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公开(公告)号:US5230970A
公开(公告)日:1993-07-27
申请号:US890047
申请日:1992-05-28
CPC分类号: G03F1/72 , H05K3/225 , Y10S430/146 , Y10S430/148 , Y10S430/165
摘要: A process of radiation-induced formation of a uniform metal or metal oxide region suitable for device application or for repairing transparent defects in pattern metal films of lithographic masks has been found. The process requires that the heat evolved during the radiation-induced reactions be carefully limited to produce the desired uniformity.
摘要翻译: 已经发现了辐射诱导形成均匀金属或金属氧化物区域的过程,其适用于设备应用或修复光刻掩模的图案金属膜中的透明缺陷。 该过程要求在辐射诱导的反应期间放出的热量被小心地限制以产生所需的均匀性。
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公开(公告)号:US5155620A
公开(公告)日:1992-10-13
申请号:US717566
申请日:1991-06-19
申请人: Heidi M. Gordon , William R Holland , Hung C. Ling , Gary L. Wolk
发明人: Heidi M. Gordon , William R Holland , Hung C. Ling , Gary L. Wolk
IPC分类号: G02F1/065
CPC分类号: G02F1/065
摘要: An optical waveguide circuit including a nonlinear optical device comprises a metal ground plane (21), a polymer core layer (25) in which optical waves are propagated, and polymer clad layers (22 and 26) on opposite sides of the core layer. The waveguide paths are defined by troughs (23) in one of the clad layers. The nonlinear device is made by electrooptically poling part of the core layer which contains a nonlinear moiety. The clad layers (26 and 22) have a significantly higher conductivity than that of the core layer (25) which improves the efficiency of the electrooptic poling.
摘要翻译: 包括非线性光学装置的光波导电路包括金属接地平面(21),传播光波的聚合物芯层(25)和芯层相对侧上的聚合物覆层(22和26)。 波导路径由包层中的一个中的槽(23)限定。 非线性器件通过电光学极化包含非线性部分的核心层的一部分而制成。 包覆层(26和22)具有比芯层(25)显着更高的导电性,这提高了电光极化的效率。
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公开(公告)号:US4636403A
公开(公告)日:1987-01-13
申请号:US728551
申请日:1985-04-29
IPC分类号: C03C17/06 , C23C4/18 , C23C14/28 , C23C16/04 , C23C16/56 , G03F1/72 , H05K3/10 , H05K3/22 , B05D3/06 , B32B35/00
CPC分类号: G03F1/72 , C03C17/06 , C23C14/28 , C23C16/047 , C23C16/56 , C23C4/18 , C03C2217/255 , C03C2218/112 , C03C2218/114 , C03C2218/119 , C03C2218/32 , C03C2218/34 , H05K3/105 , H05K3/225 , Y10S148/14 , Y10S430/146
摘要: A process of laser-induced metal deposition for repairing transparent defects (18) in patterned metal films (14) of photomasks (10). The process comprises the steps of (a) coating the surface (16) of the substrate (12) having the film (14) thereon with a layer of metal-organic compound (50); (b) exposing the portions of the layer of metal-organic compound (50) overlying the defects (18) to a beam (24) of electromagnetic radiation from a laser (22); (c) ramping the power level of the radiation beam (24) delivered by the laser (22) until a metal patch (52) is reflective and adherent is formed; and (d) removing the unexposed portions of metal-organic compound (50) remaining on the substrate surface (16).
摘要翻译: 一种用于修复光掩模(10)的图案化金属膜(14)中的透明缺陷(18)的激光诱导金属沉积过程。 该方法包括以下步骤:(a)在其上涂覆具有薄膜(14)的基底(12)的表面(16),其上有一层金属 - 有机化合物(50); (b)将覆盖缺陷(18)的金属 - 有机化合物(50)层的部分暴露于来自激光器(22)的电磁辐射束(24); (c)使由激光器(22)传送的辐射束(24)的功率电平斜升直到金属贴片(52)形成反射和粘附; 和(d)除去留在基材表面(16)上的金属有机化合物(50)的未曝光部分。
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