公开(公告)号：US07371659B1

公开(公告)日：2008-05-13

申请号：US10020764

申请日：2001-12-12

申请人： Haruhiko Yamamoto ,  Hideaki Seto ,  Nobuyoshi Sato ,  Kyoko Kuroki

发明人： Haruhiko Yamamoto ,  Hideaki Seto ,  Nobuyoshi Sato ,  Kyoko Kuroki

IPC分类号： H01L21/76

CPC分类号： H01L23/544 ,  B23K26/361 ,  B41C1/05 ,  B41M5/24 ,  H01L2924/0002 ,  H01L2924/00

摘要： A method for forming a feature in a substrate, where residue within the feature can be easily removed. An upper sidewall portion of the feature is formed, where the upper sidewall portion forms a void in the substrate. The upper sidewall portion has an upper sidewall angle. A lower sidewall portion of the feature is formed, where the lower sidewall portion forms a void in the substrate. The lower sidewall portion has a lower sidewall angle. The upper sidewall angle of the upper sidewall portion is shallower than the lower sidewall angle of the lower sidewall portion. By forming the feature with a shallower sidewall angle at the top of the feature, any debris within the feature is more susceptible to rinsing, etching, or other cleaning procedures, and thus the feature is more easily cleaned than standard features having relatively steeper sidewalls.

摘要翻译： 一种用于在衬底中形成特征的方法，其中特征内的残留物可以容易地去除。 形成特征的上侧壁部分，其中上侧壁部分在基底中形成空隙。 上侧壁部分具有上侧壁角。 形成该特征的下侧壁部分，其中下侧壁部分在基底中形成空隙。 下侧壁部分具有较低的侧壁角度。 上侧壁部分的上侧壁角度比下侧壁部分的下侧壁角度浅。 通过在特征顶部形成具有较浅侧壁角的特征，该特征内的任何碎屑更易于冲洗，蚀刻或其它清洁过程，因此该特征比具有较陡侧壁的标准特征更容易清洁。

公开(公告)号：US06299723B1

公开(公告)日：2001-10-09

申请号：US09321659

申请日：1999-05-28

申请人： Hideaki Seto ,  Haruhiko Yamamoto ,  Nobuyoshi Sato ,  Kyoko Saito

发明人： Hideaki Seto ,  Haruhiko Yamamoto ,  Nobuyoshi Sato ,  Kyoko Saito

IPC分类号： B01D3500

CPC分类号： B01D19/0063 ,  B01D19/0031 ,  B01D36/001

摘要： An anti-airlock apparatus for filters comprises a process bath for processing wafers, a filtration unit incorporating a filter for preliminarily filtering a process solution before said processing and connected to a first deaeration line, and a tank body provided on the primary side or the filtration unit and connected to a second deaeration line, wherein at least said filtration unit and tank body are connected to each other via a pipeline, and a valve of the first deaeration line and a valve of the second deaeration line are separately operated and said first and second deaeration lines are directly connected to the most upstream side of the process solution.

摘要翻译： 用于过滤器的防气锁装置包括用于处理晶片的处理槽，过滤单元，其包括用于在所述处理之前预先过滤处理溶液并连接到第一除气管线的过滤器，以及设置在初级侧或过滤器 单元并连接到第二脱气管线，其中至少所述过滤单元和罐体经由管道彼此连接，并且第一脱气管线的阀和第二脱气管线的阀分别操作，并且所述第一和 第二除气管线直接连接到过程溶液的最上游侧。

公开(公告)号：US06276379B1

公开(公告)日：2001-08-21

申请号：US09321658

申请日：1999-05-28

申请人： Hideaki Seto ,  Haruhiko Yamamoto ,  Nobuyoshi Sato ,  Kyoko Saito

发明人： Hideaki Seto ,  Haruhiko Yamamoto ,  Nobuyoshi Sato ,  Kyoko Saito

IPC分类号： B08B304

CPC分类号： H01L21/67086 ,  B08B3/044 ,  H01L21/67057 ,  Y10S134/902

摘要： The present invention prevents deposition on product wafers of microbubbles generated from chemical solution circulation systems for wet etching or wet cleaning, or pure water supply systems during manufacturing processes of semiconductors or liquid crystals. A separator is provided on the inner wall of a chemical solution bath for etching or cleaning wafers to cover a process solution nozzle. The separator comprises an upper microbubble discharge tube extending upright for discharging microbubbles and lower outlets for horizontally introducing a process solution into the process bath.

