Piezoresistive Device
    6.
    发明申请

    公开(公告)号:US20170350772A1

    公开(公告)日:2017-12-07

    申请号:US15538862

    申请日:2015-12-23

    IPC分类号: G01L1/18

    摘要: The present invention relates to piezoresistive devices and pressure sensors incorporating such devices. At its most general, the invention provides a piezoresistive device, comprising a piezoresistive material positioned between an upper conductive layer and a lower conductive layer, wherein the piezoresistive material comprises carbon nanoparticles (most preferably graphene nanoplatelets, graphene or carbon nanotubes) dispersed in a polymer matrix material. The invention also relates to methods of manufacturing and using such devices.

    Methods and Apparatus for Delivering Feedstocks for Plasma Treatment

    公开(公告)号:US20240024840A1

    公开(公告)日:2024-01-25

    申请号:US18027082

    申请日:2021-09-08

    IPC分类号: B01J19/08

    摘要: The present application relates to methods and apparatus for delivering liquid or solid feedstocks into a plasma treatment vessel. More specifically, the invention provides a method for treating a sample using glow discharge plasma in an apparatus comprising a treatment vessel, the method comprising (i) delivering a gaseous plasma forming feedstock into the treatment vessel through a gas supply line under the control of a gas flow controller, and causing formation of a glow discharge plasma in the treatment vessel from the gaseous plasma forming feedstock; and simultaneously (ii) delivering a reagent into the treatment vessel under the control of a reagent dosing controller, wherein the reagent is a liquid or a solid; and (iii) contacting the sample with the glow discharge plasma and the reagent; wherein the gas flow controller and the reagent dosing controller allow independent control of the rate of delivery of the gaseous plasma forming feedstock and the reagent.