,  Lakshmi Kiran Kanchi ,  Joseph Ching Hua Lee

Inventor： Sankar Selvaraj ,  Lakshmi Kiran Kanchi ,  Joseph Ching Hua Lee

IPC: G06F15/00

CPC classification number: G05B23/0235 ,  G05B19/0428

Abstract: A method of qualifying performance of a conventional control valve in a process plant, the valve being controlled by a controller, the method comprising a processor obtaining data samples from a database stored on a server of the process plant, each data sample comprising a process variable, a set-point, and a manipulated variable; the processor computing a non-linearity index from the data samples and determining if the non-linearity index is greater than a threshold value; if the non-linearity index is greater than the threshold value, the processor charting a plot of the process variable against the manipulated variable and determining if the plot has an elliptical or rectangular fit; and if the plot has an elliptical fit, the processor determining if a percentage of the total number of data samples lying within a theoretical ellipse encompassed within the elliptical fit is less than or equal to a preset percentage.

Abstract translation: 一种限制过程工厂中常规控制阀的性能的方法，所述阀由控制器控制，所述方法包括处理器，其从存储在所述过程工厂的服务器上的数据库获取数据样本，每个数据样本包括过程变量 ，设定点和操纵变量; 所述处理器从所述数据样本计算非线性指数并确定所述非线性指数是否大于阈值; 如果非线性指数大于阈值，则处理器绘制过程变量与调节变量的曲线，并确定曲线图是否具有椭圆或矩形拟合; 并且如果绘图具有椭圆拟合，则处理器确定位于椭圆拟合内的理论椭圆内的数据样本的总数的百分比是否小于或等于预设百分比。

公开(公告)号：US07877232B2

公开(公告)日：2011-01-25

申请号：US12229980

申请日：2008-08-27

Applicant: Joseph Ching Hua Lee ,  Sharad Vishwasrao ,  Naveen Kashyap ,  Emelin Ornelas

Inventor： Joseph Ching Hua Lee ,  Sharad Vishwasrao ,  Naveen Kashyap ,  Emelin Ornelas

IPC: G06F11/30 ,  G06F19/00

CPC classification number: G05B23/0294

Abstract: A metric based performance monitoring a process control system is disclosed in which diagnostics are performed at multiple levels of the plant, results of the diagnostics converted into Key Performance Indicators and compared to predetermined benchmarks such that an integrated and overall determination of the plants' performance may be displayed.

Abstract translation: 公开了一种基于度量的性能监控过程控制系统，其中在工厂的多个级别执行诊断，将诊断结果转换为关键性能指标并与预定基准进行比较，使得对于设备的性能的综合和整体确定可以 被显示。

公开(公告)号：US20080243291A1

公开(公告)日：2008-10-02

申请号：US12009454

申请日：2008-01-18

Applicant: Joseph Ching Hua Lee ,  Sharad Vishwasrao ,  Emelin Ornelas ,  Naoya Kishimoto ,  Tatsuhiko Imai

Inventor： Joseph Ching Hua Lee ,  Sharad Vishwasrao ,  Emelin Ornelas ,  Naoya Kishimoto ,  Tatsuhiko Imai

IPC: G06F17/00

CPC classification number: G05B23/024

Abstract: The invention is a system for assessing and diagnosing performance of a control loop, comprising a Data Collection Section which collects data of two parameters of the control loop for an installed valve. The data collected is processed in a Linear Regression Section to generate a linear regression. A User Setting Port is provided to define the tolerance band and the boundary points. The generated linear regression, together with the defined tolerance band and boundary points are processed in a Linear Approximation Section to generate an acceptable reference region.

