Zone purification of silicon in a reactive plasma
    1.
    发明授权
    Zone purification of silicon in a reactive plasma 失效
    反应性等离子体中硅的区域纯化

    公开(公告)号:US4399116A

    公开(公告)日:1983-08-16

    申请号:US287789

    申请日:1981-07-28

    IPC分类号: C30B13/00 C30B13/22 C01B33/02

    CPC分类号: C30B29/06 C30B13/22

    摘要: Boron is removed from silicon by zone melting purification. A jet of hot plasma obtained by high frequency excitation is directed on a zone of a bar of silicon to be purified. The plasma is formed from a mixture of a plasma-producing gas, such as argon, and an amount of oxygen which is sufficiently low to avoid oxidization of silicon.

    摘要翻译: 通过区域熔融纯化从硅中除去硼。 通过高频激发获得的热等离子体射流指向待纯化的硅棒的区域。 等离子体由等离子体产生气体如氩气和足够低的氧气量的混合物形成,以避免硅的氧化。

    Method for Locally Repairing Thermal Barriers
    2.
    发明申请
    Method for Locally Repairing Thermal Barriers 审中-公开
    局部修复热障碍的方法

    公开(公告)号:US20170044901A1

    公开(公告)日:2017-02-16

    申请号:US15101023

    申请日:2014-12-01

    摘要: The invention relates to a method for repairing a thermal barrier of a component comprising a substrate coated with such a thermal barrier, said substrate being made of a high-performance alloy, said thermal barrier being adhered to the alloy and having lower thermal conductivity than the alloy, the thermal barrier including at least one ceramic, one region of the thermal barrier being a region to be repaired, wherein said method includes the following steps: a) defining the region to be repaired, using a mask which protects the other regions of the thermal barrier; b) injecting a carrier gas loaded with droplets of ceramic precursor into a plasma discharge inside a plasma chamber of a plasma reactor containing the component to be repaired, while making the concentration of ceramic precursor in the carrier gas dependent on at least one parameter of the reactor selected from among: the pressure of the plasma chamber, the power of the plasma generator and the diameter of the precursor droplets, in order to control the state—liquid, gel or solid—of the ceramic precursor having an effect on the region to be repaired; c) injecting a gas not loaded with ceramic precursor into a plasma discharge within the plasma chamber, steps b) and c) being repeated.

    摘要翻译: 本发明涉及一种用于修复部件的热障的方法,该方法包括涂覆有这种热障的基底,所述基底由高性能合金制成,所述热障粘附在合金上,具有比 合金,所述热障包括至少一个陶瓷,所述热障壁的一个区域是要修复的区域,其中所述方法包括以下步骤:a)使用保护其它区域的掩模来限定待修复的区域 热障; b)将装载有陶瓷前体液滴的载气注入等离子体反应器内的等离子体放电室内,所述等离子体反应器含有要修复的组分,同时使载体中的陶瓷前体的浓度取决于载体中的至少一个参数 反应器,其选自:等离子体室的压力,等离子体发生器的功率和前体液滴的直径,以便控制对该区域具有影响的陶瓷前体的状态 - 液体,凝胶或固体 被修理 c)将未装载陶瓷前体的气体注入到等离子体室内的等离子体放电中,重复步骤b)和c)。