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公开(公告)号：US06299723B1
公开(公告)日：2001-10-09
申请号：US09321659
申请日：1999-05-28
申请人： Hideaki Seto , Haruhiko Yamamoto , Nobuyoshi Sato , Kyoko Saito
发明人： Hideaki Seto , Haruhiko Yamamoto , Nobuyoshi Sato , Kyoko Saito
IPC分类号： B01D3500
CPC分类号： B01D19/0063 , B01D19/0031 , B01D36/001
摘要： An anti-airlock apparatus for filters comprises a process bath for processing wafers, a filtration unit incorporating a filter for preliminarily filtering a process solution before said processing and connected to a first deaeration line, and a tank body provided on the primary side or the filtration unit and connected to a second deaeration line, wherein at least said filtration unit and tank body are connected to each other via a pipeline, and a valve of the first deaeration line and a valve of the second deaeration line are separately operated and said first and second deaeration lines are directly connected to the most upstream side of the process solution.
摘要翻译： 用于过滤器的防气锁装置包括用于处理晶片的处理槽，过滤单元，其包括用于在所述处理之前预先过滤处理溶液并连接到第一除气管线的过滤器，以及设置在初级侧或过滤器 单元并连接到第二脱气管线，其中至少所述过滤单元和罐体经由管道彼此连接，并且第一脱气管线的阀和第二脱气管线的阀分别操作，并且所述第一和 第二除气管线直接连接到过程溶液的最上游侧。
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公开(公告)号：US06276379B1
公开(公告)日：2001-08-21
申请号：US09321658
申请日：1999-05-28
申请人： Hideaki Seto , Haruhiko Yamamoto , Nobuyoshi Sato , Kyoko Saito
发明人： Hideaki Seto , Haruhiko Yamamoto , Nobuyoshi Sato , Kyoko Saito
IPC分类号： B08B304
CPC分类号： H01L21/67086 , B08B3/044 , H01L21/67057 , Y10S134/902
摘要： The present invention prevents deposition on product wafers of microbubbles generated from chemical solution circulation systems for wet etching or wet cleaning, or pure water supply systems during manufacturing processes of semiconductors or liquid crystals. A separator is provided on the inner wall of a chemical solution bath for etching or cleaning wafers to cover a process solution nozzle. The separator comprises an upper microbubble discharge tube extending upright for discharging microbubbles and lower outlets for horizontally introducing a process solution into the process bath.
摘要翻译： 本发明防止在半导体或液晶的制造过程中由化学溶液循环系统产生的湿法蚀刻或湿法清洗或纯净水供应系统产生的微气泡沉积在隔板上。在化学溶液浴的内壁上设置隔板 用于蚀刻或清洁晶片以覆盖工艺溶液喷嘴。 分离器包括上部微泡放电管，其直立延伸用于排出微泡和较低的出口，用于将工艺溶液水平地引入工艺槽中。
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公开(公告)号：US6032529A
公开(公告)日：2000-03-07
申请号：US322191
申请日：1999-05-28
IPC分类号： G01F23/14 , G01F23/16 , H01L21/304 , H01L21/306 , G01F23/00
CPC分类号： G01F23/165
摘要： An object of the present invention is to prevent erroneous operation of a liquid level sensor due to deposition of ammonium fluoride dissolved in buffered hydrofluoric acid used as a process solution.The present invention provides a liquid level sensor comprising a chemical solution bath for receiving a chemical solution including buffered hydrofluoric acid, a gas feed tube for introducing a gas for detecting the variation in the liquid level of said chemical solution into said chemical solution, and a gas pressure detector for detecting a change in the pressure of said gas and converting it into an electric signal to indicate a change in liquid level, characterized in that the diameter of a gas outlet provided at an end of said gas feed tube is smaller than the inner diameter of said gas feed tube.
