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公开(公告)号：US20130206992A1
公开(公告)日：2013-08-15
申请号：US13820575
申请日：2011-06-24
申请人： Jong Han Jin , Jae Wan Kim , Jong Ahn Kim , Chu-Shik Kang
发明人： Jong Han Jin , Jae Wan Kim , Jong Ahn Kim , Chu-Shik Kang
CPC分类号： G01B11/22 , G01B9/02008 , G01B11/12 , G01B2210/56 , G01N21/9501 , G01N2021/95653
摘要： The present invention pertains to a device and a method for measuring a via hole of a silicon wafer, wherein it is possible to precisely measure the depth of the via hole without damaging the wafer. Broadband infrared light is radiated to a silicon wafer which has a superior light transmission property, so that the depth of the via hole may be measured from the light which is reflected from each boundary surface of the wafer and the interference signal of reference light. The via hole measuring device according to the present invention includes: a light source unit for generating broadband infrared light; and an interferometer for radiating the light generated from the light source unit to a silicon wafer, so as to measure the depth of a via hole formed on the wafer according to the spectrum period of the interference signal of the light, which is reflected from the silicon wafer.
摘要翻译： 本发明涉及用于测量硅晶片的通孔的装置和方法，其中可以精确地测量通孔的深度而不损坏晶片。 宽带红外光被照射到具有优异的透光性的硅晶片，从而可以从从晶片的每个边界面反射的光和参考光的干涉信号测量通孔的深度。 根据本发明的通孔测量装置包括：用于产生宽带红外光的光源单元; 以及干涉仪，用于将从光源单元产生的光发射到硅晶片，以便根据光的干涉信号的光谱周期来测量形成在晶片上的通孔的深度，该距离从 硅晶片。
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公开(公告)号：US08279448B2
公开(公告)日：2012-10-02
申请号：US12676245
申请日：2008-08-19
申请人： Jae-wan Kim , Tae-bong Eom , Jong-ahn Kim , Chu-shik Kang
发明人： Jae-wan Kim , Tae-bong Eom , Jong-ahn Kim , Chu-shik Kang
CPC分类号： G01B11/2441
摘要： A shape measurement apparatus and method using a laser interferometer are disclosed. The shape measurement apparatus includes a plurality of laser devices, which generate beams, emit a beam of a specific frequency from among the generated beams, and output interference signals for detecting wavelengths of the generated beams, and a controller for detecting the wavelengths of the generated beams from the outputted interference signals, and controlling the laser devices on the basis of the detected wavelengths. The optical unit projects the beam of the laser device on a target object, and generates an interference pattern of the object. Several shutters are closed and opened. If the shutters are closed, they prevent the beam of each laser device to be projected on the optical unit. An image pickup unit captures the interference pattern.
摘要翻译： 公开了一种使用激光干涉仪的形状测量装置和方法。 形状测量装置包括多个激光装置，其产生光束，从所生成的光束中发射特定频率的光束，并输出用于检测所生成的光束的波长的干涉信号;以及控制器，用于检测所产生的光束的波长 来自所输出的干扰信号的光束，并且基于检测到的波长来控制激光器件。 光学单元将激光装置的光束投射在目标物体上，并产生物体的干涉图案。 几个百叶窗关闭并打开。 如果快门关闭，则可以防止每个激光装置的光束投射到光学单元上。 摄像单元捕获干涉图案。
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公开(公告)号：US09121696B2
公开(公告)日：2015-09-01
申请号：US13820575
申请日：2011-06-24
申请人： Jong Han Jin , Jae Wan Kim , Jong Ahn Kim , Chu-Shik Kang
发明人： Jong Han Jin , Jae Wan Kim , Jong Ahn Kim , Chu-Shik Kang
CPC分类号： G01B11/22 , G01B9/02008 , G01B11/12 , G01B2210/56 , G01N21/9501 , G01N2021/95653
摘要： The present invention pertains to a device and a method for measuring a via hole of a silicon wafer, wherein it is possible to precisely measure the depth of the via hole without damaging the wafer. Broadband infrared light is radiated to a silicon wafer which has a superior light transmission property, so that the depth of the via hole may be measured from the light which is reflected from each boundary surface of the wafer and the interference signal of reference light. The via hole measuring device according to the present invention includes: a light source unit for generating broadband infrared light; and an interferometer for radiating the light generated from the light source unit to a silicon wafer, so as to measure the depth of a via hole formed on the wafer according to the spectrum period of the interference signal of the light, which is reflected from the silicon wafer.
