公开(公告)号：US5580384A

公开(公告)日：1996-12-03

申请号：US416464

申请日：1995-04-03

申请人： Francis Thiebaud ,  Heinrich Zimmermann

发明人： Francis Thiebaud ,  Heinrich Zimmermann

IPC分类号： C23C16/458 ,  C23C16/509 ,  H01L21/00 ,  C23C16/00

CPC分类号： H01L21/67017 ,  C23C16/458 ,  C23C16/5096

摘要： A PECVD coating apparatus includes a vacuum coating chamber for performing a PECVD process. At least one pair of spaced apart electrodes is positioned within the chamber and powered by an electric power supply generator to produce a plasma discharge generating voltage between the electrodes. Gas is fed between the electrodes in the chamber for producing a plasma discharge reaction that, in turn, forms a coating reaction product. A holding member is placed in the chamber for positioning one or more workpieces with their opposite surfaces at equally spaced positions from each of the electrodes of the pair of electrodes. The workpieces are electrically isolated from the chamber through the holding member so that a free floating electrical potential is maintained on the workpieces. As a result, the opposite surfaces of the workpieces are substantially identically coated in the chamber using the PECVD process.

摘要翻译： PECVD涂布装置包括用于执行PECVD处理的真空涂布室。 至少一对间隔开的电极位于室内并由电源发生器供电，以在电极之间产生等离子体放电产生电压。 气体被供给在室中的电极之间，用于产生等离子体放电反应，从而形成涂层反应产物。 保持构件放置在腔室中，用于将一个或多个具有其相对表面的工件定位在与该对电极的每个电极相等的位置处。 工件通过保持构件与腔室电隔离，使得在工件上保持自由浮动电位。 结果，使用PECVD工艺，工件的相对表面基本上相同地涂覆在腔室中。

公开(公告)号：US5325812A

公开(公告)日：1994-07-05

申请号：US988728

申请日：1992-12-10

申请人： Francis Thiebaud ,  Friedrich Stingl

发明人： Francis Thiebaud ,  Friedrich Stingl

IPC分类号： C23C14/50 ,  G02B7/02 ,  B05C13/00

CPC分类号： G02B7/026 ,  C23C14/505

摘要： In order to dispose substrates, such as lenses, having different sizes in a working installation, a holding arrangement comprises a spring clasp (3) provided for the clamping holding of the substrates or lenses, which spring clasp is suitable for disposition in a holding device (9) of the arrangement.

摘要翻译： 为了在工作设备中设置具有不同尺寸的基底（例如透镜），保持装置包括设置用于夹持基板或透镜的弹簧夹（3），该弹簧扣适于配置在保持装置 （9）。

公开(公告)号：US5227202A

公开(公告)日：1993-07-13

申请号：US921442

申请日：1992-07-27

申请人： Francis Thiebaud ,  Heinrich Zimmermann

发明人： Francis Thiebaud ,  Heinrich Zimmermann

IPC分类号： C23C16/458 ,  C23C16/509 ,  H01L21/00

CPC分类号： H01L21/67017 ,  C23C16/458 ,  C23C16/5096

摘要： In a plasma-enhanced chemical vapor deposition method, in order to achieve greater space for positioning workpieces to be coated simultaneously and essentially identically on all sides, the workpiece are positioned at a distance from one electrode on the basis of a coating rate gradient.

摘要翻译： 在等离子体增强化学气相沉积方法中，为了获得更大的空间，用于定位同时且基本相同地在所有侧面上的工件，基于涂层速率梯度将工件定位在距离一个电极一定距离处。