APPARATUS
    1.
    发明申请
    APPARATUS 有权
    仪器

    公开(公告)号:US20100219740A1

    公开(公告)日:2010-09-02

    申请号:US12305848

    申请日:2007-06-29

    Abstract: An apparatus (200) for accelerating an ion beam comprising: a) a first electrode (202) having a proximal side and a distal side and having at least one aperture (201) therethrough, the wall of the aperture being shaped such that the radius of the aperture on the distal side of the first electrode is greater than that on the proximal side of the electrode; b) a second electrode (204) located such that it is adjacent to but spaced from the distal side of the first electrode and having at least one aperture therethrough; and c) a third electrode (206) located such that it is adjacent to and spaced from the second electrode and having at least one aperture therethrough, said at least one apertures in each electrode being aligned with corresponding apertures in the other electrodes; wherein the electrodes are arranged such that there is a potential difference between the first and second electrodes and a potential difference between the second and third electrodes.

    Abstract translation: 一种用于加速离子束的装置(200),包括:a)具有近侧和远侧的第一电极(202),并且具有穿过其中的至少一个孔(201),孔的壁成形为使得半径 在第一电极的远侧上的孔径大于电极的近侧上的孔径; b)第二电极(204),其定位成使得其与第一电极的远侧相邻但间隔开并且具有穿过其中的至少一个孔; 以及c)第三电极(206),其定位成使得其与所述第二电极相邻并间隔开并且具有穿过其中的至少一个孔,每个电极中的所述至少一个孔与其它电极中的相应孔对齐; 其中所述电极被布置成使得在所述第一和第二电极之间存在电位差和所述第二和第三电极之间的电位差。

    Apparatus and method for monitoring and tuning an ion beam in ion implantation apparatus
    2.
    发明授权
    Apparatus and method for monitoring and tuning an ion beam in ion implantation apparatus 失效
    用于在离子注入装置中监测和调整离子束的装置和方法

    公开(公告)号:US06897457B1

    公开(公告)日:2005-05-24

    申请号:US09869795

    申请日:1999-12-23

    CPC classification number: H01J37/304 H01J37/1471 H01J37/3171 H01J2237/1501

    Abstract: An ion implanter has an ion source (10) and an ion beam extraction assembly (50) for extracting the ions. The extraction assembly (50) is a tetrode structure and one of the pairs of extraction electrodes (51) has left and right ports (54, 55) located in opposite sides of the ion beam emerging from the ion source (10). The left and right electrode ports (54, 55) are electrically isolated from each other and connected to independent voltage sources (210, 230). The ion implanter also has a baffle plate (60) at the entrance to a mass analyser (90) downstream of the extraction assembly (50). The baffle plate (60) is also split into two halves (60′ and 60″). By measuring the beam current incident on the two halves (60′, 60″) of the baffle (60), the relative voltages supplied to the left and right electrode parts (54, 55) may be adjusted so as to steer the ion beam and adjust the angle of incidence of the longitudinal axis thereof relative to the input of the analysing magnet (90).

    Abstract translation: 离子注入机具有用于提取离子的离子源(10)和离子束提取组件(50)。 提取组件(50)是四极结构,并且一对提取电极(51)中的一个具有位于离离子源(10)的离子束相对侧的左端口和右端口(54,55)。 左和右电极端口(54,55)彼此电隔离并且连接到独立的电压源(210,230)。 离子注入机还在提取组件(50)下游的质量分析器(90)的入口处具有挡板(60)。 挡板(60)也被分成两半(60'和60“)。 通过测量入射在挡板(60)的两个半部(60',60“)上的光束电流,可以调节供应到左和右电极部分(54,55)的相对电压,以便引导离子 并且相对于分析磁体(90)的输入调节其纵轴的入射角。

    Apparatus
    3.
    发明授权
    Apparatus 有权
    仪器

    公开(公告)号:US08471452B2

    公开(公告)日:2013-06-25

    申请号:US12305848

    申请日:2007-06-29

    Abstract: An apparatus (200) for accelerating an ion beam comprising: a) a first electrode (202) having a proximal side and a distal side and having at least one aperture (201) therethrough, the wall of the aperture being shaped such that the radius of the aperture on the distal side of the first electrode is greater than that on the proximal side of the electrode; b) a second electrode (204) located such that it is adjacent to but spaced from the distal side of the first electrode and having at least one aperture therethrough; and c) a third electrode (206) located such that it is adjacent to and spaced from the second electrode and having at least one aperture therethrough, said at least one apertures in each electrode being aligned with corresponding apertures in the other electrodes; wherein the electrodes are arranged such that there is a potential difference between the first and second electrodes and a potential difference between the second and third electrodes.

    Abstract translation: 一种用于加速离子束的装置(200),包括:a)具有近侧和远侧的第一电极(202),并且具有穿过其中的至少一个孔(201),孔的壁成形为使得半径 在第一电极的远侧上的孔径大于电极的近侧上的孔径; b)第二电极(204),其定位成使得其与第一电极的远侧相邻但间隔开并且具有穿过其中的至少一个孔; 以及c)第三电极(206),其定位成使得其与所述第二电极相邻并间隔开并且具有穿过其中的至少一个孔,每个电极中的所述至少一个孔与其它电极中的相应孔对齐; 其中所述电极被布置成使得在所述第一和第二电极之间存在电位差和所述第二和第三电极之间的电位差。

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