公开(公告)号：US5969441A

公开(公告)日：1999-10-19

申请号：US948471

申请日：1997-10-10

申请人： Erik R. Loopstra ,  Gerrit M. Bonnema ,  Harmen K. Van Der Schoot ,  Gerjan P. Veldhuis ,  Paulus M. H. Ter Beek

发明人： Erik R. Loopstra ,  Gerrit M. Bonnema ,  Harmen K. Van Der Schoot ,  Gerjan P. Veldhuis ,  Paulus M. H. Ter Beek

IPC分类号： B23Q1/66 ,  B23Q1/62 ,  B23Q11/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/68 ,  H02K41/00

CPC分类号： G03F7/70733 ,  B23Q1/621 ,  B23Q1/623 ,  B23Q11/0032 ,  G03F7/70716 ,  G03F7/70741 ,  G03F7/7075 ,  G03F7/70766 ,  G03F7/709 ,  H01L21/682 ,  Y10T74/20213

摘要： Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device.A positioning device (3, 97, 179) with a first displacement unit (25, 189) for displacing a first object holder (11, 181) and a second displacement unit (27, 191) for displacing a second object holder (13, 183). The object holders can be displaced by the positioning device alternately from a measuring position into an operational position and can be displaced by the respective displacement units independently of one another in the measuring position and in the operational position.The displacement units are provided with force actuators which each have a first part (47, 49; 117, 119; 215, 217) which is coupled to the relevant object holder and which is displaceable under the influence of a driving force relative to a second part (59, 61; 133, 135, 137, 139; 219, 221) which is fastened to a balancing unit (69, 149, 205) which is common to the two displacement units. The balancing unit is displaceably guided relative to a base (81, 209), so that reaction forces of the displacement units are converted into displacements of the balancing unit relative to the base, and mechanical vibrations in the balancing unit and the base are prevented. The use of the force actuators prevents the displacements of the balancing unit from disturbing the positions of the object holders relative to the base.The positioning device is further provided with a control unit (83, 169, 237) by means of which at least the parts (47, 49; 121, 123; 219, 221) directed parallel to an X-direction of the X-actuators (39, 41; 105, 107; 211, 213) coupled to the object holders are held in positions parallel to the X-direction. It is also prevented in this manner that positions of the object holders relative to the base are interfered with by rotations of the balancing unit caused by the reaction forces of the displacement units.The positioning device can be used in a lithographic device for the displacement of a semiconductor substrate relative to an exposure system of the lithographic device and for the displacement of a mask relative to the exposure system.

公开(公告)号：US06262796B1

公开(公告)日：2001-07-17

申请号：US09180011

申请日：1998-10-29

申请人： Erik R. Loopstra ,  Gerrit M. Bonnema ,  Harmen K. Van Der Schoot ,  Gerjan P. Veldhuis ,  Yim-Bun P. Kwan

发明人： Erik R. Loopstra ,  Gerrit M. Bonnema ,  Harmen K. Van Der Schoot ,  Gerjan P. Veldhuis ,  Yim-Bun P. Kwan

IPC分类号： G03B2742

CPC分类号： G03F7/70733 ,  B23Q1/621 ,  B23Q1/623 ,  B23Q11/0032 ,  G03F7/70716 ,  G03F7/70741 ,  G03F7/7075 ,  G03F7/709 ,  H01L21/682

摘要： A positioning device has first and second object holders that are guided over a guiding surface extending parallel to an X-direction and parallel to a Y-direction perpendicular to the X-direction and which are displaceable over the guiding surface from a first position into a second position by means of a displacement system. The displacement system includes a first displacement unit and a second displacement unit to which the object holders can be alternately coupled. The first displacement unit is suitable for carrying out a first series of positioning steps of the first object holder in the first position and for displacing the first object holder from the first position into an intermediate position between the first and second positions. The second displacement unit is suitable for carrying out a second series of positioning steps of the second object holder in the second position, simultaneously with and independently of the first displacement unit, and for displacing the second object holder from the second position into the intermediate position. In the intermediate position, the object holders are exchanged, after which the first series of positioning steps can be carried out by the first displacement unit with the second object holder in the first position and the second series of positioning steps can be carried out by the second displacement unit with the first object holder in the second position. The positioning device is suitable for use in a lithographic device to carry out an exposure process with a first semiconductor substrate in an exposure position and, simultaneously therewith and independently thereof, a characterization process with a second semiconductor substrate in a characterization position.

摘要翻译： 定位装置具有第一和第二物体保持器，所述第一和第二物体保持器被引导到平行于X方向并且平行于与X方向垂直的Y方向延伸的引导表面，并且其可以在引导表面上从第一位置移动到 通过位移系统的第二位置。 位移系统包括第一位移单元和第二位移单元，物体保持器可以交替地联接到该位移单元。 第一位移单元适于在第一位置执行第一物体保持器的第一系列定位步骤，并且用于将第一物体保持器从第一位置移动到第一位置和第二位置之间的中间位置。 第二位移单元适于在与第一位移单元同时且独立于第二位置执行第二对象保持器的第二系列定位步骤，并且用于将第二物体保持器从第二位置移动到中间位置 。 在中间位置，更换物体保持器，之后可以通过第一位移单元执行第一系列定位步骤，使第二物体保持器处于第一位置，并且第二系列定位步骤可以由 第二位移单元，其中第一对象保持器处于第二位置。 该定位装置适用于光刻设备，以在曝光位置中与第一半导体衬底进行曝光处理，并且同时进行曝光处理，并且独立于此，具有表征位置的第二半导体衬底的表征过程。