Abstract translation: 本发明是一种用于评估和诊断控制回路性能的系统，包括数据收集部分，其收集安装阀门的控制回路的两个参数的数据。 收集的数据在线性回归部分进行处理，以生成线性回归。 提供用户设置端口来定义公差带和边界点。 生成的线性回归与定义的公差带和边界点一起在线性近似截面中进行处理，以生成可接受的参考区域。

公开(公告)号：US08224473B2

公开(公告)日：2012-07-17

申请号：US12693830

申请日：2010-01-26

Applicant: Sankar Selvaraj ,  Joseph Ching Hua Lee ,  Sreenivas Yelneedi

Inventor： Sankar Selvaraj ,  Joseph Ching Hua Lee ,  Sreenivas Yelneedi

IPC: G06F11/30

CPC classification number: G05B23/021 ,  G05B23/024

Abstract: An apparatus for monitoring an industrial process comprising a plurality of variables. The apparatus comprises a defining module configured for defining a normal-condition data set may comprise data values of the variables when the industrial process is operating under a normal condition and for defining an abnormal-condition data set may comprise data values of the variables when the industrial process is operating under an abnormal condition; a modelling module configured for modelling a normal-condition model from the normal-condition data set and modelling an abnormal-condition model from the abnormal-condition data set; a plotting module configured for plotting a normal-condition plot from the normal-condition model and plotting an abnormal-condition plot from the abnormal-condition model; and an analysis module configured for analysing live data values of the variables for simultaneous display with the normal-condition plot and the abnormal-condition plot.

Abstract translation: 一种用于监测包括多个变量的工业过程的装置。 该装置包括被配置用于定义正常状态数据集的定义模块可以包括当工业过程在正常条件下操作时的变量的数据值，并且用于定义异常状态数据集可以包括变量的数据值，当 工业过程正在异常运行; 建模模块，其被配置为从正常状态数据集建模正常状态模型，并从异常状态数据集建模异常状态模型; 绘制模块，被配置为绘制来自正常状态模型的正常状况图，并绘制来自异常状况模型的异常状况图; 以及分析模块，被配置为分析用于与正常状况图和异常状况图同时显示的变量的实时数据值。

公开(公告)号：US07672796B2

公开(公告)日：2010-03-02

申请号：US11820142

申请日：2007-06-18

Applicant: Joseph Ching Hua Lee ,  Sharad Vishwasrao ,  Naveen Kashyap ,  Emelin Ornelas

Inventor： Joseph Ching Hua Lee ,  Sharad Vishwasrao ,  Naveen Kashyap ,  Emelin Ornelas

IPC: G01F1/34

CPC classification number: G01F1/363

Abstract: A method for providing a system for establishing a control valve performance in a process operation. The system includes establishing an expected flow rate for a control valve by measuring a differential pressure between an upstream and downstream position of a control valve of interest and using the formula Q = Cv × φ ⁡ ( x ) × Δ ⁢ ⁢ P G , measuring an actual flow rate across the control valve, comparing the actual flow rate with the expected flow rate to determine the difference in value between the actual and expected flow rate, determining if the difference is within an acceptable range of values from the expected flow rate and establishing the performance of the control valve.

Abstract translation: 一种提供用于在过程操作中建立控制阀性能的系统的方法。 该系统包括通过测量感兴趣的控制阀的上游和下游位置之间的差压并使用公式Q = Cv×＆phgr;来建立控制阀的预期流量; ⁡（x）×＆Dgr νPPG，测量控制阀两端的实际流量，将实际流量与预期流量进行比较，以确定实际流量与预期流量之间的差值，确定差值是否在可接受的值范围内 预期流量和建立控制阀的性能。

公开(公告)号：US20130073061A1

公开(公告)日：2013-03-21

申请号：US13235800

申请日：2011-09-19

Applicant: Shengjing Mu ,  Stephen Wei Hong Weng ,  Joseph Ching Hua Lee

Inventor： Shengjing Mu ,  Stephen Wei Hong Weng ,  Joseph Ching Hua Lee

IPC: G05B13/02

CPC classification number: G05B13/041

Abstract: A method of model identification for a process with unknown initial conditions in an industrial plant, the method comprising collecting a set of manipulated variables and corresponding set of process variables from the process; obtaining a plurality of manipulated variables from the collected set of manipulated variables; for each of the plurality of manipulated variables, obtaining optimal model parameters of a model transfer function and computing a model fitting index for optimized simulated process variables generated by the model transfer function using the optimal model parameters; identifying a best model fitting index among the model fitting indices computed; selecting a manipulated variable associated with the best model fitting index as an initial steady state condition for the model transfer function; and selecting the optimal model parameters corresponding with the best model fitting index as the best model parameters of the model transfer function to tune the controller.

