Vaporizer for generating feed gas for an arc chamber
    1.
    发明授权
    Vaporizer for generating feed gas for an arc chamber 有权
    用于产生电弧室的进料气体的蒸发器

    公开(公告)号:US07004234B2

    公开(公告)日:2006-02-28

    申请号:US10397234

    申请日:2003-03-27

    CPC classification number: C30B23/066 C23C14/243 C30B31/22

    Abstract: A vaporizer generating feed gas for the arc chamber of an ion source has a crucible which is heated to a temperature at which material in the crucible sublimes to produce a vapour for use as the feed gas. In addition to the heating element for heating the crucible, there is a cooling element in the form of a cooling duct extending along the length of the crucible for receiving the cooling fluid. Forced cooling of the crucible when the heating element is switched off enables the crucible to be cooled more quickly so that the supply of a feed gas can be terminated sooner. This is important if an ion source is being switched from one feed gas to another. Also, the crucible may be forced cooled simultaneously while energizing the heating element to enable the crucible to be accurately controlled at a lower operating temperature if desired.

    Abstract translation: 产生用于离子源的电弧室的进料气体的蒸发器具有坩埚,该坩埚被加热到坩埚内的材料升华以产生用作进料气体的蒸汽的温度。 除了用于加热坩埚的加热元件之外,还有一个沿着坩埚长度延伸的冷却管道形式的冷却元件,用于接收冷却流体。 当加热元件关闭时,坩埚的强制冷却使得坩埚能够更快地冷却,从而可以更早地终止进料气体的供给。 如果离子源从一个进料气体切换到另一个进料气体,这很重要。 此外,如果需要,坩埚可以同时强制冷却同时加热加热元件,以使坩埚能够精确地控制在较低的工作温度。

    Apparatus and method for monitoring and tuning an ion beam in ion implantation apparatus
    2.
    发明授权
    Apparatus and method for monitoring and tuning an ion beam in ion implantation apparatus 失效
    用于在离子注入装置中监测和调整离子束的装置和方法

    公开(公告)号:US06897457B1

    公开(公告)日:2005-05-24

    申请号:US09869795

    申请日:1999-12-23

    CPC classification number: H01J37/304 H01J37/1471 H01J37/3171 H01J2237/1501

    Abstract: An ion implanter has an ion source (10) and an ion beam extraction assembly (50) for extracting the ions. The extraction assembly (50) is a tetrode structure and one of the pairs of extraction electrodes (51) has left and right ports (54, 55) located in opposite sides of the ion beam emerging from the ion source (10). The left and right electrode ports (54, 55) are electrically isolated from each other and connected to independent voltage sources (210, 230). The ion implanter also has a baffle plate (60) at the entrance to a mass analyser (90) downstream of the extraction assembly (50). The baffle plate (60) is also split into two halves (60′ and 60″). By measuring the beam current incident on the two halves (60′, 60″) of the baffle (60), the relative voltages supplied to the left and right electrode parts (54, 55) may be adjusted so as to steer the ion beam and adjust the angle of incidence of the longitudinal axis thereof relative to the input of the analysing magnet (90).

    Abstract translation: 离子注入机具有用于提取离子的离子源(10)和离子束提取组件(50)。 提取组件(50)是四极结构,并且一对提取电极(51)中的一个具有位于离离子源(10)的离子束相对侧的左端口和右端口(54,55)。 左和右电极端口(54,55)彼此电隔离并且连接到独立的电压源(210,230)。 离子注入机还在提取组件(50)下游的质量分析器(90)的入口处具有挡板(60)。 挡板(60)也被分成两半(60'和60“)。 通过测量入射在挡板(60)的两个半部(60',60“)上的光束电流,可以调节供应到左和右电极部分(54,55)的相对电压,以便引导离子 并且相对于分析磁体(90)的输入调节其纵轴的入射角。

    Ion beam apparatus
    3.
    发明授权
    Ion beam apparatus 失效
    离子束装置

    公开(公告)号:US5920076A

    公开(公告)日:1999-07-06

    申请号:US809547

    申请日:1997-06-20

    Abstract: An ion beam apparatus comprises a source of ions (1), an evacuatable chamber (11), first and second electrodes (3, 5) disposed within the chamber for forming an ion beam from ions from the ion source, the first electrode being electrically insulated from the second electrode. At least one insulating member (31, 33), at least part of which is within the chamber provides the insulation, wherein a part of the insulating member is positioned adjacent the wall of the chamber. Alternatively, means for feeding coolant proximate the insulating member is provided to withdraw heat from the insulating member.

    Abstract translation: PCT No.PCT / GB96 / 01715 Sec。 371日期:1997年6月20日 102(e)1997年6月20日PCT PCT 1996年7月19日PCT公布。 出版物WO97 / 04474 日期1997年2月6日离子束装置包括离子源(1),可抽空室(11),设置在室内的第一和第二电极(3,5),用于从离子源的离子形成离子束, 所述第一电极与所述第二电极电绝缘。 至少一个绝缘构件(31,33)至少一部分位于室内,提供绝缘,其中绝缘构件的一部分邻近室的壁定位。 或者,提供用于在绝缘构件附近供给冷却剂的装置,以从绝缘构件中提取热量。

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