公开(公告)号：US07052374B1

公开(公告)日：2006-05-30

申请号：US11069132

申请日：2005-03-01

申请人： Fang-lin Lu ,  Wen-chen Chien ,  Chia-cheng Chang ,  Yung-wang Lo

发明人： Fang-lin Lu ,  Wen-chen Chien ,  Chia-cheng Chang ,  Yung-wang Lo

IPC分类号： B24B1/00

CPC分类号： B24B37/04 ,  B24B57/02

摘要： An adjustable slurry dispensing device for use with a chemical mechanical polishing apparatus is disclosed. The slurry arm is pivotally connected to the polishing apparatus and has a slurry delivery assembly that is translatable along the length of the arm. This combination of adjustments allows the user to deposit polishing slurry at a desired location on the polishing pad of the polishing apparatus. The dispensing device may be motorized, in which case the slurry arm may be automatically pivotable and the slurry delivery assembly may be automatically translatable along the slurry arm. The motors may be controlled by a computer, or they may be manually adjusted by the user. A method of using the apparatus is also disclosed.

摘要翻译： 公开了一种用于化学机械抛光装置的可调浆料分配装置。 浆料臂枢转地连接到抛光装置，并且具有可沿着臂的长度平移的浆料输送组件。 这种调整组合允许使用者将抛光浆料沉积在抛光装置的抛光垫上的期望位置处。 分配装置可以是电动的，在这种情况下，浆料臂可以自动地枢转，并且浆料输送组件可以沿浆料臂自动平移。 电机可以由计算机控制，也可以由用户手动调节。 还公开了使用该装置的方法。

公开(公告)号：US06272902B1

公开(公告)日：2001-08-14

申请号：US09283054

申请日：1999-01-04

申请人： Wen-Ten Chen ,  Chung-Yang Lin ,  Fang-Lin Lu ,  Kau-Po Yeh

发明人： Wen-Ten Chen ,  Chung-Yang Lin ,  Fang-Lin Lu ,  Kau-Po Yeh

IPC分类号： G01N302

CPC分类号： G01M99/005 ,  B24B37/04 ,  B24B41/061

摘要： A method for off-line testing a polishing head used in a CMP polishing apparatus is disclosed. The method utilizes at least two sets of pressurizing/vacuuming/venting devices for the independent testing of at least two fluid chambers which may include a membrane chamber, a retaining ring chamber and an innertube chamber normally found in a CMP polishing head. The present invention further discloses an off-line testing apparatus for a chemical mechanical polishing head which includes at least two independent sets of pressurizing/vacuuming/venting devices for testing a CMP head that is equipped with at least two fluid chambers such as a membrane chamber, a retaining ring chamber and an innertube chamber. The method and apparatus can be used advantageously for testing a variety of defects in a CMP polishing head prior to the installation of the head into a CMP apparatus. The defects include leakage between the fluid chambers, loss of vacuum seal in the fluid chambers, and binding between the fluid chambers. A pressurizing source utilized may be a general nitrogen gas in a fabrication plant. The vacuum source may be factory vacuum.

摘要翻译： 公开了一种用于在CMP抛光装置中使用的抛光头的离线测试方法。 该方法使用至少两组加压/抽真空/排气装置，用于对至少两个流体室进行独立测试，所述至少两个流体室可以包括通常存在于CMP抛光头中的隔膜室，保持环室和内管室。 本发明还公开了一种用于化学机械抛光头的离线测试装置，其包括至少两组独立的加压/抽真空/排气装置，用于测试装配有至少两个流体室的CMP头，例如膜室 ，保持环室和内管室。 该方法和装置可以有利地用于在将头部安装到CMP设备中之前测试CMP抛光头中的各种缺陷。 这些缺陷包括流体室之间的泄漏，流体室中的真空密封损失以及流体室之间的结合。 所用的加压源可以是制造设备中的一般氮气。 真空源可以是工厂真空。

公开(公告)号：US6068544A

公开(公告)日：2000-05-30

申请号：US323343

申请日：1999-06-01

申请人： Chen-Chia Chiu ,  Fang-Lin Lu ,  Kuo-Pao Yeh ,  Yu-Sheng Shen

发明人： Chen-Chia Chiu ,  Fang-Lin Lu ,  Kuo-Pao Yeh ,  Yu-Sheng Shen

IPC分类号： B24B37/34 ,  B24B41/047 ,  B24B7/00

CPC分类号： B24B37/345 ,  B24B41/047

摘要： An apparatus for calibrating the centering of polishing heads in a polishing machine that is equipped with a plurality of spindles onto which polishing heads are mounted and a method for using such apparatus are disclosed. In the apparatus, a calibration disc is provided which has a hollow shaft mounted at a center of the bottom surface of the disc. A centering pin slidingly engaging an elongated cavity in the hollow shaft such that its protruded tip portion may be adjusted by using a locking device such as a set screw for different calibration procedures. The present invention novel apparatus can be used to calibrate the positioning of a polishing head mounted in a spindle with a pedestal in a load cup that is equipped with a center alignment aperture. The calibration can be conducted not only in the X, Y direction (or in the circumferential direction) of the spindle movement, but also in the Z direction (or a sweep direction) of the traversing spindle that occurs during a polishing operation.

摘要翻译： 公开了一种用于校准抛光机中心的装置，该抛光机配备有多个主轴，抛光头安装在抛光机上，以及使用该装置的方法。 在该装置中，提供了一个校准盘，其具有安装在盘的底表面的中心处的中空轴。 定心销可滑动地接合空心轴中的细长空腔，使得其突出的末端部分可以通过使用诸如用于不同校准程序的固定螺钉的锁定装置来调节。 本发明新颖的装置可用于校准安装在具有基座的主轴中的抛光头在装配有中心对准孔的装载杯中的定位。 校准不仅可以在主轴移动的X，Y方向（或圆周方向）上进行，而且可以在抛光操作期间发生的横动主轴的Z方向（或扫掠方向）进行。