摘要翻译： 本发明涉及用于测量硅晶片的通孔的装置和方法，其中可以精确地测量通孔的深度而不损坏晶片。 宽带红外光被照射到具有优异的透光性的硅晶片，从而可以从从晶片的每个边界面反射的光和参考光的干涉信号测量通孔的深度。 根据本发明的通孔测量装置包括：用于产生宽带红外光的光源单元; 以及干涉仪，用于将从光源单元产生的光发射到硅晶片，以便根据光的干涉信号的光谱周期来测量形成在晶片上的通孔的深度，该距离从 硅晶片。
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公开(公告)号：US08290007B2
公开(公告)日：2012-10-16
申请号：US12676294
申请日：2008-08-19
申请人： Jae-Wan Kim , Tae-Bong Eom , Jong-Ahn Kim , Chu-Shik Kang
发明人： Jae-Wan Kim , Tae-Bong Eom , Jong-Ahn Kim , Chu-Shik Kang
IPC分类号： H01S3/13
CPC分类号： H01S5/0687 , H01S5/005 , H01S5/0078 , H01S5/06804 , H01S5/0683
摘要： A frequency-stabilized laser apparatus and a method for stabilizing the frequency of a laser are disclosed. A semiconductor laser emits a beam. An external reflector has a resonance frequency and feeds back the emitted beam to the semiconductor laser if the frequency of the emitted beam is equal to the resonance frequency. An interference signal generator generates an interference signal for detecting the wavelength of the emitted beam and a controller detects the wavelength of the beam from the generated interference signal. According to the frequency-stabilized laser apparatus and the method for stabilizing the frequency of the laser, it is possible to stabilize the frequency of the beam emitted from the semiconductor laser and output the beam having the stable frequency for a long period of time.
摘要翻译： 公开了一种频率稳定的激光装置和用于稳定激光器的频率的方法。 半导体激光器发射光束。 如果发射光束的频率等于谐振频率，则外部反射器具有谐振频率并将发射的光束反馈到半导体激光器。 干扰信号发生器产生用于检测发射波束的波长的干扰信号，并且控制器根据所产生的干扰信号来检测波束的波长。 根据频率稳定的激光装置和稳定激光的频率的方法，可以使从半导体激光器发射的光束的频率稳定并输出长时间具有稳定频率的光束。
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公开(公告)号：US20100182614A1
公开(公告)日：2010-07-22
申请号：US12676245
申请日：2008-08-19
申请人： Jae-wan Kim , Tae-bong Eom , Jong-ahn Kim , Chu-shik Kang
发明人： Jae-wan Kim , Tae-bong Eom , Jong-ahn Kim , Chu-shik Kang
IPC分类号： G01B11/24
CPC分类号： G01B11/2441
摘要： A shape measurement apparatus and method using a laser interferometer are disclosed. The shape measurement apparatus includes a plurality of laser devices, which generate beams, emit a beam of a specific frequency from among the generated beams, and output interference signals for detecting wavelengths of the generated beams, and a controller for detecting the wavelengths of the generated beams from the outputted interference signals, and controlling the laser devices on the basis of the detected wavelengths. The optical unit projects the beam of the laser device on a target object, and generates an interference pattern of the object. Several shutters are closed and opened. If the shutters are closed, they prevent the beam of each laser device to be projected on the optical unit. An image pickup unit captures the interference pattern.
摘要翻译： 公开了一种使用激光干涉仪的形状测量装置和方法。 形状测量装置包括多个激光装置，其产生光束，从所生成的光束中发射特定频率的光束，并输出用于检测所生成的光束的波长的干涉信号;以及控制器，用于检测所产生的光束的波长 来自所输出的干扰信号的光束，并且基于检测到的波长来控制激光器件。 光学单元将激光装置的光束投射在目标物体上，并产生物体的干涉图案。 几个百叶窗关闭并打开。 如果快门关闭，则可以防止每个激光装置的光束投射到光学单元上。 摄像单元捕获干涉图案。
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公开(公告)号：US20100177795A1
公开(公告)日：2010-07-15
申请号：US12676294
申请日：2008-08-19
申请人： Jae-Wan Kim , Tae-Bong Eom , Jong-Ahn Kim , Chu-Shik Kang
发明人： Jae-Wan Kim , Tae-Bong Eom , Jong-Ahn Kim , Chu-Shik Kang
CPC分类号： H01S5/0687 , H01S5/005 , H01S5/0078 , H01S5/06804 , H01S5/0683
摘要： A frequency-stabilized laser apparatus and a method for stabilizing the frequency of a laser are disclosed. A semiconductor laser emits a beam. An external reflector has a resonance frequency and feeds back the emitted beam to the semiconductor laser if the frequency of the emitted beam is equal to the resonance frequency. An interference signal generator generates an interference signal for detecting the wavelength of the emitted beam and a controller detects the wavelength of the beam from the generated interference signal. According to the frequency-stabilized laser apparatus and the method for stabilizing the frequency of the laser, it is possible to stabilize the frequency of the beam emitted from the semiconductor laser and output the beam having the stable frequency for a long period of time.
摘要翻译： 公开了一种频率稳定的激光装置和用于稳定激光器的频率的方法。 半导体激光器发射光束。 如果发射光束的频率等于谐振频率，则外部反射器具有谐振频率并将发射的光束反馈到半导体激光器。 干扰信号发生器产生用于检测发射波束的波长的干扰信号，并且控制器根据所产生的干扰信号来检测波束的波长。 根据频率稳定的激光装置和稳定激光的频率的方法，可以使从半导体激光器发射的光束的频率稳定并输出长时间具有稳定频率的光束。
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