摘要:
The present invention provides a solid-state imaging device in which high S/N is achieved. A solid-state imaging device includes a photodiode, a transfer transistor, a floating diffusion, a floating diffusion wiring, an amplifying transistor, a power line, and first output signal lines, in which the first output signal lines are formed one on each side of the floating diffusion wiring in a layer having the floating diffusion wiring formed on a semiconductor substrate, and the power line is formed above the floating diffusion wiring.
摘要:
A solid state image sensor includes: a first pixel and a second pixel, each including a light receiving portion; a first color filter formed in an upper part of the first pixel on a first main surface side of a semiconductor substrate; a second color filter formed in an upper part of the second pixel on the first main surface side of the semiconductor substrate; a metal interconnect layer formed on a second main surface side of the semiconductor substrate; and a substrate contact connected to the second main surface of the semiconductor substrate, and provided between the metal interconnect layer and the second main surface. The first color filter mainly transmits first light therethrough, and the second color filter mainly transmits second light therethrough. The second light has a shorter wavelength than that of the first light. The substrate contact is not provided in the first pixel.
摘要:
Provided is a solid-state imaging device including unit pixels, wherein the unit pixels include two kinds of unit pixels including a first unit pixel and a second unit pixel that are formed on a common well on a semiconductor substrate. The first unit pixel includes: at least one photoelectric conversion region which converts light into a signal charge; the first semiconductor region that is formed on the common well and has a conductivity type identical to that of the common well; and the first contact electrically connected to the first semiconductor region. The second unit pixel includes: at least one photoelectric conversion region; the second semiconductor region that is formed on the common well and has a conductivity type opposite to that of the common well; and the second contact electrically connected to the second semiconductor region.
摘要:
A solid state imaging device has a pixel region composed of a matrix of pixel cells each including a photodiode and a charge storage portion. First and second output signal lines are in parallel and adjacent to both the charge storage portions of a first pixel cell and a second pixel cells that are adjacent on a same column. A signal voltage of a signal charge in the charge storage portion of the first pixel cell is output to the first output signal line, whereas a signal voltage of a signal charge in the charge storage portion of the second pixel cell is output to the second output signal line. The respective outputs to the first and second output signal lines are processed in parallel. A conductive layer is disposed between the charge storage portion of the first pixel cell and the second output signal line to suppress capacitive coupling.
摘要:
A dummy cell includes two series-connected OFF-state transistors, one end of the series circuit which is formed by these two transistors is connected with a constant voltage source, and the other end of the series circuit is connected with a replica bit line. This suppresses a leak current flowing from the replica bit line to the dummy cell and therefore gives optimal start-up timing to a sense amplifier circuit.
摘要:
A dummy cell includes two series-connected OFF-state transistors, one end of the series circuit which is formed by these two transistors is connected with a constant voltage source, and the other end of the series circuit is connected with a replica bit line. This suppresses a leak current flowing from the replica bit line to the dummy cell and therefore gives optimal start-up timing to a sense amplifier circuit.
摘要:
A solid state imaging device has a pixel region composed of a matrix of pixel cells each including a photodiode and a charge storage portion. First and second output signal lines are in parallel and adjacent to both the charge storage portions of a first pixel cell and a second pixel cells that are adjacent on a same column. A signal voltage of a signal charge in the charge storage portion of the first pixel cell is output to the first output signal line, whereas a signal voltage of a signal charge in the charge storage portion of the second pixel cell is output to the second output signal line. The respective outputs to the first and second output signal lines are processed in parallel. A conductive layer is disposed between the charge storage portion of the first pixel cell and the second output signal line to suppress capacitive coupling.
摘要:
A pixel array is provided in which cells are arranged in a matrix. Each cell includes a photodiode, an FD, a transfer transistor, a reset transistor, an amplifying transistor having a gate electrode connected to the FD, a drain connected to a power supply line, and a source connected to a vertical signal line, and an FD wire. The FD wire is provided in a first wiring line, and the vertical signal line is provided in a second wiring line positioned over the first wiring layer. Since the potential of the FD wire follows the potential of the vertical signal line, it is possible to suppress a variation in capacitance occurring in the FD when a position of the vertical signal is shifted, depending on a position of the cell.
摘要:
A memory array, a sense amplifier circuit, a replica circuit and a dummy cell are disposed. The replica circuit has the same elements as memory cells, and includes plural replica cells which output a signal whose level corresponds to the number of stages provided to a common replica bit line. The dummy cell is connected as a load with the common replica bit line. The source of a drive transistor of the dummy cell is connected with a power source which is at the High level. This suppresses a leak current flowing from a replica bit line to the dummy cell.
摘要:
The present invention provides a solid-state imaging device in which high S/N is achieved. A solid-state imaging device includes a photodiode, a transfer transistor, a floating diffusion, a floating diffusion wiring, an amplifying transistor, a power line, and first output signal lines, in which the first output signal lines are formed one on each side of the floating diffusion wiring in a layer having the floating diffusion wiring formed on a semiconductor substrate, and the power line is formed above the floating diffusion wiring.