公开(公告)号：US06953644B2

公开(公告)日：2005-10-11

申请号：US10408806

申请日：2003-04-07

申请人： Christian Ebi ,  Frank Erber ,  Torsten Franke ,  Fritz Gans ,  Tarek Lutz ,  Günther Ruhl ,  Bernd Schönherr

发明人： Christian Ebi ,  Frank Erber ,  Torsten Franke ,  Fritz Gans ,  Tarek Lutz ,  Günther Ruhl ,  Bernd Schönherr

IPC分类号： G03F1/00 ,  G03F1/14 ,  G03F7/20 ,  G03F9/00 ,  H01J37/30 ,  H01J37/302 ,  H01J37/317

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3175 ,  H01J2237/31769 ,  H01J2237/31796 ,  Y10S430/143

摘要： A method for compensating for scatter/reflection effects in particle beam lithography includes the following steps: providing at least one layer of a material that is sensitive to particle beams, using at least one particle beam to write predetermined patterns in a limited area of the material that is sensitive to particle beams, and using at least one particle beam to write at least one frame, which surrounds the limited area, into the material that is sensitive to particle beams so that variations in the background dose within the limited area are less than 30% of the maximum background dose within the limited area. This provides the advantage that a considerably more homogeneous background dose and hence considerably less variation in the CD measure, can be produced within the area that is written to by the particle beam, in a simple and cost-effective manner.

摘要翻译： 用于补偿粒子束光刻中的散射/反射效应的方法包括以下步骤：使用至少一个粒子束来提供至少一层对粒子束敏感的材料，以在材料的有限区域中写入预定图案 对粒子束敏感，并且使用至少一个粒子束将围绕有限区域的至少一个框架写入对粒子束敏感的材料，使得在有限区域内的背景剂量的变化小于 有限区域内最大背景剂量的30％。 这提供了以简单和成本有效的方式在由粒子束写入的区域内产生显着更均匀的背景剂量并因此在CD测量中显着较小变化的优点。