摘要:
A method for forming high purity silica articles. The high purity silica articles can be particularly suitable for forming packaging such as packaging for pharmaceutical applications. The method for forming high purity silica articles can comprise, in one embodiment, (a) forming a fused quartz melt from a SiO2 raw material; (b) forming a quartz tube from the fused quartz melt; (c) treating the quartz tube with an acid composition; (d) heat treating the quartz tube subsequent to treating with the acid composition; and (e) optionally treating the quartz article with an acid composition subsequent to the heat treating operation. The method can enhance the purity of silica glass articles and products made therefrom.
摘要:
A high silica glass composition comprising about 92 to about 99.9999 wt. % SiO2 and from about 0.0001 to about 8 wt. % of at least one dopant selected from Al2O3, CeO2, TiO2, La2O3, Y2O3, Nd2O3, other rare earth oxides, and mixtures of two or more thereof. The glass composition has a working point temperature ranging from 600 to 2,000° C. These compositions exhibit stability similar to pure fused quartz, but have a moderate working temperature to enable cost effective fabrication of pharmaceutical packages. The glass is particularly useful as a packaging material for pharmaceutical applications, such as, for example pre-filled syringes, ampoules and vials.
摘要翻译:高二氧化硅玻璃组合物包含约92-约99.9999wt。 %SiO 2和约0.0001-约8wt。 选自Al 2 O 3,CeO 2,TiO 2,La 2 O 3,Y 2 O 3,Nd 2 O 3,其它稀土氧化物中的至少一种掺杂剂的%,以及其两种或更多种的混合物。 玻璃组合物的工作点温度范围为600至2000℃。这些组合物表现出与纯熔融石英相似的稳定性,但具有适度的工作温度以使药物包装成本有效地制造。 该玻璃特别可用作药物应用的包装材料,例如预填充注射器,安瓿和小瓶。
摘要:
A high silica glass composition comprising about 92 to about 99.9999 wt. % SiO2 and from about 0.0001 to about 8 wt. % of at least one dopant selected from Al2O3, CeO2, TiO2, La2O3, Y2O3, Nd2O3, other rare earth oxides, and mixtures of two or more thereof. The glass composition has a working point temperature ranging from 600 to 2,000° C. These compositions exhibit stability similar to pure fused quartz, but have a moderate working temperature to enable cost effective fabrication of pharmaceutical packages. The glass is particularly useful as a packaging material for pharmaceutical applications, such as, for example pre-filled syringes, ampoules and vials.
摘要翻译:高二氧化硅玻璃组合物包含约92-约99.9999wt。 %SiO 2和约0.0001-约8wt。 选自Al 2 O 3,CeO 2,TiO 2,La 2 O 3,Y 2 O 3,Nd 2 O 3,其它稀土氧化物中的至少一种掺杂剂的%,以及其两种或更多种的混合物。 玻璃组合物的工作点温度范围为600至2000℃。这些组合物表现出与纯熔融石英相似的稳定性,但具有适度的工作温度以使药物包装成本有效地制造。 该玻璃特别可用作药物应用的包装材料,例如预填充注射器,安瓿和小瓶。
摘要:
Disclosed is a method of heat treating quartz glass deposition tubes at between 900° C. and 1200° C. for at least 115 hours. The resulting deposition tubes are useful in forming optical preforms that can yield optical fibers having reduced added loss.
摘要:
Disclosed is a method of heat treating quartz glass deposition tubes at between 900° C. and 1200° C. for at least 115 hours. The resulting deposition tubes are useful in forming optical preforms that can yield optical fibers having reduced added loss.
摘要:
A method for forming high purity silica articles. The high purity silica articles can be particularly suitable for forming packaging such as packaging for pharmaceutical applications. The method for forming high purity silica articles can comprise, in one embodiment, (a) forming a fused quartz melt from a SiO2 raw material; (b) forming a quartz tube from the fused quartz melt; (c) treating the quartz tube with an acid composition; (d) heat treating the quartz tube subsequent to treating with the acid composition; and (e) optionally treating the quartz article with an acid composition subsequent to the heat treating operation. The method can enhance the purity of silica glass articles and products made therefrom.
摘要:
Disclosed is a method of heat treating quartz glass deposition tubes at between 900° C. and 1200° C. for at least 115 hours. The resulting deposition tubes are useful in forming optical preforms that can yield optical fibers having reduced added loss.
摘要:
Disclosed is a method of heat treating quartz glass deposition tubes at between 900° C. and 1200° C. for at least 115 hours. The resulting deposition tubes are useful in forming optical preforms that can yield optical fibers having reduced added loss.