公开(公告)号：US5161521A

公开(公告)日：1992-11-10

申请号：US603621

申请日：1990-10-26

申请人： Yoichi Kasahara ,  Hisatsune Kadota ,  Norio Kaneko

发明人： Yoichi Kasahara ,  Hisatsune Kadota ,  Norio Kaneko

IPC分类号： A61C19/04 ,  G01H13/00 ,  G01M7/00 ,  G01M7/02 ,  G01N29/12

CPC分类号： G01M7/00 ,  A61C19/04 ,  G01H13/00 ,  G01M7/025 ,  G01N29/12 ,  G01N2291/02483

摘要： An oscillation degree measuring apparatus measures the fixing state of an object to be measured as a numerical value of the degree of oscillation and comprises an ultrasonic exciter for generating ultrasonic waves which shock the object and exciting oscillations, an oscillation detector for detecting the oscillations of the object and converting the oscillations into electrical signals, a band amplifier for extracting a signal element of a predetermined frequency band including a resonant frequency of the object from the detected signals from the oscillation detector, a smoothing circuit for smoothing the signals amplified by the band amplifier, an A/D converter for converting the signals smoothed by the smoothing circuit into digital signals, a control device for operating the A/D converter a plurality of times every time a predetermined time passes, and a data processor for finding an average value of a plurality of digital data obtained by the A/D converter and calculating the degree of oscillation based on the average value.

公开(公告)号：US08451424B2

公开(公告)日：2013-05-28

申请号：US11338661

申请日：2006-01-25

申请人： Nobutaka Magome ,  Naoyuki Kobayashi ,  Yasuyuki Sakakibara ,  Hiroaki Takaiwa ,  Hisatsune Kadota

发明人： Nobutaka Magome ,  Naoyuki Kobayashi ,  Yasuyuki Sakakibara ,  Hiroaki Takaiwa ,  Hisatsune Kadota

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70866 ,  G03F7/70341 ,  G03F7/70525 ,  G03F7/70725 ,  G03F7/70858 ,  G03F7/709

摘要： An exposure apparatus (EX) exposes a substrate (P) by projecting an image of a pattern on the substrate (P) via a projection optical system (PL) and a liquid (1). The exposure device (EX) has a liquid supply mechanism (10) which supplies the liquid (1) between the projection optical system (PL) and the substrate (P). The liquid feeding mechanism (10) stops the supply of the liquid (1) when abnormality is detected. This suppresses influence to devices and members in the periphery of the substrate caused by leakage of the liquid forming a liquid immersion area, thereby realizing satisfactory exposure processing.

摘要翻译： 曝光装置（EX）通过投影光学系统（PL）和液体（1）将基板（P）上的图案的图像投射到基板（P）上。 曝光装置（EX）具有在投影光学系统（PL）和基板（P）之间供给液体（1）的液体供给机构（10）。 当检测到异常时，液体供给机构（10）停止供给液体（1）。 这抑制了由于形成液浸区域的液体的泄漏而导致的衬底周边的器件和构件的影响，从而实现令人满意的曝光处理。