Process for reducing impurities in oxycodone base
    8.
    发明授权
    Process for reducing impurities in oxycodone base 有权
    降低羟考酮基质杂质的方法

    公开(公告)号:US07875719B2

    公开(公告)日:2011-01-25

    申请号:US11949824

    申请日:2007-12-04

    IPC分类号: C07D489/02

    CPC分类号: C07D489/08

    摘要: The present invention is directed to a process for using n-butanol to prepare an oxycodone base compositions having reduced levels of impurities such as 14-hydroxycodeinone and DHDHC.

    摘要翻译: 本发明涉及使用正丁醇制备具有降低的杂质水平的羟考酮基组合物的方法,例如14-羟可待因酮和DHDHC。

    Process for Reducing Impurities in Oxycodone Base
    9.
    发明申请
    Process for Reducing Impurities in Oxycodone Base 有权
    减少羟考酮中杂质的方法

    公开(公告)号:US20080132703A1

    公开(公告)日:2008-06-05

    申请号:US11949824

    申请日:2007-12-04

    IPC分类号: C07D489/00

    CPC分类号: C07D489/08

    摘要: The present invention is directed to a process for using n-butanol to prepare an oxycodone base compositions having reduced levels of impurities such as 14-hydroxycodeinone and DHDHC.

    摘要翻译: 本发明涉及使用正丁醇制备具有降低的杂质水平的羟考酮基组合物的方法,例如14-羟可待因酮和DHDHC。