摘要翻译： 本发明防止在半导体或液晶的制造过程中由化学溶液循环系统产生的湿法蚀刻或湿法清洗或纯净水供应系统产生的微气泡沉积在隔板上。在化学溶液浴的内壁上设置隔板 用于蚀刻或清洁晶片以覆盖工艺溶液喷嘴。 分离器包括上部微泡放电管，其直立延伸用于排出微泡和较低的出口，用于将工艺溶液水平地引入工艺槽中。

公开(公告)号：US06248180B1

公开(公告)日：2001-06-19

申请号：US09150220

申请日：1998-09-09

申请人： Nobuyoshi Sato ,  Hideaki Seto ,  Koji Ohsawa ,  Haruhiko Yamamoto

发明人： Nobuyoshi Sato ,  Hideaki Seto ,  Koji Ohsawa ,  Haruhiko Yamamoto

IPC分类号： B08B100

CPC分类号： H01L21/67051 ,  B08B1/04 ,  B08B3/02 ,  B08B3/04 ,  B08B3/12 ,  H01L21/67046 ,  Y10S134/902

摘要： A method of removing particles adhering to a surface of a semiconductor wafer including the steps of: providing a container having a drain valve; positioning the semiconductor wafer in the container; directing a jet stream consisting of water against the surface of the semiconductor wafer; removing particles adhering to the surface of the semiconductor wafer by scrubbing the surface of the semiconductor wafer with a brush while the jet stream of water is directed against the surface of the semiconductor wafer; closing the drain valve while the jet stream of water is directed against the semiconductor wafer, wherein the water accumulates in the container to thereby completely immerse the brush and the semiconductor wafer in the water in the container; and maintaining the brush and the semiconductor wafer completely immersed in the water from the jet stream for a predetermined period of time.

摘要翻译： 一种去除附着在半导体晶片表面上的颗粒的方法，包括以下步骤：提供具有排水阀的容器; 将半导体晶片定位在容器中; 将由水组成的射流引导到半导体晶片的表面; 通过用刷子擦洗所述半导体晶片的表面，同时将所述喷射流指向所述半导体晶片的表面，从而去除附着在所述半导体晶片的表面上的颗粒; 关闭排水阀，同时将水流引导到半导体晶片上，其中水积聚在容器中，从而将刷子和半导体晶片完全浸入容器中的水中; 并将刷子和半导体晶片从喷射流中完全浸入水中一段预定的时间。

公开(公告)号：US5998322A

公开(公告)日：1999-12-07

申请号：US135528

申请日：1998-08-18

申请人： Kazutomo Hoshino ,  Toshiya Kunisaki ,  Hideaki Seto ,  Yukio Kai ,  Atsushi Kikuchi ,  Yukihisa Shiraishi ,  Kazunobu Kakimoto

发明人： Kazutomo Hoshino ,  Toshiya Kunisaki ,  Hideaki Seto ,  Yukio Kai ,  Atsushi Kikuchi ,  Yukihisa Shiraishi ,  Kazunobu Kakimoto

IPC分类号： B01D39/20 ,  B22D43/00 ,  C04B35/101 ,  C04B35/443

CPC分类号： B22D43/004 ,  B01D39/2075 ,  C04B35/1015

摘要： Herein disclosed is a filter medium for molten metals which consists of a sintered body of a mixture comprising 100 parts by weight of at least one refractory grain selected from the group consisting of alumina particles and Al.sub.2 O.sub.3.MgO spinel crystal particles; and 5 to 25 parts by weight of an inorganic binder which comprises 60 to 90% by weight of Al.sub.2 O.sub.3.MgO spinel crystal powder, 5 to 12% by weight of B.sub.2 O.sub.3, and not more than 30% by weight of at least one oxide selected from the group consisting of Al.sub.2 O.sub.3, MgO and TiO.sub.2. The filter medium is used for filtering off solid impurities mixed in molten metals, in particular, molten aluminums.

摘要翻译： 本文公开了一种用于熔融金属的过滤介质，其由包含100重量份的至少一种选自氧化铝颗粒和Al 2 O 3 .MOO尖晶石晶体颗粒的耐火材料的混合物的烧结体组成。 和5至25重量份的无机粘合剂，其包含60至90重量％的Al 2 O 3 .MgO尖晶石结晶粉末，5至12重量％的B 2 O 3和不超过30重量％的至少一种选择的氧化物 由Al2O3，MgO和TiO2组成的组。 过滤介质用于过滤在熔融金属，特别是熔融铝中混合的固体杂质。

公开(公告)号：US20080135981A1

公开(公告)日：2008-06-12

申请号：US12034750

申请日：2008-02-21

申请人： Haruhiko Yamamoto ,  Hideaki Seto ,  Nobuyoshi Sato ,  Kyoko Kuroki

发明人： Haruhiko Yamamoto ,  Hideaki Seto ,  Nobuyoshi Sato ,  Kyoko Kuroki

IPC分类号： H01L29/06

CPC分类号： H01L23/544 ,  B23K26/361 ,  B41C1/05 ,  B41M5/24 ,  H01L2924/0002 ,  H01L2924/00

摘要： A method for forming a feature in a substrate, where residue within the feature can be easily removed. An upper sidewall portion of the feature is formed, where the upper sidewall portion forms a void in the substrate. The upper sidewall portion has an upper sidewall angle. A lower sidewall portion of the feature is formed, where the lower sidewall portion forms a void in the substrate. The lower sidewall portion has a lower sidewall angle. The upper sidewall angle of the upper sidewall portion is shallower than the lower sidewall angle of the lower sidewall portion. By forming the feature with a shallower sidewall angle at the top of the feature, any debris within the feature is more susceptible to rinsing, etching, or other cleaning procedures, and thus the feature is more easily cleaned than standard features having relatively steeper sidewalls.

