Method for smoothing and polishing surfaces by treating them with energetic radiation
    1.
    发明申请
    Method for smoothing and polishing surfaces by treating them with energetic radiation 失效
    通过用能量辐射处理它们来平滑和抛光表面的方法

    公开(公告)号:US20060081573A1

    公开(公告)日:2006-04-20

    申请号:US10519146

    申请日:2003-06-24

    IPC分类号: B23K26/00

    CPC分类号: C21D1/09 B23K26/3576 B24B1/00

    摘要: The present invention relates to a method for smoothing and polishing surfaces by treating them with energetic radiation, in particular laser radiation, in which the to-be-smoothed surface (1) is remelted in a first treatment step using said energetic radiation (3) and employing first treatment parameters at least once down to a first remelting depth (10) of approx. 5 to 100 μm, which is greater than a structural depth of the to-be-smoothed structures of said to-be-smoothed surface (1), wherein continuous radiation or pulsed radiation (3) with a pulse duration of ≧100 μs is employed. The method makes it possible to automatically polisch any three-dimensional surface fast and cost effective.

    摘要翻译: 本发明涉及一种通过用能量辐射(特别是激光辐射)处理它们来平滑和抛光表面的方法,其中在第一处理步骤中使用所述能量辐射(3)重新熔化待平滑的表面(1) 并且使用至少一次到第一重熔深度(10)的第一处理参数。 其大于所述待平滑化表面(1)的待平滑结构的结构深度,其中脉冲持续时间≥100μs的连续辐射或脉冲辐射(3) 被雇用。 该方法使得可以快速,经济地自动地对三维表面进行绘制。

    Method for smoothing and polishing surfaces by treating them with energetic radiation
    2.
    发明授权
    Method for smoothing and polishing surfaces by treating them with energetic radiation 失效
    通过用能量辐射处理它们来平滑和抛光表面的方法

    公开(公告)号:US07592563B2

    公开(公告)日:2009-09-22

    申请号:US10519146

    申请日:2003-06-24

    IPC分类号: B23K26/00

    CPC分类号: C21D1/09 B23K26/3576 B24B1/00

    摘要: The present invention relates to a method for smoothing and polishing surfaces by treating them with energetic radiation, in particular laser radiation, in which the to-be-smoothed surface is remelted in a first treatment step using said energetic radiation and employing first treatment parameters at least once down to a first remelting depth of approx. 5 to 100 μm, which is greater than a structural depth of the to-be-smoothed structures of said to-be-smoothed surface, wherein continuous radiation or pulsed radiation with a pulse duration of ≧100 μs is employed. The method makes it possible to automatically polish any three-dimensional surface fast and cost effective.

    摘要翻译: 本发明涉及一种通过用能量辐射特别是激光辐射处理它们来平滑和抛光表面的方法,其中在第一处理步骤中使用所述能量辐射重新熔化待平滑的表面,并且采用第一处理参数 最少一次到第一个重熔深度约 其大于所述待平滑表面的待平滑结构的结构深度,其中采用脉冲持续时间>100μs的连续辐射或脉冲辐射。 该方法可以快速,经济地自动抛光三维表面。