摘要翻译： 本发明的目的是防止由于溶解在用作处理溶液的缓冲氢氟酸中的氟化铵沉积而导致的液位传感器的错误操作。 本发明提供了一种液位传感器，包括用于接收包括缓冲氢氟酸的化学溶液的化学溶液浴，用于引入用于检测所述化学溶液的液面变化进入所述化学溶液的气体的气体供给管，以及 气体压力检测器，用于检测所述气体的压力变化并将其转换成电信号以指示液面的变化，其特征在于，设置在所述气体供给管的端部处的气体出口的直径小于 所述气体供给管的内径。
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公开(公告)号：US20080135981A1
公开(公告)日：2008-06-12
申请号：US12034750
申请日：2008-02-21
申请人： Haruhiko Yamamoto , Hideaki Seto , Nobuyoshi Sato , Kyoko Kuroki
发明人： Haruhiko Yamamoto , Hideaki Seto , Nobuyoshi Sato , Kyoko Kuroki
IPC分类号： H01L29/06
CPC分类号： H01L23/544 , B23K26/361 , B41C1/05 , B41M5/24 , H01L2924/0002 , H01L2924/00
摘要： A method for forming a feature in a substrate, where residue within the feature can be easily removed. An upper sidewall portion of the feature is formed, where the upper sidewall portion forms a void in the substrate. The upper sidewall portion has an upper sidewall angle. A lower sidewall portion of the feature is formed, where the lower sidewall portion forms a void in the substrate. The lower sidewall portion has a lower sidewall angle. The upper sidewall angle of the upper sidewall portion is shallower than the lower sidewall angle of the lower sidewall portion. By forming the feature with a shallower sidewall angle at the top of the feature, any debris within the feature is more susceptible to rinsing, etching, or other cleaning procedures, and thus the feature is more easily cleaned than standard features having relatively steeper sidewalls.
摘要翻译： 一种用于在衬底中形成特征的方法，其中特征内的残留物可以容易地去除。 形成特征的上侧壁部分，其中上侧壁部分在基底中形成空隙。 上侧壁部分具有上侧壁角。 形成该特征的下侧壁部分，其中下侧壁部分在基底中形成空隙。 下侧壁部分具有较低的侧壁角度。 上侧壁部分的上侧壁角度比下侧壁部分的下侧壁角度浅。 通过在特征顶部形成具有较浅侧壁角的特征，该特征内的任何碎屑更易于冲洗，蚀刻或其它清洁过程，因此该特征比具有较陡侧壁的标准特征更容易清洁。
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公开(公告)号：US07371659B1
公开(公告)日：2008-05-13
申请号：US10020764
申请日：2001-12-12
申请人： Haruhiko Yamamoto , Hideaki Seto , Nobuyoshi Sato , Kyoko Kuroki
发明人： Haruhiko Yamamoto , Hideaki Seto , Nobuyoshi Sato , Kyoko Kuroki
IPC分类号： H01L21/76
CPC分类号： H01L23/544 , B23K26/361 , B41C1/05 , B41M5/24 , H01L2924/0002 , H01L2924/00
摘要： A method for forming a feature in a substrate, where residue within the feature can be easily removed. An upper sidewall portion of the feature is formed, where the upper sidewall portion forms a void in the substrate. The upper sidewall portion has an upper sidewall angle. A lower sidewall portion of the feature is formed, where the lower sidewall portion forms a void in the substrate. The lower sidewall portion has a lower sidewall angle. The upper sidewall angle of the upper sidewall portion is shallower than the lower sidewall angle of the lower sidewall portion. By forming the feature with a shallower sidewall angle at the top of the feature, any debris within the feature is more susceptible to rinsing, etching, or other cleaning procedures, and thus the feature is more easily cleaned than standard features having relatively steeper sidewalls.
