公开(公告)号：US06394886B1

公开(公告)日：2002-05-28

申请号：US09975539

申请日：2001-10-10

申请人： Wen-Ten Chen ,  Yao-Hsiang Liang ,  Chih-I Peng ,  Yu-Chia Chang

发明人： Wen-Ten Chen ,  Yao-Hsiang Liang ,  Chih-I Peng ,  Yu-Chia Chang

IPC分类号： B24B4702

CPC分类号： B24B53/017 ,  B24B53/12

摘要： A conformal disk holder for holding a rotating disk against a surface of a polishing pad is described. The conformal disk holder can be used for any polishing apparatus, but is particularly suited for use in a CMP pad conditioning disk. The conformal disk holder is constructed by a cover member, a flexural plate member and a base member. The flexural plate member has a center protrusion with a downwardly facing convex surface for intimately engaging an upwardly facing concave surface on a center protrusion of the base member. The intimate engagement between the convex surface and the concave surface allows at least a 5° tilt of the base member from a horizontal plane, and preferably allows a tilt between about 5° and about 30°.

摘要翻译： 描述了用于将旋转盘保持抵靠抛光垫的表面的保形盘保持器。 共形盘保持器可用于任何抛光装置，但特别适用于CMP垫调节盘。 共形盘保持器由盖构件，弯曲板构件和基座构件构成。 弯曲板构件具有中心突起，其具有向下的凸起表面，用于紧密接合基座构件的中心突出部上的面向上的凹面。 凸表面和凹面之间的紧密接合允许基部构件从水平面至少5°倾斜，并且优选地允许约5°至约30°之间的倾斜。

公开(公告)号：US06272902B1

公开(公告)日：2001-08-14

申请号：US09283054

申请日：1999-01-04

申请人： Wen-Ten Chen ,  Chung-Yang Lin ,  Fang-Lin Lu ,  Kau-Po Yeh

发明人： Wen-Ten Chen ,  Chung-Yang Lin ,  Fang-Lin Lu ,  Kau-Po Yeh

IPC分类号： G01N302

CPC分类号： G01M99/005 ,  B24B37/04 ,  B24B41/061

摘要： A method for off-line testing a polishing head used in a CMP polishing apparatus is disclosed. The method utilizes at least two sets of pressurizing/vacuuming/venting devices for the independent testing of at least two fluid chambers which may include a membrane chamber, a retaining ring chamber and an innertube chamber normally found in a CMP polishing head. The present invention further discloses an off-line testing apparatus for a chemical mechanical polishing head which includes at least two independent sets of pressurizing/vacuuming/venting devices for testing a CMP head that is equipped with at least two fluid chambers such as a membrane chamber, a retaining ring chamber and an innertube chamber. The method and apparatus can be used advantageously for testing a variety of defects in a CMP polishing head prior to the installation of the head into a CMP apparatus. The defects include leakage between the fluid chambers, loss of vacuum seal in the fluid chambers, and binding between the fluid chambers. A pressurizing source utilized may be a general nitrogen gas in a fabrication plant. The vacuum source may be factory vacuum.

摘要翻译： 公开了一种用于在CMP抛光装置中使用的抛光头的离线测试方法。 该方法使用至少两组加压/抽真空/排气装置，用于对至少两个流体室进行独立测试，所述至少两个流体室可以包括通常存在于CMP抛光头中的隔膜室，保持环室和内管室。 本发明还公开了一种用于化学机械抛光头的离线测试装置，其包括至少两组独立的加压/抽真空/排气装置，用于测试装配有至少两个流体室的CMP头，例如膜室 ，保持环室和内管室。 该方法和装置可以有利地用于在将头部安装到CMP设备中之前测试CMP抛光头中的各种缺陷。 这些缺陷包括流体室之间的泄漏，流体室中的真空密封损失以及流体室之间的结合。 所用的加压源可以是制造设备中的一般氮气。 真空源可以是工厂真空。

公开(公告)号：US5925849A

公开(公告)日：1999-07-20

申请号：US986182

申请日：1997-12-05

申请人： Wen-Ten Chen

发明人： Wen-Ten Chen

IPC分类号： H02G3/12 ,  H02G3/14 ,  H02G3/18 ,  H02G3/04

CPC分类号： H02G3/185 ,  H02G3/12 ,  H02G3/14

摘要： The present invention provides a floor mounted utility box that utilizes a cover member which can be easily installed by dropping in without any fastening means when in an installed position, the cover member is substantially flush with the floor level such that no tripping hazard is created by the cover. The cover is supported by at least two spaced apart supporting legs to provide a stabilizing effect for the cover.

摘要翻译： 本发明提供了一种地板安装式实用箱，其利用盖构件，该盖构件在安装位置时可以通过在没有紧固装置的情况下落入而容易地安装，盖构件基本上与地板水平齐平，使得不会通过 封面。 该盖由至少两个间隔开的支撑腿支撑，以为盖提供稳定效果。

公开(公告)号：US06672950B2

公开(公告)日：2004-01-06

申请号：US10062965

申请日：2002-01-30

申请人： Chih-I Peng ,  Wen-Ten Chen ,  Yu-Chia Chang ,  Yao-Hsiang Liang

发明人： Chih-I Peng ,  Wen-Ten Chen ,  Yu-Chia Chang ,  Yao-Hsiang Liang

IPC分类号： B24B5504

CPC分类号： B24B37/34 ,  B24B53/017 ,  B24B55/12

摘要： The present invention discloses a contamination prevention system and method of use having a contamination prevention shield that cooperates with a high pressure rinse apparatus to prevent contamination of particles within a CMP apparatus. The contamination prevention shield has a cleaning cup, two vertical side shields, a front vertical shield, and a floor that cooperate to prevent leakage of fluid splattered during a high pressure rinse of the CMP apparatus and an interior portion of a CMP apparatus housing; and a high pressure rinse apparatus connected to the contamination prevention shield having a conduit with at least one nozzle for dispensing cleaning fluid during a high pressure rinse cycle. Additionally, a plurality of contamination prevention shields may be used in combination with the high pressure rinse apparatus to further prevent contamination of an interior portion of the housing and the CMP apparatus.

摘要翻译： 本发明公开了一种防污染系统和使用方法，其具有与高压冲洗装置配合的防污染屏蔽物，以防止CMP装置内的颗粒污染。 防污染屏蔽件具有清洁杯，两个垂直侧屏蔽，前垂直屏蔽和底板，其配合以防止在CMP设备的高压冲洗期间溅射的流体的泄漏和CMP设备壳体的内部; 以及连接到防污染屏蔽件的高压冲洗装置，其具有在高压漂洗循环期间具有用于分配清洁流体的至少一个喷嘴的导管。 另外，多个防污屏蔽可以与高压冲洗装置组合使用，以进一步防止外壳和CMP装置的内部部分的污染。