公开(公告)号：US20050126491A1

公开(公告)日：2005-06-16

申请号：US11041929

申请日：2005-01-26

申请人： Hani Elsayed-Ali ,  Edwin Waldbusser

发明人： Hani Elsayed-Ali ,  Edwin Waldbusser

IPC分类号： C23C16/40 ,  C23C16/44 ,  C23C16/00

CPC分类号： C23C16/4402 ,  C23C16/402

摘要： The present invention reduces corrosion rates on metal surfaces, such as the interior surfaces of gas flow control components by depositing a chemically inert layer on the metal surface of the component and other associated parts of the component that are exposed to corrosive gases. The disclosed method provides for depositing a relatively chemically inert thin film such as silicon dioxide along the gas exposed surface areas of the metal surface thereby enhancing corrosion protection to the metal surfaces. The present invention can be used to deposit a chemically inert thin film at locations inside components that are outside a direct line of sight and at locations normally unreachable by a gas flowing through the components. The present invention does not require a vacuum system for the deposition of the corrosion-resistant thin film.

摘要翻译： 本发明通过在组件的金属表面和暴露于腐蚀性气体的组分的其它相关部分上沉积化学惰性层来降低金属表面（例如气体流量控制部件的内表面）的腐蚀速率。 所公开的方法提供了沿着金属表面的气体暴露表面区域沉积相对化学惰性的薄膜，例如二氧化硅，从而增强了对金属表面的腐蚀保护。 本发明可用于将化学惰性薄膜沉积在直接视线外部的部件内部以及通常流过组件的气体不能达到的位置。 本发明不需要用于沉积耐腐蚀薄膜的真空系统。

公开(公告)号：US20050126485A1

公开(公告)日：2005-06-16

申请号：US11041930

申请日：2005-01-26

申请人： Hani Elsayed-Ali ,  Edwin Waldbusser

发明人： Hani Elsayed-Ali ,  Edwin Waldbusser

IPC分类号： C23C16/40 ,  C23C16/44 ,  B32B9/04 ,  B32B13/04 ,  C23C16/00

CPC分类号： C23C16/4402 ,  C23C16/402

摘要： The present invention reduces corrosion rates on metal surfaces, such as the interior surfaces of gas flow control components by depositing a chemically inert layer on the metal surface of the component and other associated parts of the component that are exposed to corrosive gases. The disclosed method provides for depositing a relatively chemically inert thin film such as silicon dioxide along the gas exposed surface areas of the metal surface thereby enhancing corrosion protection to the metal surfaces. The present invention can be used to deposit a chemically inert thin film at locations inside components that are outside a direct line of sight and at locations normally unreachable by a gas flowing through the components. The present invention does not require a vacuum system for the deposition of the corrosion-resistant thin film.

摘要翻译： 本发明通过在组件的金属表面和暴露于腐蚀性气体的组分的其它相关部分上沉积化学惰性层来降低金属表面（例如气体流量控制部件的内表面）的腐蚀速率。 所公开的方法提供了沿着金属表面的气体暴露表面区域沉积相对化学惰性的薄膜，例如二氧化硅，从而增强了对金属表面的腐蚀保护。 本发明可用于将化学惰性薄膜沉积在直接视线外部的部件内部以及通常流过组件的气体不能达到的位置。 本发明不需要用于沉积耐腐蚀薄膜的真空系统。