摘要翻译： 一种用于在衬底中形成特征的方法，其中特征内的残留物可以容易地去除。 形成特征的上侧壁部分，其中上侧壁部分在基底中形成空隙。 上侧壁部分具有上侧壁角。 形成该特征的下侧壁部分，其中下侧壁部分在基底中形成空隙。 下侧壁部分具有较低的侧壁角度。 上侧壁部分的上侧壁角度比下侧壁部分的下侧壁角度浅。 通过在特征顶部形成具有较浅侧壁角的特征，该特征内的任何碎屑更易于冲洗，蚀刻或其它清洁过程，因此该特征比具有较陡侧壁的标准特征更容易清洁。

公开(公告)号：US07201176B2

公开(公告)日：2007-04-10

申请号：US11403137

申请日：2006-04-11

申请人： Kyoko Kuroki ,  Hideaki Seto

发明人： Kyoko Kuroki ,  Hideaki Seto

IPC分类号： B08B3/00

CPC分类号： H01L21/68728

摘要： A wafer chuck is configured to hold a wafer efficiently for spin process cleaning of wafer edges and back sides. A first group of retractable tips extend to hold the wafer during a first portion of the cleaning period. A second group of retractable tips extend to hold the wafer during a second portion of the cleaning period. Residues left between the tips and the wafer edge areas during the first portion of the cleaning period are removed during the second portion. The change from the first group of tips to the second group of tips occurs while the wafer is rotating.

摘要翻译： 晶片卡盘被配置为有效地保持晶片以进行晶片边缘和背面的旋转处理清洁。 第一组可缩回尖端延伸以在清洁周期的第一部分期间保持晶片。 第二组可伸缩尖端延伸以在清洁周期的第二部分期间保持晶片。 在第二部分期间，在清洁周期的第一部分期间，在尖端和晶片边缘区域之间留下的残留物被去除。 当晶片旋转时，从第一组尖端到第二组尖端的变化发生。

公开(公告)号：US07056392B1

公开(公告)日：2006-06-06

申请号：US10417708

申请日：2003-04-16

申请人： Kyoko Kuroki ,  Hideaki Seto

发明人： Kyoko Kuroki ,  Hideaki Seto

IPC分类号： B08B7/00

CPC分类号： H01L21/68728

摘要： A wafer chuck is configured to hold a wafer efficiently for spin process cleaning of wafer edges and back sides. A first group of retractable tips extend to hold the wafer during a first portion of the cleaning period. A second group of retractable tips extend to hold the wafer during a second portion of the cleaning period. Residues left between the tips and the wafer edge areas during the first portion of the cleaning period are removed during the second portion. The change from the first group of tips to the second group of tips occurs while the wafer is rotating.

摘要翻译： 晶片卡盘被配置为有效地保持晶片以进行晶片边缘和背面的旋转处理清洁。 第一组可缩回尖端延伸以在清洁周期的第一部分期间保持晶片。 第二组可伸缩尖端延伸以在清洁周期的第二部分期间保持晶片。 在第二部分期间，在清洁周期的第一部分期间，在尖端和晶片边缘区域之间留下的残留物被去除。 当晶片旋转时，从第一组尖端到第二组尖端的变化发生。

公开(公告)号：US6032529A

公开(公告)日：2000-03-07

申请号：US322191

申请日：1999-05-28

申请人： Kyoko Saito ,  Hisashi Fujimoto ,  Hideaki Seto ,  Haruhiko Yamamoto ,  Nobuyoshi Sato

发明人： Kyoko Saito ,  Hisashi Fujimoto ,  Hideaki Seto ,  Haruhiko Yamamoto ,  Nobuyoshi Sato

IPC分类号： G01F23/14 ,  G01F23/16 ,  H01L21/304 ,  H01L21/306 ,  G01F23/00

CPC分类号： G01F23/165

摘要： An object of the present invention is to prevent erroneous operation of a liquid level sensor due to deposition of ammonium fluoride dissolved in buffered hydrofluoric acid used as a process solution.The present invention provides a liquid level sensor comprising a chemical solution bath for receiving a chemical solution including buffered hydrofluoric acid, a gas feed tube for introducing a gas for detecting the variation in the liquid level of said chemical solution into said chemical solution, and a gas pressure detector for detecting a change in the pressure of said gas and converting it into an electric signal to indicate a change in liquid level, characterized in that the diameter of a gas outlet provided at an end of said gas feed tube is smaller than the inner diameter of said gas feed tube.

摘要翻译： 本发明的目的是防止由于溶解在用作处理溶液的缓冲氢氟酸中的氟化铵沉积而导致的液位传感器的错误操作。 本发明提供了一种液位传感器，包括用于接收包括缓冲氢氟酸的化学溶液的化学溶液浴，用于引入用于检测所述化学溶液的液面变化进入所述化学溶液的气体的气体供给管，以及 气体压力检测器，用于检测所述气体的压力变化并将其转换成电信号以指示液面的变化，其特征在于，设置在所述气体供给管的端部处的气体出口的直径小于 所述气体供给管的内径。