公开(公告)号：US06629881B1

公开(公告)日：2003-10-07

申请号：US09505902

申请日：2000-02-17

申请人： Fred C. Redeker ,  Rajeev Bajaj ,  Frank A. Bose ,  A. Jason Whitby

发明人： Fred C. Redeker ,  Rajeev Bajaj ,  Frank A. Bose ,  A. Jason Whitby

IPC分类号： B24B5700

CPC分类号： B24B37/04 ,  B24B57/02

摘要： A fluid delivery apparatus and method for use in a chemical mechanical polishing system is provided. The delivery rate of a fluid onto a pad is controlled to reduce the consumption of the fluid. In general, the fluid flow may be varied between a relatively lower flow rate and a relatively higher flow rate or, alternatively, the flow may be periodically terminated. Fluid flow may be controlled by any combination of pumps, controllers, valves, or other regulator/fluid flow control member.

摘要翻译： 提供一种用于化学机械抛光系统的流体输送装置和方法。 控制流体到垫上的输送速率以减少流体的消耗。 通常，流体流动可以在相对较低的流速和相对较高的流速之间变化，或者可以周期性地终止流动。 流体流动可以由泵，控制器，阀门或其他调节器/流体流量控制构件的任何组合来控制。

公开(公告)号：US5556549A

公开(公告)日：1996-09-17

申请号：US236444

申请日：1994-05-02

申请人： Roger Patrick ,  Frank A. Bose

发明人： Roger Patrick ,  Frank A. Bose

IPC分类号： H01J37/32 ,  H05H1/46 ,  H05H1/00

CPC分类号： H01J37/32091 ,  H01J37/32082 ,  H01J37/321 ,  H01J37/32174 ,  H01J37/32935 ,  H01J37/32963 ,  H01J37/3299 ,  H05H1/46 ,  H01J2237/332 ,  H01J2237/334

摘要： The present invention relates to a system and method for control and delivery of radio frequency power in plasma process systems. The present invention monitors the power, voltage, current, phase, impedance, harmonic content and direct current bias of the radio frequency energy being delivered to the plasma chamber. In addition, the plasma mode of operation may be controlled by creating either a capacitively or inductively biased radio frequency source impedance. A radio frequency circulator prevents reflected power from the plasma chamber electrode to damage the power source and it further dissipates the reflected power in a termination resistor. The termination resistor connected to the circulator also effectively terminates harmonic energy caused by the plasma non-linearities. Multiple plasma chamber electrodes and radio frequency power sources may be similarly controlled.

摘要翻译： 本发明涉及用于等离子体处理系统中射频功率的控制和传送的系统和方法。 本发明监测输送到等离子体室的射频能量的功率，电压，电流，相位，阻抗，谐波含量和直流偏置。 此外，等离子体操作模式可以通过产生电容或电感偏置的射频源阻抗来控制。 射频循环器防止来自等离子体室电极的反射功率损坏电源，并进一步消除终端电阻器中的反射功率。 连接到循环器的终端电阻器也有效地终止由等离子体非线性引起的谐波能量。 可以类似地控制多个等离子体室电极和射频电源。

公开(公告)号：US5474648A

公开(公告)日：1995-12-12

申请号：US283296

申请日：1994-07-29

申请人： Roger Patrick ,  Frank A. Bose ,  Philippe Schoenborn

发明人： Roger Patrick ,  Frank A. Bose ,  Philippe Schoenborn

IPC分类号： H01J37/32 ,  H01L21/306 ,  B44C1/22

CPC分类号： H01J37/32082 ,  H01J37/32174 ,  H01J37/32183 ,  H01J37/32935 ,  H01J37/32963 ,  H01J37/3299 ,  H01J2237/332 ,  H01J2237/334

摘要： Dynamic control and delivery of radio frequency power in plasma process systems is utilized to enhance the repeatability and uniformity of the process plasma. Power, voltage, current, phase, impedance, harmonic content and direct current bias of the radio frequency energy being delivered to the plasma chamber may be monitored at the plasma chamber and used to control or characterize the plasma load. Dynamic pro-active control of the characteristics of the radio frequency power to the plasma chamber electrode during the formation of the plasma enhances the uniformity of the plasma for more exact and controllable processing of the work pieces.

摘要翻译： 利用等离子体处理系统中的射频功率的动态控制和传递来提高过程等离子体的重复性和均匀性。 输送到等离子体室的射频能量的功率，电压，电流，相位，阻抗，谐波含量和直流偏压可以在等离子体室处监测并用于控制或表征等离子体负载。 在形成等离子体期间对等离子体室电极的射频功率的特性的动态主动控制增强了等离子体的均匀性，从而更精确和可控地处理工件。