摘要翻译： 一种用于在衬底中形成特征的方法，其中特征内的残留物可以容易地去除。 形成特征的上侧壁部分，其中上侧壁部分在基底中形成空隙。 上侧壁部分具有上侧壁角。 形成该特征的下侧壁部分，其中下侧壁部分在基底中形成空隙。 下侧壁部分具有较低的侧壁角度。 上侧壁部分的上侧壁角度比下侧壁部分的下侧壁角度浅。 通过在特征顶部形成具有较浅侧壁角的特征，该特征内的任何碎屑更易于冲洗，蚀刻或其它清洁过程，因此该特征比具有较陡侧壁的标准特征更容易清洁。
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公开(公告)号：US06248180B1
公开(公告)日：2001-06-19
申请号：US09150220
申请日：1998-09-09
申请人： Nobuyoshi Sato , Hideaki Seto , Koji Ohsawa , Haruhiko Yamamoto
发明人： Nobuyoshi Sato , Hideaki Seto , Koji Ohsawa , Haruhiko Yamamoto
IPC分类号： B08B100
CPC分类号： H01L21/67051 , B08B1/04 , B08B3/02 , B08B3/04 , B08B3/12 , H01L21/67046 , Y10S134/902
摘要： A method of removing particles adhering to a surface of a semiconductor wafer including the steps of: providing a container having a drain valve; positioning the semiconductor wafer in the container; directing a jet stream consisting of water against the surface of the semiconductor wafer; removing particles adhering to the surface of the semiconductor wafer by scrubbing the surface of the semiconductor wafer with a brush while the jet stream of water is directed against the surface of the semiconductor wafer; closing the drain valve while the jet stream of water is directed against the semiconductor wafer, wherein the water accumulates in the container to thereby completely immerse the brush and the semiconductor wafer in the water in the container; and maintaining the brush and the semiconductor wafer completely immersed in the water from the jet stream for a predetermined period of time.
摘要翻译： 一种去除附着在半导体晶片表面上的颗粒的方法，包括以下步骤：提供具有排水阀的容器; 将半导体晶片定位在容器中; 将由水组成的射流引导到半导体晶片的表面; 通过用刷子擦洗所述半导体晶片的表面，同时将所述喷射流指向所述半导体晶片的表面，从而去除附着在所述半导体晶片的表面上的颗粒; 关闭排水阀，同时将水流引导到半导体晶片上，其中水积聚在容器中，从而将刷子和半导体晶片完全浸入容器中的水中; 并将刷子和半导体晶片从喷射流中完全浸入水中一段预定的时间。
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公开(公告)号：US20120248076A1
公开(公告)日：2012-10-04
申请号：US13402434
申请日：2012-02-22
IPC分类号： B23K26/20
CPC分类号： B23K26/22 , B23K26/009 , B23K26/18 , B23K2101/38 , B23K2103/10 , B23K2103/12 , B23K2103/18 , B23K2103/42
摘要： In a laser welding method including irradiating a welding portion between metallic members with a laser beam, the laser welding portion is covered with a cover made of a laser beam transmissive resin, and the metallic members are laser-welded together by irradiating the welding portion with the laser beam through the cover. The cover made of the laser beam transmissive resin may come in contact with the metallic members around the welding portion so that a gap is formed between the cover and the laser welding portion, thereby holding the gap in a hermetically closed state. It is therefore possible to provide a laser welding method between the metallic members for preventing metal particles that have spattered out of the welding portion from dispersing into surrounding areas.
摘要翻译： 在激光焊接方法中，包括用激光束照射金属部件之间的焊接部分，激光焊接部分被由激光束透射树脂制成的盖覆盖，并且通过用焊接部分照射焊接部分将金属部件激光焊接在一起 激光束通过盖子。 由激光束透射树脂制成的盖可以与焊接部分周围的金属部件接触，从而在盖和激光焊接部之间形成间隙，从而将间隙保持在气密闭合状态。 因此，可以在用于防止从焊接部分溅出的金属颗粒分散到周围区域中的金属构件之间提供激光焊接方法。
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公开(公告)号：US08207949B2
公开(公告)日：2012-06-26
申请号：US12567089
申请日：2009-09-25
申请人： Hirohisa Takahashi , Satoru Takasawa , Isao Sugiura , Atsushi Ota , Satoru Ishibashi , Haruhiko Yamamoto
发明人： Hirohisa Takahashi , Satoru Takasawa , Isao Sugiura , Atsushi Ota , Satoru Ishibashi , Haruhiko Yamamoto
IPC分类号： G06F3/041
CPC分类号： G06F3/041 , G06F3/045 , Y10T29/49117
摘要： A highly durable touch panel is provided. A touch panel according to the present invention includes a deformable flexible panel, and a transparent electrode film containing In2O3 as a primary component and containing Ti is exposed to a surface of a lower electrode film of a display device. Since such a transparent electrode film has a high abrasion resistance as compared to a conventional one (such as, an ITO thin film), the transparent electrode film is neither clouded nor cracked even if the lower electrode film is repeatedly pressed. Therefore, the touch panel according to the present invention is highly durable.
