Method of Calibrating Target Values and Processing Systems Configured to Calibrate the Target Values
    2.
    发明申请
    Method of Calibrating Target Values and Processing Systems Configured to Calibrate the Target Values 有权
    校准目标值的方法和配置的校准目标值的处理系统

    公开(公告)号:US20140229134A1

    公开(公告)日:2014-08-14

    申请号:US14067474

    申请日:2013-10-30

    Abstract: A processing method includes processing a wafer based on initial data, measuring errors for each of the plurality of areas, calculating an error similarity of at least some of the plurality of areas as a function of a separation distance between each pair of some of the areas, selecting a first area and a plurality of second areas adjacent to the first area, calculating weight values for the second areas based on the error similarities between each pair of second areas and the error similarities between the first area and each second area, calculating an estimated error of the first area based on the measured errors of the second areas and the weight values for the second areas, and generating estimated data based on the estimated errors for each of the plurality of areas.

    Abstract translation: 一种处理方法包括:基于初始数据处理晶片,测量多个区域中的每个区域的误差,计算多个区域中的至少一些区域的误差相似度,作为每对区域之间的间隔距离的函数 ,选择与所述第一区域相邻的第一区域和多个第二区域,基于每对第二区域之间的误差相似度和所述第一区域与每个第二区域之间的误差相似度来计算所述第二区域的权重值, 基于第二区域的测量误差和第二区域的权重值对第一区域的估计误差,以及基于多个区域中的每一个的估计误差生成估计数据。

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