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    High-Resolution Laser Induced Breakdown Spectroscopy Devices and Methods
    1.
    发明申请
    High-Resolution Laser Induced Breakdown Spectroscopy Devices and Methods 审中-公开
    高分辨率激光诱导分解光谱仪器及方法

    公开(公告)号：US20120206722A1

    公开(公告)日：2012-08-16

    申请号：US13155207

    申请日：2011-06-07

    Applicant: Costas P. Grigoropoulos ,  David Jen Hwang ,  Jong Hyun Yoo ,  Richard E. Russo

    Inventor： Costas P. Grigoropoulos ,  David Jen Hwang ,  Jong Hyun Yoo ,  Richard E. Russo

    IPC: G01J3/30

    CPC classification number: G01N21/718

    Abstract: Provided are laser induced breakdown spectroscopy (LIBS) devices. Embodiments of the devices are configured to obtain a spatial resolution of 10 μm or less. Also provided are methods of using the subject LIBS devices to determine whether one or more elements of interest are present in a target sample. The devices and methods find use in a variety of applications, e.g., submicron and nanoscale chemical analysis applications.

    Abstract translation: 提供激光诱导击穿光谱（LIBS）器件。 这些装置的实施例被配置成获得10μm或更小的空间分辨率。 还提供了使用对象LIBS设备来确定目标样本中是否存在感兴趣的一个或多个元素的方法。 这些装置和方法可用于各种应用，例如亚微米和纳米级化学分析应用。

    Method for patterning crystalline indium tin oxide using femtosecond laser
    2.
    发明授权
    Method for patterning crystalline indium tin oxide using femtosecond laser 有权
    使用飞秒激光图案化结晶铟锡氧化物的方法

    公开(公告)号：US07994029B2

    公开(公告)日：2011-08-09

    申请号：US12358046

    申请日：2009-01-22

    Applicant: Chung-Wei Cheng ,  Costas P. Grigoropoulos ,  David Jen Hwang ,  Moosung Kim

    Inventor： Chung-Wei Cheng ,  Costas P. Grigoropoulos ,  David Jen Hwang ,  Moosung Kim

    IPC: H01L21/20 ,  H01L21/36 ,  H01L21/44

    CPC classification number: H01J9/02 ,  H01J61/06

    Abstract: A method for patterning crystalline indium tin oxide (ITO) using femtosecond laser is disclosed, which comprises steps of: (a) providing a substrate with an amorphous ITO layer thereon; (b) transferring the amorphous ITO layer in a predetermined area into a crystalline ITO layer by emitting a femtosecond laser beam to the amorphous ITO layer in the predetermined area; and (c) removing the amorphous ITO layer on the substrate using an etching solution.

    Abstract translation: 公开了一种利用飞秒激光器对结晶铟锡氧化物（ITO）进行构图的方法，其中包括以下步骤：（a）在其上提供非晶ITO层的衬底; （b）通过将飞秒激光束发射到预定区域中的非晶ITO层，将预定区域中的非晶ITO层转移到结晶ITO层中; 和（c）使用蚀刻溶液去除衬底上的非晶ITO层。

    ARBITRARY PATTERN DIRECT NANOSTRUCTURE FABRICATION METHODS AND SYSTEM
    3.
    发明申请
    ARBITRARY PATTERN DIRECT NANOSTRUCTURE FABRICATION METHODS AND SYSTEM 有权

    公开(公告)号：US20110318695A1

    公开(公告)日：2011-12-29

    申请号：US13156221

    申请日：2011-06-08

    Applicant: David Jen Hwang ,  Costas P. Grigoropoulos

    Inventor： David Jen Hwang ,  Costas P. Grigoropoulos

    IPC: G03F7/20 ,  G03B27/00 ,  B82Y30/00

    CPC classification number: B82Y30/00 ,  B82Y40/00 ,  G03F1/50 ,  G03F7/70325

    Abstract: Methods of producing a nanostructure in a target film are provided. The method includes selectively irradiating at least one focusing element of a near-field focusing array that is in near-field focusing relationship with a target film in a manner sufficient to produce a nanostructure from the target film. Also provided are systems for practicing methods of the invention, as well as objects produced thereby.

    Abstract translation: 提供了在靶膜中制备纳米结构的方法。 该方法包括以足以从目标膜产生纳米结构的方式选择性地照射与靶膜近场聚焦关系的近场聚焦阵列的至少一个聚焦元件。 还提供了用于实施本发明的方法的系统，以及由此产生的物体。

    Arbitrary pattern direct nanostructure fabrication methods and system
    6.
    发明授权
    Arbitrary pattern direct nanostructure fabrication methods and system 有权
    任意模式直接纳米结构制造方法和系统

    公开(公告)号：US08728720B2

    公开(公告)日：2014-05-20

    申请号：US13156221

    申请日：2011-06-08

    Applicant: David Jen Hwang ,  Costas P. Grigoropoulos

    Inventor： David Jen Hwang ,  Costas P. Grigoropoulos

    IPC: G03F7/00

    CPC classification number: B82Y30/00 ,  B82Y40/00 ,  G03F1/50 ,  G03F7/70325

    Abstract: Methods of producing a nanostructure in a target film are provided. The method includes selectively irradiating at least one focusing element of a near-field focusing array that is in near-field focusing relationship with a target film in a manner sufficient to produce a nanostructure from the target film. Also provided are systems for practicing methods of the invention, as well as objects produced thereby.

    Abstract translation: 提供了在靶膜中制备纳米结构的方法。 该方法包括以足以从目标膜产生纳米结构的方式选择性地照射与靶膜近场聚焦关系的近场聚焦阵列的至少一个聚焦元件。 还提供了用于实施本发明的方法的系统，以及由此产生的物体。

    METHOD FOR PATTERNING CRYSTALLINE INDIUM TIN OXIDE USING FEMTOSECOND LASER
    7.
    发明申请
    METHOD FOR PATTERNING CRYSTALLINE INDIUM TIN OXIDE USING FEMTOSECOND LASER 有权
    使用FEMTOSECOND激光打印晶体氧化铟锡的方法

    公开(公告)号：US20090221141A1

    公开(公告)日：2009-09-03

    申请号：US12358046

    申请日：2009-01-22

    Applicant: CHUNG-WEI CHENG ,  COSTAS P. GRIGOROPOULOS ,  DAVID JEN HWANG ,  MOOSUNG KIM

    Inventor： CHUNG-WEI CHENG ,  COSTAS P. GRIGOROPOULOS ,  DAVID JEN HWANG ,  MOOSUNG KIM

    IPC: H01L21/428

    CPC classification number: H01J9/02 ,  H01J61/06

    Abstract: A method for patterning crystalline indium tin oxide (ITO) using femtosecond laser is disclosed, which comprises steps of: (a) providing a substrate with an amorphous ITO layer thereon; (b) transferring the amorphous ITO layer in a predetermined area into a crystalline ITO layer by emitting a femtosecond laser beam to the amorphous ITO layer in the predetermined area; and (c) removing the amorphous ITO layer on the substrate using an etching solution.

    Abstract translation: 公开了一种利用飞秒激光器对结晶铟锡氧化物（ITO）进行构图的方法，其中包括以下步骤：（a）在其上提供非晶ITO层的衬底; （b）通过将飞秒激光束发射到预定区域中的非晶ITO层，将预定区域中的非晶ITO层转移到结晶ITO层中; 和（c）使用蚀刻溶液去除衬底上的非晶ITO层。

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