Abstract translation: 一种用于在工厂中具有未知初始条件的过程的模型识别的方法，所述方法包括从所述过程中收集一组操纵变量和对应的过程变量集合; 从所收集的一组操纵变量获得多个操纵变量; 对于所述多个操作变量中的每一个，获得模型传递函数的最优模型参数，并且使用所述最优模型参数来计算由所述模型传递函数生成的优化的模拟过程变量的模型拟合指数; 确定计算的模型拟合指数中的最佳模型拟合指数; 选择与最佳模型拟合指数相关联的操纵变量作为模型传递函数的初始稳态条件; 并选择与最佳模型拟合指数对应的最优模型参数作为模型传递函数的最佳模型参数来调节控制器。

公开(公告)号：US08203455B2

公开(公告)日：2012-06-19

申请号：US12473375

申请日：2009-05-28

Applicant: Kun-Ta Lee ,  Chih Lo ,  Ching-Yen Lee ,  Ching-Hua Lee ,  Ching-Jung Lee

Inventor： Kun-Ta Lee ,  Chih Lo ,  Ching-Yen Lee ,  Ching-Hua Lee ,  Ching-Jung Lee

IPC: G08B23/00

CPC classification number: A61B5/103 ,  A61B5/1116 ,  A61B5/6823 ,  A61B2562/0261 ,  A63B23/0244 ,  A63B2071/0627 ,  A63B2071/0655 ,  A63B2220/13

Abstract: A posture sensing alert apparatus is provided. The posture sensing alert apparatus comprises an attachment element, a detecting element, a processing element and an alert element. The attachment element is adapted to attach on a human body. The detecting element is disposed on the attachment element and is adapted to sense a posture change from the human body. The processing element is disposed on the attachment element and connects to the detecting element. The processing element is adapted to output a signal to the alert element in response to the posture change for a predetermined period so that the alert element is adapted to output an alert accordingly.

Abstract translation: 提供了一种姿势感测警报装置。 姿势检测报警装置包括附件，检测元件，处理元件和报警元件。 附接元件适于附接在人体上。 检测元件设置在附接元件上并且适于感测来自人体的姿势变化。 处理元件设置在附接元件上并连接到检测元件。 处理元件适于响应于预定时间段的姿势变化而将信号输出到警报元件，使得警报元件适于相应地输出警报。

公开(公告)号：US20100286969A1

公开(公告)日：2010-11-11

申请号：US12693830

申请日：2010-01-26

Applicant: Sankar Selvaraj ,  Joseph Ching Hua Lee ,  Sreenivas Yelneedi

Inventor： Sankar Selvaraj ,  Joseph Ching Hua Lee ,  Sreenivas Yelneedi

IPC: G06G7/66 ,  G06F17/18

CPC classification number: G05B23/021 ,  G05B23/024

Abstract: An apparatus for monitoring an industrial process comprising a plurality of variables. The apparatus comprises a defining module configured for defining a normal-condition data set may comprise data values of the variables when the industrial process is operating under a normal condition and for defining an abnormal-condition data set may comprise data values of the variables when the industrial process is operating under an abnormal condition; a modelling module configured for modelling a normal-condition model from the normal-condition data set and modelling an abnormal-condition model from the abnormal-condition data set; a plotting module configured for plotting a normal-condition plot from the normal-condition model and plotting an abnormal-condition plot from the abnormal-condition model; and an analysis module configured for analysing live data values of the variables for simultaneous display with the normal-condition plot and the abnormal-condition plot.

Abstract translation: 一种用于监测包括多个变量的工业过程的装置。 该装置包括被配置用于定义正常状态数据集的定义模块可以包括当工业过程在正常条件下操作时的变量的数据值，并且用于定义异常状态数据集可以包括变量的数据值，当 工业过程正在异常运行; 建模模块，其被配置为从正常状态数据集建模正常状态模型，并从异常状态数据集建模异常状态模型; 绘制模块，被配置为绘制来自正常状态模型的正常状况图，并绘制来自异常状况模型的异常状况图; 以及分析模块，被配置为分析用于与正常状况图和异常状况图同时显示的变量的实时数据值。