摘要翻译： 提供高度耐用的触摸面板。 根据本发明的触摸面板包括可变形的柔性面板，并且包含In 2 O 3作为主要成分并且含有Ti的透明电极膜暴露于显示装置的下电极膜的表面。 由于这种透明电极膜与以往的透明电极膜相比具有高耐磨性（例如ITO薄膜），所以即使下反射膜反复被压制，透明电极膜也不会发生糊化或者不破裂。 因此，根据本发明的触摸面板是高度耐用的。
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公开(公告)号：US20100013787A1
公开(公告)日：2010-01-21
申请号：US12567089
申请日：2009-09-25
申请人： Hirohisa TAKAHASHI , Satoru Takasawa , Isao Sugiura , Atsushi Ota , Satoru Ishibashi , Haruhiko Yamamoto
发明人： Hirohisa TAKAHASHI , Satoru Takasawa , Isao Sugiura , Atsushi Ota , Satoru Ishibashi , Haruhiko Yamamoto
CPC分类号： G06F3/041 , G06F3/045 , Y10T29/49117
摘要： A highly durable touch panel is provided. A touch panel according to the present invention includes a deformable flexible panel, and a transparent electrode film containing In2O3 as a primary component and containing Ti is exposed to a surface of a lower electrode film of a display device. Since such a transparent electrode film has a high abrasion resistance as compared to a conventional one (such as, an ITO thin film), the transparent electrode film is neither clouded nor cracked even if the lower electrode film is repeatedly pressed. Therefore, the touch panel according to the present invention is highly durable.
摘要翻译： 提供高度耐用的触摸面板。 根据本发明的触摸面板包括可变形的柔性面板，并且包含In 2 O 3作为主要成分并且含有Ti的透明电极膜暴露于显示装置的下电极膜的表面。 由于这种透明电极膜与以往的透明电极膜相比具有高耐磨性（例如ITO薄膜），所以即使下反射膜反复被压制，透明电极膜也不会发生糊化或者不破裂。 因此，根据本发明的触摸面板是高度耐用的。
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公开(公告)号：US20080023972A1
公开(公告)日：2008-01-31
申请号：US11878081
申请日：2007-07-20
申请人： Yoshikazu Ohno , Haruhiko Yamamoto , Takao Ito
发明人： Yoshikazu Ohno , Haruhiko Yamamoto , Takao Ito
IPC分类号： B60R19/24
CPC分类号： B60R19/18 , B60R2019/188
摘要： An attachment structure of an energy absorbing structure includes: a bumper reinforcement that includes an attachment surface, with insertion holes being formed in the attachment surface; an energy absorbing structure disposed in contact with the attachment surface; locking claws that are disposed on the energy absorbing structure and engage with the bumper reinforcement to lock the energy absorbing structure to the bumper reinforcement; and load receiving projections that are disposed on the energy absorbing structure and are inserted into the insertion holes, so that when a load in a direction along the attachment surface acts on the energy absorbing structure, the load receiving projections interfere with inner peripheral portions of the insertion holes and receive the load.
摘要翻译： 能量吸收结构的安装结构包括：保险杠加强件，其包括附接表面，在所述附接表面中形成有插入孔; 设置成与所述附接表面接触的能量吸收结构; 锁定爪，其设置在能量吸收结构上并与保险杠加强件接合以将能量吸收结构锁定到保险杠加强件; 以及负载接收突起，其设置在能量吸收结构上并被插入到插入孔中，使得当沿着附着表面的方向上的负载作用在能量吸收结构上时，负载接收突起与内部的 插入孔并接收负载。
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