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公开(公告)号：US11535532B1
公开(公告)日：2022-12-27
申请号：US16932018
申请日：2020-07-17
Applicant: Dmitry Medvedev
Inventor： Dmitry Medvedev
Abstract: A system for generation of radicals in a liquid (e.g., OH and derivatively H2O2 in water) by a plasma reactor, including a first electrode having a rod shape or a tubular shape; a dielectric tubular housing coaxial with the first electrode and enclosing the first electrode, and having a gap to the first electrode of 0.3-30 mm; a second electrode on an outside of the dielectric tubular housing and coaxial with first electrode with a gap 0.3-30 mm; a high voltage power supply providing voltage oscillations or pulses of 0.5-30 kV and a frequency 1-50 kHz between the first and second electrodes; and a pump or a Venturi injector on an output of the plasma reactor and a chock valve on an input of reactor for generating a low water pressure in the gap between first and second electrodes so as to generate boiling in the gap.
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Patent Agency Ranking
公开(公告)号：US08173075B2
公开(公告)日：2012-05-08
申请号：US12373618
申请日：2007-07-13
Applicant: Alexander F. Gutsol , Alexander Fridman , Kenneth Blank , Sergey Korobtsev , Valery Shiryaevsky , Dmitry Medvedev
Inventor： Alexander F. Gutsol , Alexander Fridman , Kenneth Blank , Sergey Korobtsev , Valery Shiryaevsky , Dmitry Medvedev
IPC: B01J19/08
CPC classification number: H01T19/00 , B01D53/32 , B01D2259/818 , B03C3/41 , B03C3/68 , B03C2201/10 , C02F1/4608 , C02F1/78 , C02F2201/782
Abstract: The invention is a method and system for the generation of high voltage, pulsed, periodic corona discharges capable of being used in the presence of conductive liquid droplets. The method and system can be used, for example, in different devices for cleaning of gaseous or liquid media using pulsed corona discharge. Specially designed electrodes and an inductor increase the efficiency of the system, permit the plasma chemical oxidation of detrimental impurities, and increase the range of stable discharge operations in the presence of droplets of water or other conductive liquids in the discharge chamber.
Abstract translation: 本发明是用于产生能够在存在导电液滴的情况下使用的高电压，脉冲，周期性电晕放电的方法和系统。 该方法和系统可以用于例如使用脉冲电晕放电来清洁气态或液体介质的不同装置中。 特别设计的电极和电感器提高了系统的效率，允许有害杂质的等离子体化学氧化，并且在放电室中存在水滴或其他导电液体的情况下增加稳定的放电操作的范围。
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3.发明申请公开(公告)号：US20220234899A1
公开(公告)日：2022-07-28
申请号：US17596185
申请日：2020-06-05
Applicant: Dmitry MEDVEDEV , Mikhail MARIN , Evgeny GORELIK , Boris MISLAVSKY , Roman ILIEV
Inventor： Dmitry MEDVEDEV , Mikhail MARIN , Evgeny GORELIK , Boris MISLAVSKY , Roman ILIEV
IPC: C01B32/26 , C01B32/184 , B01J19/08
Abstract: A system for manufacturing a nanomaterial may include a first electrode; a second electrode spaced apart from the first electrode by a gap; and a chamber configured to enclose the first electrode, the second electrode, and a liquid. The system may also include a power supply configured to provide electrical energy to at least one of the first electrode and the second electrode; and a pump configured to cause the liquid to flow through the gap between the first electrode and the second electrode.
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公开(公告)号：US20100006419A1
公开(公告)日：2010-01-14
申请号：US12373618
申请日：2007-07-13
Applicant: Alexander F. Gutsol , Alexander Fridman , Kenneth Blank , Sergey Korobtsev , Valery Shiryaevsky , Dmitry Medvedev
Inventor： Alexander F. Gutsol , Alexander Fridman , Kenneth Blank , Sergey Korobtsev , Valery Shiryaevsky , Dmitry Medvedev
CPC classification number: H01T19/00 , B01D53/32 , B01D2259/818 , B03C3/41 , B03C3/68 , B03C2201/10 , C02F1/4608 , C02F1/78 , C02F2201/782
Abstract: The invention is a method and system for the generation of high voltage, pulsed, periodic corona discharges capable of being used in the presence of conductive liquid droplets. The method and system can be used, for example, in different devices for cleaning of gaseous or liquid media using pulsed corona discharge. Specially designed electrodes and an inductor increase the efficiency of the system, permit the plasma chemical oxidation of detrimental impurities, and increase the range of stable discharge operations in the presence of droplets of water or other conductive liquids in the discharge chamber.
Abstract translation: 本发明是一种用于产生能够在存在导电液滴的情况下使用的高电压，脉冲，周期性电晕放电的方法和系统。 该方法和系统可以用于例如使用脉冲电晕放电来清洁气态或液体介质的不同装置中。 特别设计的电极和电感器提高了系统的效率，允许有害杂质的等离子体化学氧化，并且在放电室中存在水滴或其他导电液体的情况下增加稳定的放电操作的范围。
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公开(公告)号：US07378202B2
公开(公告)日：2008-05-27
申请号：US11606769
申请日：2006-11-29
Applicant: Yuri Granik , Dmitry Medvedev
Inventor： Yuri Granik , Dmitry Medvedev
IPC: G03F9/00
Abstract: A grid-based resist simulator predicts how a wafer coated with one or more resist layers will develop when exposed with a mask pattern. Image intensity values are calculated at a grid of points on the wafer, and the image intensity points are analyzed with a resist simulator that produces a resist surface function. A threshold contour of the resist surface function defines how the mask pattern will print on a wafer.
Abstract translation: 基于栅格的抗蚀剂模拟器预测当用掩模图案曝光时，涂覆有一个或多个抗蚀剂层的晶片将如何发展。 在晶片上的点的网格上计算图像强度值，并且用产生抗蚀剂表面功能的抗蚀剂模拟器分析图像强度点。 抗蚀剂表面功能的阈值轮廓定义掩模图案将如何在晶片上印刷。
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公开(公告)号：US20070196747A1
公开(公告)日：2007-08-23
申请号：US11606769
申请日：2006-11-29
Applicant: Yuri Granik , Dmitry Medvedev
Inventor： Yuri Granik , Dmitry Medvedev
Abstract: A grid-based resist simulator predicts how a wafer coated with one or more resist layers will develop when exposed with a mask pattern. Image intensity values are calculated at a grid of points on the wafer, and the image intensity points are analyzed with a resist simulator that produces a resist surface function. A threshold contour of the resist surface function defines how the mask pattern will print on a wafer.
Abstract translation: 基于栅格的抗蚀剂模拟器预测当用掩模图案曝光时，涂覆有一个或多个抗蚀剂层的晶片将如何发展。 在晶片上的点的网格上计算图像强度值，并且用产生抗蚀剂表面功能的抗蚀剂模拟器分析图像强度点。 抗蚀剂表面功能的阈值轮廓定义掩模图案将如何在晶片上印刷。
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